Patents by Inventor Hee-chan Jung

Hee-chan Jung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250144004
    Abstract: Provided are a fermented apple composition having an effect of reducing or inhibiting UV-induced collagenase expression, and use thereof in the skin improvement and in the prevention or inhibition of skin photoaging.
    Type: Application
    Filed: December 5, 2022
    Publication date: May 8, 2025
    Applicant: CJ CHEILJEDANG CORPORATION
    Inventors: Kyung Chan JEON, Hee Kyoung JUNG, Sunhee KIM, Yeeun PARK, Eunyong LEE
  • Publication number: 20250121774
    Abstract: The present disclosure relates to a method and an apparatus of generating a surround view monitoring (SVM) image. The method includes: obtaining installation information of an actual camera installed on a ship; setting a virtual camera to orient toward a ground plane perpendicularly within a world coordinate system; calculating a conversion relationship between the virtual camera and the actual camera, based on the installation information of the actual camera; generating the SVM image based on the calculated conversion relationship; and controlling the ship based on the generated SVM image.
    Type: Application
    Filed: December 27, 2024
    Publication date: April 17, 2025
    Inventors: Dae Yong HAN, Hee Chan Jung, Seong Jong Jo
  • Patent number: 12258071
    Abstract: A method for manufacturing a lightweight cowl crossbar includes: producing an inner pipe, laminating a plurality of composite material layers wound around the inner pipe, and extruding an outer pipe on the winding layer, in which the plurality of composite material layers adjacent to each other are wound in different directions.
    Type: Grant
    Filed: December 21, 2020
    Date of Patent: March 25, 2025
    Assignees: HYUNDAI MOTOR COMPANY, KIA MOTORS CORPORATION, LG HAUSYS, LTD., HYUNDAI MOBIS CO., LTD.
    Inventors: Jae Hyun An, In Soo Han, Hee Seok Kim, Il Sang Kim, Ik Jin Jung, Kyeong Hoon Jang, Young Jin You, Sang Hyeon Park, Wook Hee Lee, Yong Woo Jung, Ik Keun Choi, Young Chan Cho
  • Publication number: 20250094773
    Abstract: A method, of training an anomaly detecting model using a plurality of pieces of graph data, includes: (a) inputting one piece of graph data that has not yet been input, among the plurality of pieces of graph data, to a graph neural network (GNN) AutoEncoder calculating a probability of each edge as input data; (b) calculating a difference value (hereinafter, “edge difference value”) between an edge probability value of reconstructed data output by the GNN AutoEncoder and an edge value of the input data; (c) calculating an average value (hereinafter, “positive edge loss”) of a positive edge and an average value (hereinafter, “negative edge loss”) of a negative edge using the edge difference value, and calculating an edge prediction loss value of the reconstructed data by summing the positive edge loss and the negative edge loss; (d) retraining the GNN AutoEncoder until the edge prediction loss value is minimized.
    Type: Application
    Filed: December 2, 2024
    Publication date: March 20, 2025
    Applicant: UDMTEK CO., LTD.
    Inventors: Gi Nam Wang, Jun Pyo Park, Seung Woo Han, Geun Ho Yu, Min Young Jung, Hee Chan Yang, Seung Jong Jin
  • Publication number: 20250058291
    Abstract: An apparatus for controlling viscosity of a slurry includes a mixing module mixing raw materials for a secondary battery, and a processor performing machine learning for prediction of viscosity of the slurry, predicting viscosity of the slurry in real time during a mixing process through machine learning, and adjusting conditions of the mixing process performed by the mixing module such that a predictive viscosity of the slurry meets a target viscosity.
    Type: Application
    Filed: December 8, 2023
    Publication date: February 20, 2025
    Inventors: Bo Ra KIM, Yong Jin KIM, Jake KIM, Tae Sung AHN, Hee Chan JUNG, Yong Jun HWANG, Jee Hoon HAN, Jong Man KIM, Gi Heon KIM
  • Publication number: 20250032834
    Abstract: A battery rack controls thermal events. An electric power storage system includes the battery rack. A battery rack includes a battery module, a rack frame configured to accommodate the battery module, a fire extinguishing agent supply module disposed on one side of the rack frame and connected to the battery module, and a support module coupled to the one side of the rack frame and configured to support the fire extinguishing agent supply module such that the fire extinguishing agent supply module faces the battery module.
    Type: Application
    Filed: July 17, 2023
    Publication date: January 30, 2025
    Applicant: LG ENERGY SOLUTION, LTD.
    Inventors: Seung-Jun LEE, Hee-Chan KIM, Kown SON, Goan-Su JUNG, Jung-Beom PARK, Byung-Hyuk CHOI
  • Publication number: 20250025515
    Abstract: The present disclosure relates to a composition for immune enhancement or gut health improvement, which is fermented with a composition for fermentation containing any one or more selected from a Leuconostoc mesenteroides CJLM119 strain or a culture thereof and contains any one or more selected from a culture of Leuconostoc mesenteroides CJLM119 strain, a lysate thereof, an extract thereof, or a component derived therefrom.
    Type: Application
    Filed: November 29, 2022
    Publication date: January 23, 2025
    Applicant: CJ CHEILJEDANG CORPORATION
    Inventors: Na Youn HONG, Kyung Chan JEON, Hee Kyoung JUNG, Seung Hye CHOI, Hee Yoon AHN, Eunyong LEE, Ji Eun ROH, So-Hyeon SON
  • Publication number: 20160005644
    Abstract: Provided are methods of surface treatment, semiconductor devices and methods of forming the semiconductor device. The methods of forming the semiconductor device include forming a first oxide layer and a second oxide layer on a substrate. The first and second oxide layers are patterned to form a contact hole exposing the substrate. A sidewall of the first oxide layer exposed by the contact hole reacts with HF to form a first reaction layer and a sidewall of the second oxide layer exposed by the contact hole reacts with NH3 and HF to form a second reaction layer. The first and second reaction layers are removed to enlarge the contact hole. A contact plug is formed in the enlarged contact hole.
    Type: Application
    Filed: September 16, 2015
    Publication date: January 7, 2016
    Inventors: Hun-Hee Lee, Min-Sang Yun, Hee-Chan Jung, Seung-Kyung Ahn
  • Publication number: 20090020884
    Abstract: Provided are methods of surface treatment, semiconductor devices and methods of forming the semiconductor device. The methods of forming the semiconductor device include forming a first oxide layer and a second oxide layer on a substrate. The first and second oxide layers are patterned to form a contact hole exposing the substrate. A sidewall of the first oxide layer exposed by the contact hole reacts with HF to form a first reaction layer and a sidewall of the second oxide layer exposed by the contact hole reacts with NH3 and HF to form a second reaction layer. The first and second reaction layers are removed to enlarge the contact hole. A contact plug is formed in the enlarged contact hole.
    Type: Application
    Filed: July 18, 2008
    Publication date: January 22, 2009
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hun-Hee LEE, Min-Sang YUN, Hee-Chan JUNG, Seung-Kyung AHN
  • Publication number: 20070181148
    Abstract: Embodiments of the invention provide a semiconductor wafer cleaning apparatus and a related method. In one embodiment, the invention provides a semiconductor wafer cleaning apparatus comprising a wafer stage adapted to support a wafer; a first cleaning unit adapted to spray a first cleaning solution onto the wafer to remove particles from the wafer, wherein the first cleaning solution prevents static electricity from being generated on the surface of the wafer; and a second cleaning unit adapted to provide a second cleaning solution onto the wafer and oscillate a quartz rod to remove particles from the wafer, wherein the second cleaning solution makes a surface of the wafer hydrophilic.
    Type: Application
    Filed: December 21, 2006
    Publication date: August 9, 2007
    Inventors: Min-Sang Yun, Kwon Son, Jae-Hyung Jung, Hee-Chan Jung, Ki-Ryong Choi, Byung-Joo Park, Kang-Young Kim
  • Patent number: 6052193
    Abstract: A wafer loading-state inspection apparatus includes a transmissive wafer sensor including a light emitter and a light detector. The light emitter is spaced apart from the light detector in a horizontal plane by a predetermined separation distance. The wafer sensor generates wafer pulses indicating whether a wafer is detected between the light emitter and the light detector. A wafer sensor support has a first arm connected to the light emitter and a second arm connected to the light detector. A vertically oriented post is connected to the wafer sensor support at one end. Connected at the other end of the post is a driving mechanism which produces a reciprocating vertical movement of the post over a vertical range.
    Type: Grant
    Filed: July 15, 1998
    Date of Patent: April 18, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yong-cho Kim, Hee-chan Jung