Patents by Inventor Heather Tyler

Heather Tyler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6825127
    Abstract: In a method of fabricating a microstructure for micro-fluidics applications, a mechanically stable support layer is formed over a layer of etchable material. An anisotropic etch is preformed through a mask to form a pattern of holes extending through the support layer into said etchable material. An isotropic etch is performed through each said hole to form a corresponding cavity in the etchable material under each hole and extending under the support layer. A further layer of depositable material is formed over the support layer until portions of the depositable layer overhanging each said hole meet and thereby close the cavity formed under each hole. The invention permits the formation of micro-channels and filters of varying configuration.
    Type: Grant
    Filed: July 24, 2001
    Date of Patent: November 30, 2004
    Assignee: Zarlink Semiconductor Inc.
    Inventors: Luc Ouellet, Heather Tyler
  • Patent number: 6602791
    Abstract: In a method of fabricating a microstructure for microfluidics applications, a first layer of etchable material is formed on a suitable substrate. A mechanically stable support layer is formed over the etchable material. A mask is applied over the support to expose at least one opening in the mask. An anistropic etch is then performed through the opening to create a bore extending through the support layer to said layer of etchable material. After performing an isotropic etch through the bore to form a microchannel in the etchable material extending under the support layer, a further layer is deposited over the support layer until overhanging portions meet and thereby close the microchannel formed under the opening.
    Type: Grant
    Filed: April 27, 2001
    Date of Patent: August 5, 2003
    Assignee: Dalsa Semiconductor Inc.
    Inventors: Luc Ouellet, Heather Tyler
  • Publication number: 20030022505
    Abstract: In a method of fabricating a microstructure for micro-fluidics applications, a mechanically stable support layer is formed over a layer of etchable material. An anisotropic etch is preformed through a mask to form a pattern of holes extending through the support layer into said etchable material. An isotropic etch is performed through each said hole to form a corresponding cavity in the etchable material under each hole and extending under the support layer. A further layer of depositable material is formed over the support layer until portions of the depositable layer overhanging each said hole meet and thereby close the cavity formed under each hole. The invention permits the formation of micro-channels and filters of varying configuration.
    Type: Application
    Filed: July 24, 2001
    Publication date: January 30, 2003
    Inventors: Luc Ouellet, Heather Tyler
  • Publication number: 20020160561
    Abstract: In a method of fabricating a microstructure for microfluidics applications, a first layer of etchable material is formed on a suitable substrate. A mechanically stable support layer is formed over the etchable material. A mask is applied over the support to expose at least one opening in the mask. An anistropic etch is then performed through the opening to create a bore extending through the support layer to said layer of etchable material. After performing an isotropic etch through the bore to form a microchannel in the etchable material extending under the support layer, a further layer is deposited over the support layer until overhanging portions meet and thereby close the microchannel formed under the opening.
    Type: Application
    Filed: April 27, 2001
    Publication date: October 31, 2002
    Inventors: Luc Ouellet, Heather Tyler