Patents by Inventor Hea-Jung KIM

Hea-Jung KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
    Patent number: 10345706
    Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: July 9, 2019
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hyun-Ji Song, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Yoo-Jeong Choi, Seung-Hee Hong
  • Method of producing layer structure, layer structure, and method of forming patterns
    Patent number: 10312074
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: June 4, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Min-Soo Kim, Hyun-Ji Song, Sun-Hae Kang, Sung-Min Kim, Sung-Hwan Kim, Young-Min Kim, Yun-Jun Kim, Hea-Jung Kim, Youn-Hee Nam, Jae-Yeol Baek, Byeri Yoon, Yong-Woon Yoon, Chung-Heon Lee, Seulgi Jeong, Yeon-Hee Jo, Seung-Hee Hong, Sun-Min Hwang, Won-Jong Hwang, Songse Yi, MyeongKoo Kim, Naery Yu
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 10018914
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. *-A-B—*??[Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: July 10, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Youn-Hee Nam, Mi-Young Kim, You-Jung Park, Yun-Jun Kim, Hea-Jung Kim, Joon-Young Moon, Hyun-Ji Song, Chung-Heon Lee, Yoo-Jeong Choi
  • Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition
    Patent number: 9683114
    Abstract: A monomer for a hardmask composition, a hardmask composition, and a method of forming patterns, the monomer being represented by the following Chemical Formula 1:
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: June 20, 2017
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Hea-Jung Kim, Sung-Hwan Kim, Youn-Hee Nam, Yun-Jun Kim, Joon-Young Moon, Hyun-Ji Song, Yong-Woon Yoon, Chung-Heon Lee
  • Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
    Patent number: 9671688
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the same. In the above Chemical Formula 1, A, A?, L, L?, X and n are the same as defined in the specification.
    Type: Grant
    Filed: October 2, 2013
    Date of Patent: June 6, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Seung-Wook Shin, Yun-Jun Kim, Hea-Jung Kim, Youn-Jin Cho, Yoo-Jeong Choi
  • Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
    Patent number: 9665003
    Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: May 30, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Hyun-Ji Song, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Seung-Hee Hong
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 9568825
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. In the Chemical Formula 1, A, B, R1 and R2 are the same as defined in the detailed description.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: February 14, 2017
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Youn-Hee Nam, Hea-Jung Kim, Hyun-Ji Song
  • Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
    Patent number: 9556094
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A1 to A3, X1 to X3, L1, L2, n and m are the same as described in the detailed description.
    Type: Grant
    Filed: June 4, 2013
    Date of Patent: January 31, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yun-Jun Kim, Hyo-Young Kwon, Hea-Jung Kim, Chung-Heon Lee, Youn-Jin Cho, Yoo-Jeong Choi
  • Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition
    Patent number: 9513546
    Abstract: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.
    Type: Grant
    Filed: March 19, 2013
    Date of Patent: December 6, 2016
    Assignee: Cheil Industries, Inc.
    Inventors: You-Jung Park, Hea-Jung Kim, Yo-Choul Park, Yong-Woon Yoon, Sung-Jae Lee, Chul-Ho Lee, Youn-Jin Cho
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 9348229
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. In the above Chemical Formula 1, A and B are as defined in the specification.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: May 24, 2016
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Youn-Hee Nam, Hea-Jung Kim, Sang-Kyun Kim, Sung-Hwan Kim, Yun-Jun Kim, Joon-Young Moon, Hyun-Ji Song
  • METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS
    Publication number: 20160126088
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Application
    Filed: June 16, 2015
    Publication date: May 5, 2016
    Inventors: Min-Soo KIM, Hyun-Ji SONG, Sun-Hae KANG, Sung-Min KIM, Sung-Hwan KIM, Young-Min KIM, Yun-Jun KIM, Hea-Jung KIM, Youn-Hee NAM, Jae-Yeol BAEK, Byeri YOON, Yong-Woon YOON, Chung-Heon LEE, Seulgi JEONG, Yeon-Hee JO, Seung-Hee HONG, Sun-Min HWANG, Won-Jong HWANG, Songse YI, MyeongKoo KIM, Naery YU
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20160017174
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. In the Chemical Formula 1, A, B, R1 and R2 are the same as defined in the detailed description.
    Type: Application
    Filed: June 24, 2015
    Publication date: January 21, 2016
    Inventors: Youn-Hee NAM, Hea-Jung KIM, Hyun-Ji SONG
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150332931
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. *-A-B-* ??[Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.
    Type: Application
    Filed: April 13, 2015
    Publication date: November 19, 2015
    Inventors: Youn-Hee NAM, Mi-Young KIM, You-Jung PARK, Yun-Jun KIM, Hea-Jung KIM, Joon-Young MOON, Hyun-Ji SONG, Chung-Heon LEE, Yoo-Jeong CHOI
  • MONOMER, HARD MASK COMPOSITION COMPRISING SAID MONOMER, AND METHOD FOR FORMING PATTERN USING SAID HARD MASK COMPOSITION
    Publication number: 20150301448
    Abstract: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.
    Type: Application
    Filed: March 19, 2013
    Publication date: October 22, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: You-Jung Park, Hea-Jung Kim, Yo-Choul Park, Yong-Woon Yoon, Sung-Jae Lee, Chul-Ho Lee, Youn-Jin Cho
  • MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING SAID MONOMER, AND METHOD FOR FORMING PATTERN USING SAID HARDMASK COMPOSITION
    Publication number: 20150301446
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the same. In the above Chemical Formula 1, A, A?, L, L?, X and n are the same as defined in the specification.
    Type: Application
    Filed: October 2, 2013
    Publication date: October 22, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Seung-Wook SHIN, Yun-Jun KIM, Hea-Jung KIM, Youn-Jin CHO, Yoo-Jeong CHOI
  • MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FORMING PATTERN BY USING HARDMASK COMPOSITION
    Publication number: 20150274622
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A1 to A3, X1 to X3, L1, L2, n and m are the same as described in the detailed description.
    Type: Application
    Filed: June 4, 2013
    Publication date: October 1, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Yun-Jun Kim, Hyo-Young Kwon, Hea-Jung Kim, Chung-Heon Lee, Youn-Jin Cho, Yoo-Jeong Choi
  • MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING THE MONOMER, AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150268558
    Abstract: A monomer for a hardmask composition, a hardmask composition, and a method of forming patterns, the monomer being represented by the following Chemical Formula 1:
    Type: Application
    Filed: January 30, 2015
    Publication date: September 24, 2015
    Inventors: Hea-Jung KIM, Sung-Hwan KIM, Youn-Hee NAM, Yun-Jun KIM, Joon-Young MOON, Hyun-Ji SONG, Yong-Woon YOON, Chung-Heon LEE
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150187589
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. In the above Chemical Formula 1, A and B are as defined in the specification.
    Type: Application
    Filed: October 30, 2014
    Publication date: July 2, 2015
    Inventors: Youn-Hee NAM, Hea-Jung KIM, Sang-Kyun KIM, Sung-Hwan KIM, Yun-Jun KIM, Joon-Young MOON, Hyun-Ji SONG
  • MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150001178
    Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,
    Type: Application
    Filed: April 22, 2014
    Publication date: January 1, 2015
    Inventors: Hyun-Ji SONG, Yun-Jun KIM, Go-Un KIM, Young-Min KIM, Hea-Jung KIM, Joon-Young MOON, Yo-Choul PARK, Yu-Shin PARK, You-Jung PARK, Seung-Wook SHIN, Yong-Woon YOON, Chung-Heon LEE, Yoo-Jeong CHOI, Seung-Hee HONG
  • HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS
    Publication number: 20150004531
    Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
    Type: Application
    Filed: April 28, 2014
    Publication date: January 1, 2015
    Inventors: Yoo-Jeong CHOI, Yun-Jun KIM, Go-Un KIM, Young-Min KIM, Hea-Jung KIM, Joon-Young MOON, Yo-Choul PARK, Yu-Shin PARK, You-Jung PARK, Hyun-Ji SONG, Seung-Wook SHIN, Yong-Woon YOON, Chung-Heon LEE, Seung-Hee HONG