Patents by Inventor Headway Technologies, Inc.

Headway Technologies, Inc. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140315045
    Abstract: The use of supermalloy-like materials for the side and top shields of a magnetic bit sensor is shown to provide better shielding protection from stray fields because of their extremely high permeability.
    Type: Application
    Filed: April 18, 2013
    Publication date: October 23, 2014
    Applicant: Headway Technologies, Inc.
    Inventor: Headway Technologies, Inc.
  • Publication number: 20130088797
    Abstract: Plasma nitridation, in place of plasma oxidation, is used for the formation of a CCP layer. Al, Mg, Hf, etc. all form insulating nitrides under these conditions. Maintaining the structure at a temperature of at least 150° C. during plasma nitridation and/or performing post annealing at a temperature of 220° C. or higher, ensures that no copper nitride can form.
    Type: Application
    Filed: December 2, 2012
    Publication date: April 11, 2013
    Applicant: Headway Technologies, Inc.
    Inventor: Headway Technologies, Inc.