Abstract: A method of making a glass lenticular array is provided. The method comprises: heating a sheet of glass, the sheet of glass comprising contact regions located thereupon in substantially parallel linear rows; and deforming the heated sheet of glass by contacting the contact regions with a forming body so as to form a plurality of cylindrical lenses in the heated sheet of glass, the plurality of cylindrical lenses arranged in substantially parallel rows with depressed regions between adjacent cylindrical lenses. The depressed regions are formed at the contact regions while apex regions of the cylindrical lenses are kept untouched during the step of deforming.

Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength region of less than about 250 nm and particularly, exhibiting a low laser induced density change. The synthetic silica glass optical material of the present invention contains at least about 0.1 ppm of aluminum and H2 concentration levels greater than about 0.5×1017 molecules/cm2. Additionally, the synthetic silica optical material of the present invention exhibits an H2 to Al ratio of greater than about 1.2, as measured in ×1017/cm3 molecules H2 per ppm Al.

Abstract: An optical fiber is disclosed in which the core region of the optical fiber is doped with Cl and F in order to reduce the viscosity mismatch between the core region and the adjacent cladding region. In one embodiment of the invention, the optical fiber is a single-mode step index optical fiber having a core region doped with Cl and F in an amount effective to produce a difference in temperature between the glass transition temperature of the core region and the glass transition temperature of the adjacent cladding region of less than about 200° C.

Abstract: An optical fiber is disclosed in which the core region of the optical fiber is doped with Cl and F in order to reduce the viscosity mismatch between the core region and the adjacent cladding region. In one embodiment of the invention, the optical fiber is a single-mode step index optical fiber having a core region doped with Cl and F in an amount effective to produce a difference in temperature between the glass transition temperature of the core region and the glass transition temperature of the adjacent cladding region of less than about 200° C.

Abstract: A method of forming an optical fiber by heat treating a consolidated glass article, doped with at least one refractive index-modifying dopant, at a temperature between about 1100° C. and 1400° C. and for a time between about 1 hour and 12 hours in a helium-containing atmosphere. The consolidated glass article is an optical fiber precursor. The optical fiber drawn from the heat treated consolidated glass article exhibits an attenuation lower than an optical fiber drawn from a substantially identical optical fiber precursor that has not been heat treated in accordance with the present invention.

Abstract: A method of manufacturing an optical waveguide perform includes exposing a soot preform to an atmosphere including a chlorine-containing compound and thereby doping the soot preform with chlorine, wherein the absolute pressure of the atmosphere is greater than about 1.013×102 kPa. An apparatus for manufacturing an optical waveguide preform using a soot preform includes a furnace defining a chamber adapted to contain the soot preform and including a heating device operable to heat the chamber. A fluid control system is operable to provide an atmosphere including a chlorine-containing compound in the chamber at an absolute pressure of greater than about 1.013×102 kPa.

Abstract: A method for applying a flame for depositing a doped layer to a wafer and chuck particularly adapted for suspending the wafer over the flame. The chuck includes a frame having an opening defined by an inner wall for receiving a wafer and a ledge surrounding at least a portion of a lower end of the opening for retaining a wafer placed into an upper end of the opening, and a suspension assembly for suspending the frame over a dopant-depositing flame such that the ledge is disposed between the flame and peripheral portions of the wafer. The inner wall and the ledge may be formed from a material having substantially the same thermal conduction and expansion characteristics as the wafer. The suspension assembly may be rotatable with respect to a dopant-depositing flame. The frame may have a plurality of openings, each for receiving a wafer. The suspension assembly may include a suspension member, and a support post connecting the suspension member to the frame.

Abstract: An optical device is provided including a substrate having an underclad layer, a core layer, and a pair of overclad layers deposited thereon. The substrate has a first coefficient of thermal expansion. The underclad layer has a first index of refraction. The first overclad layer has an index of refraction which is approximately equal to the first index of refraction. The second overclad layer has a coefficient of thermal expansion which is greater than the first coefficient of thermal expansion.

Abstract: A glass component in an optical system, which may be a lazing or an optical amplifying medium, comprising a silicate base glass doped with at least two Group III B elements, the glass, and a method of preventing clustering of a rare earth metal ion in the glass.

Abstract: A glass component in an optical system, which may be a lazing or an optical amplifying medium, comprising a silicate base glass doped with at least two Group III B elements, the glass, and a method of preventing clustering of a rare earth metal ion in the glass.

Abstract: A method and apparatus for the flame hydrolysis deposition (FHD) of a core material on a substrate provides a holder for a substrate which is heated to a predetermined temperature selected to maintain the substrate temperature relatively constant during the FHD process. As a result, the thickness of a thin film applied to the substrate is relatively uniform as is the index of refraction of the core material deposited on the substrate. In one embodiment, a chuck for receiving a disk-shaped substrate wafer is supplied with an embedded electrical heater for maintaining the chuck temperature at from about 700° C. to about 900° C. In another embodiment, a gas heater positioned on a side of the chuck opposite the wafer mounting is provided to heat the chuck at substantially the same temperature.