Abstract: Disclosed are a modified conjugated diene-based polymer represented by a specific Chemical Formula and a method of preparing the same.

Abstract: The present invention relates to a polymer compound used as a polymer modifier, a conjugated diene-based polymer including a functional group derived therefrom, and a method for preparing a modified and conjugated diene-based polymer using the polymer compound. A rubber modifier compound obtained therefrom is used as a modifier for rubber, particularly, as a modifier of a conjugated diene-based polymer and is bonded to a chain of the conjugated diene-based polymer to easily introduce a functional group having affinity with a filler.

Abstract: The present invention relates to a method of preparing a modified conjugated diene-based polymer, and more particularly, to a method of preparing a modified conjugated diene-based polymer, including: (S1) preparing an active polymer with an organic metal bonded thereto by polymerizing a conjugated diene-based monomer in a hydrocarbon solvent in the presence of an organometallic compound; and (S2) mixing the active polymer prepared according to process S1 with a modifier, wherein the mixing of process S2 is performed at a Reynolds number of 20 or less for 1 minute or more, the Reynolds number being maintained within a range of ±5 of a Reynolds number when the modifier is added (wherein the range is between greater than 0 to 20 or less).

Abstract: The present invention relates to a modifier useful for modifying a polymer, a method for preparing a modified and conjugated diene-based polymer using the same, and a modified and conjugated diene-based polymer prepared thereby. In the modified and conjugated diene-based polymer, a hydroxyl group and a silyl group are combined, and the affinity thereof with a silica-based filler may be excellent. Accordingly, a rubber composition including the modified and conjugated diene-based polymer may have excellent processability, and as a result, molded articles (for example, tires) manufactured from the rubber composition may have excellent tensile strength, abrasion resistance, and viscoelasticity properties.

Abstract: Disclosed are a modified conjugated diene-based polymer represented by Chemical Formula 1, a method of preparing the same, and a rubber composition including the same.

Abstract: Disclosed are a modified conjugated diene-based polymer represented by specific Chemical Formula, a method of preparing the same, and a rubber composition including the same.

Abstract: Disclosed are a modified conjugated diene-based polymer represented by a specific Chemical Formula and a method of preparing the same.

Abstract: Disclosed are a modified conjugated diene-based polymer represented by specific Chemical Formula, a method of preparing the same, and a rubber composition including the same.

Abstract: Disclosed are a modified conjugated diene-based polymer represented by specific Chemical Formula and a method of preparing the same.

Abstract: Disclosed are a modified conjugated diene-based polymer represented by Chemical Formula 1, a method of preparing the same, and a rubber composition including the same.

Abstract: A monomer composition for polymerizing a branch-type silsesquioxane polymer is disclosed. The monomer composition includes hydroxy-substituted cyclic siloxane in a solvent, and the hydroxy-substituted cyclic siloxane includes stereoisomers of cyclic siloxane of cis, trans, random and twist structures at controlled ratios. Also disclosed are a branch-type silsesquioxane polymer synthesized by polymerizing the monomer composition for polymerizing a branch-type silsesquioxane polymer, and a method for synthesizing the same. In accordance with the disclosure, the isomers can be isolated stably at desired ratios. The isolated isomers may be polymerized into polymers of various types. Since the polymers exhibit low dielectric property, they may be utilized as low dielectric materials.

Abstract: A low-dielectric constant thin film prepared from a silsesquioxane polymer matrix as a precursor and a method for preparing the same which comprises preparing silsesquioxane sol by adding a stereoisomer of a multi reactive cyclosiloxane to an alkoxysilane are provided. The low-dielectric-constant thin film retains a stable film state even at a curing temperature of ?500° C. without being decomposed, a very uniform surface property with a low surface modulus, and a superior coatability as to be coatable smoothly with no crack even with a thickness of 500 nm or larger.

Abstract: A monomer composition for polymerizing a branch-type silsesquioxane polymer is disclosed. The monomer composition includes hydroxy-substituted cyclic siloxane in a solvent, and the hydroxy-substituted cyclic siloxane includes stereoisomers of cyclic siloxane of cis, trans, random and twist structures at controlled ratios. Also disclosed are a branch-type silsesquioxane polymer synthesized by polymerizing the monomer composition for polymerizing a branch-type silsesquioxane polymer, and a method for synthesizing the same. In accordance with the disclosure, the isomers can be isolated stably at desired ratios. The isolated isomers may be polymerized into polymers of various types. Since the polymers exhibit low dielectric property, they may be utilized as low dielectric materials.

Abstract: Disclosed is a light-emitting material including a polysilsesquioxane having a ladder structure with photoactive groups bonded to a siloxane backbone. In addition to superior heat resistance and mechanical property, the light-emitting material provides improved cotability and film property when prepared into a thin film. Further, it provides higher luminous efficiency than the existing organic-based light-emitting material.

Abstract: Disclosed are a low-dielectric-constant thin film prepared from a silsesquioxane polymer matrix as a precursor, the silsesquioxane polymer matrix being a silsesquioxane sol prepared by adding a stereoisomer of a multireactive cyclosiloxane to an alkoxysilane, and a method for preparing the same. The disclosed low-dielectric-constant thin film retains a stable film state even at a curing temperature of ˜500° C. without being decomposed. Also, it exhibits a very uniform surface property with a low surface modulus and has such a superior coatability as to be coatable smoothly with no crack even with a thickness of 500 nm or larger. In addition, the low-dielectric-constant thin film according to the present disclosure may exhibit low dielectric property while having superior surface modulus and hardness.

Abstract: Disclosed is a light-emitting material including a polysilsesquioxane having a ladder structure with photoactive groups bonded to a siloxane backbone. In addition to superior heat resistance and mechanical property, the light-emitting material provides improved cotability and film property when prepared into a thin film. Further, it provides higher luminous efficiency than the existing organic-based light-emitting material.

Abstract: Disclosed are a polysilsesquioxane having a ladder structure with photoactive groups bonded at the siloxane main chain, and a method for preparing the same. Polysilsesquioxanes exhibiting superior thermal and mechanical properties and having various functionalities and characteristics depending on the photoactive groups introduced thereto may be prepared via a relatively simple method. The polysilsesquioxanes may be useful as an industrial material for organic-inorganic hybrid materials.