Abstract: A method for manufacturing a lightweight cowl crossbar includes: producing an inner pipe, laminating a plurality of composite material layers wound around the inner pipe, and extruding an outer pipe on the winding layer, in which the plurality of composite material layers adjacent to each other are wound in different directions.

Abstract: The disclosed technology generally relates to forming a titanium nitride layer, and more particularly to forming by atomic layer deposition a titanium nitride layer on a seed layer. In one aspect, a semiconductor structure comprises a semiconductor substrate comprising a non-metallic surface. The semiconductor structure additionally comprises a seed layer comprising silicon (Si) and nitrogen (N) conformally coating the non-metallic surface and a TiN layer conformally coating the seed layer. Aspects are also directed to methods of forming the semiconductor structures.

Abstract: Provided is a batch-type substrate processing apparatus. The substrate processing apparatus includes a vertical reaction tube having an internal space for receiving a substrate boat in which a substrate is stacked in multiple stages, a deposition gas supply unit configured to supply a deposition gas inside the reaction tube, a heater disposed outside the reaction tube to provide a thermal energy inside the reaction tube, and an adhesion layer coated on an inner wall of the reaction tube and to which a deposition by-product layer by an excess deposition gas is attached.

Abstract: The disclosed technology generally relates to forming a titanium nitride layer, and more particularly to forming by atomic layer deposition a titanium nitride layer on a seed layer. In one aspect, a semiconductor structure comprises a semiconductor substrate comprising a non-metallic surface. The semiconductor structure additionally comprises a seed layer comprising silicon (Si) and nitrogen (N) conformally coating the non-metallic surface and a TiN layer conformally coating the seed layer. Aspects are also directed to methods of forming the semiconductor structures.

Abstract: A lightweight cowl crossbar includes: a first cowl crossbeam located on a first side frame disposed at a first side of a vehicle body; a second cowl crossbeam fastened to the first cowl crossbeam and fixed to a second side frame disposed at a second side of the vehicle body; a support leg located on the second cowl crossbeam and configured to be supported by the vehicle body, and a drawing block part located on a region where the first cowl crossbeam and the second cowl crossbeam overlap.

Abstract: A method for manufacturing a lightweight cowl crossbar includes: producing an inner pipe, laminating a plurality of composite material layers wound around the inner pipe, and extruding an outer pipe on the winding layer, in which the plurality of composite material layers adjacent to each other are wound in different directions.

Abstract: A lightweight cowl crossbar includes: a first cowl crossbeam located on a first side frame disposed at a first side of a vehicle body; a second cowl crossbeam fastened to the first cowl crossbeam and fixed to a second side frame disposed at a second side of the vehicle body; a support leg located on the second cowl crossbeam and configured to be supported by the vehicle body, and a drawing block part located on a region where the first cowl crossbeam and the second cowl crossbeam overlap.

Abstract: The disclosed technology generally relates to forming a titanium nitride layer, and more particularly to forming by atomic layer deposition a titanium nitride layer on a seed layer. In one aspect, a semiconductor structure comprises a semiconductor substrate comprising a non-metallic surface. The semiconductor structure additionally comprises a seed layer comprising silicon (Si) and nitrogen (N) conformally coating the non-metallic surface and a TiN layer conformally coating the seed layer. Aspects are also directed to methods of forming the semiconductor structures.

Abstract: Provided is a batch-type substrate processing apparatus. The substrate processing apparatus includes a vertical reaction tube having an internal space for receiving a substrate boat in which a substrate is stacked in multiple stages, a deposition gas supply unit configured to supply a deposition gas inside the reaction tube, a heater disposed outside the reaction tube to provide a thermal energy inside the reaction tube, and an adhesion layer coated on an inner wall of the reaction tube and to which a deposition by-product layer by an excess deposition gas is attached.

Abstract: A universal buck for a sled test is provided. The buck includes a support plate, and a plurality of pillars that are mounted on the support plate. Additionally, a roof is mounted on at least some of the plurality of pillars and a wind shield is mounted between pillars disposed on a front side among the plurality of pillars and a front end of the roof. The plurality of pillars, the roof, and the wind shield are mounted to be adjustable in position on the support plate.

Abstract: A universal buck for a sled test includes a support plate rotatably installed to adjust a yawing angle of the support plate, a plurality of pillars mounted on the support plate, a roof mounted on at least some of the plurality of pillars, and a windshield mounted between pillars disposed on a front side among the plurality of pillars and a front end of the roof, wherein the plurality of pillars, the roof, and the windshield are mounted to be adjustable in position on the support plate.

Abstract: A universal buck for a sled test is provided. The buck includes a support plate, and a plurality of pillars that are mounted on the support plate. Additionally, a roof is mounted on at least some of the plurality of pillars and a wind shield is mounted between pillars disposed on a front side among the plurality of pillars and a front end of the roof. The plurality of pillars, the roof, and the wind shield are mounted to be adjustable in position on the support plate.

Abstract: A universal buck for a sled test includes a support plate rotatably installed to adjust a yawing angle of the support plate, a plurality of pillars mounted on the support plate, a roof mounted on at least some of the plurality of pillars, and a windshield mounted between pillars disposed on a front side among the plurality of pillars and a front end of the roof, wherein the plurality of pillars, the roof, and the windshield are mounted to be adjustable in position on the support plate.

Abstract: In a method of forming an epitaxial layer, an etching gas may be decomposed to form decomposed etching gases. A source gas may be decomposed to form decomposed source gases. The decomposed source gases may be applied to a substrate to form the epitaxial layer on the substrate. A portion of the epitaxial layer on a specific region of the substrate may be etched using the decomposed etching gases. Before the etching gas is introduced into the reaction chamber, the etching gas may be previously decomposed. The decomposed etching gases may then be introduced into the reaction chamber to etch the epitaxial layer on the substrate. As a result, the epitaxial layer on the substrate may have a uniform distribution.

Abstract: In a method of forming an epitaxial layer, an etching gas may be decomposed to form decomposed etching gases. A source gas may be decomposed to form decomposed source gases. The decomposed source gases may be applied to a substrate to form the epitaxial layer on the substrate. A portion of the epitaxial layer on a specific region of the substrate may be etched using the decomposed etching gases. Before the etching gas is introduced into the reaction chamber, the etching gas may be previously decomposed. The decomposed etching gases may then be introduced into the reaction chamber to etch the epitaxial layer on the substrate. As a result, the epitaxial layer on the substrate may have a uniform distribution.

Abstract: In a method of forming an epitaxial layer, an etching gas may be decomposed to form decomposed etching gases. A source gas may be decomposed to form decomposed source gases. The decomposed source gases may be applied to a substrate to form the epitaxial layer on the substrate. A portion of the epitaxial layer on a specific region of the substrate may be etched using the decomposed etching gases. Before the etching gas is introduced into the reaction chamber, the etching gas may be previously decomposed. The decomposed etching gases may then be introduced into the reaction chamber to etch the epitaxial layer on the substrate. As a result, the epitaxial layer on the substrate may have a uniform distribution.

Abstract: A processor including a coarse grained array including a plurality of processing elements, a central register file including a first plurality of register files, a shadow central register file including a second plurality of register files, each of the second plurality of register files corresponding to each of the first plurality of register files included in the central register file, and a plurality of shadow register files, each of the plurality of shadow register files corresponding to each of a third plurality of register files included in predetermined processing elements selected from the plurality of processing elements.

Abstract: A substrate transferring device is disclosed. In one aspect, the substrate transferring device includes substrate to transfer the substrate in one direction and a plurality of side rollers. Each roller includes a side roller main body configured to rotate while contacting a side surface of the substrate to prevent the substrate from being deviated from the one direction. The roller also includes a side roller support which is coupled to a lower part of the side roller main body or a lower part of the side roller main body when the side roller main body is turned upside down in a vertical direction to vary a position of a contact line where the side surface of the substrate is in contact with the side roller main body. The roller further includes a fixing member which is coupled to the side roller support inside the side roller main body.

Abstract: An apparatus for measuring the strength of concrete using a surface wave velocity including an ultrasonic transmission and reception probe is provided. The apparatus is configured to include a surface wave velocity measurement device including an ultrasonic transmission probe and an ultrasonic reception probe. Further, a method of constructing the slip form of a concrete column member is provided. The method is capable of reducing the construction period by raising a concrete form rapidly and safely using a method of determining the slip-up time of the slip form based on the strength of concrete measured by the apparatus.

Abstract: A shifting device for a vehicle and a shifting system using the same are provided. The shifting device for a vehicle may be connected to a transmission of the vehicle via a cable to operate the transmission. More specifically, the shifting device may include an interface module which receives an input of a shift signal, and an actuator which is connected to one end of the cable, and operates the cable according to the shift signal inputted to the interface module to operate the transmission connected to the other end of the cable.