Patents by Inventor Hee Ock PARK

Hee Ock PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240181380
    Abstract: A scrubber system may include a scrubber housing including a vertically extended cleaning space, an inflow chamber coupled to a bottom portion of the scrubber housing, and first and second inflow portions, each of which is configured to supply a gas into the inflow chamber. The inflow chamber may include a mixing space, and the mixing space may be connected to the cleaning space. The first inflow portion may include a first connection pipe coupled to the inflow chamber to provide a first connection path and the second inflow portion may include a second connection pipe coupled to the inflow chamber to provide a second connection path. The first and second connection paths may be extended toward the mixing space in opposite directions, respectively, and may be connected to opposite portions of the mixing space, respectively.
    Type: Application
    Filed: February 15, 2024
    Publication date: June 6, 2024
    Applicants: Samsung Electronics Co., Ltd., Global Standard Technology Co.,LTD
    Inventors: Young Seok ROH, Suji GIM, Heesub KIM, Hee Ock PARK, Jongyong BAE, Sung Chul YOON, Sunsoo LEE, Dong Keun JEON, Jinkyoung JOO
  • Patent number: 11931683
    Abstract: A scrubber system may include a scrubber housing including a vertically extended cleaning space, an inflow chamber coupled to a bottom portion of the scrubber housing, and first and second inflow portions, each of which is configured to supply a gas into the inflow chamber. The inflow chamber may include a mixing space, and the mixing space may be connected to the cleaning space. The first inflow portion may include a first connection pipe coupled to the inflow chamber to provide a first connection path and the second inflow portion may include a second connection pipe coupled to the inflow chamber to provide a second connection path. The first and second connection paths may be extended toward the mixing space in opposite directions, respectively, and may be connected to opposite portions of the mixing space, respectively.
    Type: Grant
    Filed: October 15, 2021
    Date of Patent: March 19, 2024
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young Seok Roh, Suji Gim, Heesub Kim, Hee Ock Park, Jongyong Bae, Sung Chul Yoon, Sunsoo Lee, Dong Keun Jeon, Jinkyoung Joo
  • Publication number: 20220226868
    Abstract: A scrubber system may include a scrubber housing including a vertically extended cleaning space, an inflow chamber coupled to a bottom portion of the scrubber housing, and first and second inflow portions, each of which is configured to supply a gas into the inflow chamber. The inflow chamber may include a mixing space, and the mixing space may be connected to the cleaning space. The first inflow portion may include a first connection pipe coupled to the inflow chamber to provide a first connection path and the second inflow portion may include a second connection pipe coupled to the inflow chamber to provide a second connection path. The first and second connection paths may be extended toward the mixing space in opposite directions, respectively, and may be connected to opposite portions of the mixing space, respectively.
    Type: Application
    Filed: October 15, 2021
    Publication date: July 21, 2022
    Applicants: Samsung Electronics Co., Ltd., Global Standard Technology Co.,LTD
    Inventors: Young Seok ROH, Suji GIM, Heesub KIM, Hee Ock PARK, Jongyong BAE, Sung Chul YOON, Sunsoo LEE, Dong Keun JEON, Jinkyoung JOO