Patents by Inventor Heath B. DeShong

Heath B. DeShong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Enhanced remote plasma cleaning
    Patent number: 6868856
    Abstract: Methods and apparatus for cleaning semiconductor processing equipment. The apparatus include both local and remote gas dissociators coupled to a semiconductor processing chamber to be cleaned. The methods include introducing a precursor gas into the remote dissociator where the gas is dissociated and introducing a portion of the dissociated gas into the chamber. Another portion of the dissociated gas which re-associates before introduction into the chamber is also introduced into the chamber where it is again dissociated. The dissociated gas combines with contaminants in the chamber and is exhausted from the chamber along with the contaminants.
    Type: Grant
    Filed: July 13, 2001
    Date of Patent: March 22, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Thomas Nowak, Ian Latchford, Tsutomu Tanaka, Bok Heon Kim, Ping Xu, Jason Foster, Heath B. DeShong, Martin Seamons
  • Enhanced remote plasma cleaning
    Publication number: 20030010355
    Abstract: Methods and apparatus for cleaning semiconductor processing equipment. The apparatus include both local and remote gas dissociators coupled to a semiconductor processing chamber to be cleaned. The methods include introducing a precursor gas into the remote dissociator where the gas is dissociated and introducing a portion of the dissociated gas into the chamber. Another portion of the dissociated gas which re-associates before introduction into the chamber is also introduced into the chamber where it is again dissociated. The dissociated gas combines with contaminants in the chamber and is exhausted from the chamber along with the contaminants.
    Type: Application
    Filed: July 13, 2001
    Publication date: January 16, 2003
    Applicant: Applied Materials, Inc
    Inventors: Thomas Nowak, Ian Latchford, Tsutomu Tanaka, Bok H. Kim, Ping Xu, Jason Foster, Heath B. DeShong, Martin Seamons