Patents by Inventor Hea Yun Lee
Hea Yun Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240087457Abstract: A method of providing a parking service comprises calculating overlap degree of a target vehicle and specific parking area by analyzing a parking monitoring image obtained from a sensor for monitoring specific parking area at a first time of point and determining through the calculated overlap degree whether the target vehicle is parked; recording the target vehicle in an exit queue when the target vehicle goes out of the specific parking area by analyzing a parking monitoring image obtained from the sensor at a second time of point; performing an exit process when the target vehicle included in the exit queue moves to go out of the specific parking area by analyzing a parking monitoring image obtained from the sensor at a third time of point. A payment process in accordance with an exit of the target vehicle is performed based on payment information preregistered when the target vehicle is parked.Type: ApplicationFiled: November 23, 2023Publication date: March 14, 2024Inventors: Jin Ha JEONG, Moon Soo RA, Hea Yun LEE
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Patent number: 9058956Abstract: A method of forming a reticle includes: loading a blank reticle; projecting an electron beam; moving a second aperture plate having a first pattern aperture and a second pattern aperture so that the first pattern aperture is directly overlapped by a first aperture of a first aperture plate, the electron beam passing through the first pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the first pattern aperture, to form a first exposure pattern; moving the second aperture plate so that the second pattern aperture is directly overlapped by the first aperture of the first aperture plate, the electron beam passing through the second pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the second pattern aperture, to form a second exposure pattern; and developing the blank reticle having the first and second exposure patterns to form the reticle having firsType: GrantFiled: April 9, 2014Date of Patent: June 16, 2015Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jin Choi, Jin-Ha Jeong, Urazaev Vladimir, Hea-Yun Lee
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Publication number: 20140218710Abstract: A method of forming a reticle includes: loading a blank reticle; projecting an electron beam; moving a second aperture plate having a first pattern aperture and a second pattern aperture so that the first pattern aperture is directly overlapped by a first aperture of a first aperture plate, the electron beam passing through the first pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the first pattern aperture, to form a first exposure pattern; moving the second aperture plate so that the second pattern aperture is directly overlapped by the first aperture of the first aperture plate, the electron beam passing through the second pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the second pattern aperture, to form a second exposure pattern; and developing the blank reticle having the first and second exposure patterns to form the reticle having firsType: ApplicationFiled: April 9, 2014Publication date: August 7, 2014Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jin CHOI, Jin-Ha JEONG, Urazaev VLADIMIR, Hea-Yun LEE
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Patent number: 8697317Abstract: A method including loading a blank reticle; projecting an electron beam; moving a second aperture plate having a first and second pattern aperture so the first pattern aperture is overlapped by a first aperture of a first aperture plate, the electron beam passing through the first pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam that passes the first pattern aperture to form a first exposure pattern; moving the second aperture plate so the second pattern aperture is overlapped by the first aperture of the first aperture plate, the electron beam passing through the second pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after passing the second pattern aperture, to form a second exposure pattern; and developing the blank reticle having the first and second exposure patterns to form the reticle having first and second patterns.Type: GrantFiled: August 1, 2012Date of Patent: April 15, 2014Assignee: Samsung Electronics Co., Ltd.Inventors: Jin Choi, Jin-Ha Jeong, Urazaev Vladimir, Hea-Yun Lee
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Patent number: 8609305Abstract: In a method of forming a reticle and electron beam exposure system, first electron beams are irradiated onto a first region of a blank reticle having a light shielding layer and a photosensitive layer, to form first shot patterns. Second electron beams having a cross-sectional area larger than the first electron beams are irradiated onto a second region of the blank reticle. The photosensitive layer is developed to form first and second mask patterns at the first and second regions, respectively. The light shielding layer is etched off using the first and second mask patterns as an etching mask, thereby forming the mother pattern including a first pattern in the first region and a second pattern in the second region. Accordingly, the enlargement of the second electron beams reduces the scan time for the blank reticle, thereby reducing the process time.Type: GrantFiled: April 10, 2012Date of Patent: December 17, 2013Assignee: Samsung Electronics Co., Ltd.Inventors: Jin Choi, Jin-Ha Jeong, Urazaev Vladimir, Hea-Yun Lee
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Patent number: 8563951Abstract: Exposure systems include a beam generator, which is configured to irradiate source beams in a direction of an object to be exposed by the source beams, along with first and second beam shapers. The first beam shaper, which is disposed proximate the beam generator, has a first aperture therein positioned to pass through the source beams received from the beam generator. The second beam shaper is disposed proximate the first beam shaper. The second beam shaper includes a plate having a second aperture therein, which is positioned to receive the source beams that are passed through the first aperture of the first beam shaper. The second beam shaper further includes a first actuator and a first shift screen mechanically coupled to the first actuator.Type: GrantFiled: March 14, 2012Date of Patent: October 22, 2013Assignee: Samsung Electronics Co., Ltd.Inventors: Jin Choi, Jin-Ha Jeong, Vladimir Urazaev, Hea-Yun Lee
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Publication number: 20130052569Abstract: A method including loading a blank reticle; projecting an electron beam; moving a second aperture plate having a first and second pattern aperture so the first pattern aperture is overlapped by a first aperture of a first aperture plate, the electron beam passing through the first pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam that passes the first pattern aperture to form a first exposure pattern; moving the second aperture plate so the second pattern aperture is overlapped by the first aperture of the first aperture plate, the electron beam passing through the second pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after passing the second pattern aperture, to form a second exposure pattern; and developing the blank reticle having the first and second exposure patterns to form the reticle having first and second patterns.Type: ApplicationFiled: August 1, 2012Publication date: February 28, 2013Inventors: Jin CHOI, Jin-Ha Jeong, Urazaev Vladimir, Hea-Yun Lee
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Publication number: 20120292535Abstract: Exposure systems include a beam generator, which is configured to irradiate source beams in a direction of an object to be exposed by the source beams, along with first and second beam shapers. The first beam shaper, which is disposed proximate the beam generator, has a first aperture therein positioned to pass through the source beams received from the beam generator. The second beam shaper is disposed proximate the first beam shaper. The second beam shaper includes a plate having a second aperture therein, which is positioned to receive the source beams that are passed through the first aperture of the first beam shaper. The second beam shaper further includes a first actuator and a first shift screen mechanically coupled to the first actuator.Type: ApplicationFiled: March 14, 2012Publication date: November 22, 2012Inventors: Jin Choi, Jin-Ha Jeong, Vladimir Urazaev, Hea-Yun Lee
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Publication number: 20120288787Abstract: In a method of forming a reticle and electron beam exposure system, first electron beams are irradiated onto a first region of a blank reticle having a light shielding layer and a photosensitive layer, to form first shot patterns. Second electron beams having a cross-sectional area larger than the first electron beams are irradiated onto a second region of the blank reticle. The photosensitive layer is developed to form first and second mask patterns at the first and second regions, respectively. The light shielding layer is etched off using the first and second mask patterns as an etching mask, thereby forming the mother pattern including a first pattern in the first region and a second pattern in the second region. Accordingly, the enlargement of the second electron beams reduces the scan time for the blank reticle, thereby reducing the process time.Type: ApplicationFiled: April 10, 2012Publication date: November 15, 2012Inventors: Jin Choi, Jin-Ha Jeong, Urazaev Vladimir, Hea-Yun Lee
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Publication number: 20110214457Abstract: Disclosed herein are a washing machine that amplifies the displacement of a tub according to input of laundry such that the displacement of the tub is accurately sensed by a sensor module and a laundry amount detection apparatus thereof. The washing machine includes a housing forming an external appearance thereof, a tub provided in the housing to contain water, an amplification unit to amplify displacement of the tub, and a sensor module to sense weight of laundry using the amplified displacement of the tub.Type: ApplicationFiled: February 24, 2011Publication date: September 8, 2011Applicant: Samsung Electronics Co., Ltd.Inventors: Jeong Su HAN, Jin Ha JEONG, Ivanov GENNADY, Hea Yun LEE, Jun hoe CHOI, Ji Hoon HA, Tae Gyoon NOH
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Publication number: 20110113568Abstract: Disclosed herein are a washing machine and a control method of the same wherein image change or light amount change based on displacement of an object, which is changed depending upon the weight of laundry, is sensed to detect the weight of the laundry, thereby improving reliability in detecting the weight of the laundry.Type: ApplicationFiled: November 11, 2010Publication date: May 19, 2011Applicant: Samsung Electronics Co., Ltd.Inventors: Jeong Su HAN, Ivanov Gennady, Jin Ha Jeong, Hea Yun Lee, Hyen Young Choi, Seung Back Shin, Sang Jun Lee, Ji Hoon Ha