Patents by Inventor Hee Su Park
Hee Su Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240152452Abstract: Disclosed is a method of adjusting the performance of a wear leveling operation depending on the pattern of a workload according to a command inputted to a storage device, thereby managing a difference in the count of erase operations between storage areas included in a memory not to exceed a limit value and enabling a wear leveling operation to be performed.Type: ApplicationFiled: March 24, 2023Publication date: May 9, 2024Inventors: Hee Chan SHIN, Jeong Su PARK, Jong Tack JUNG
-
Publication number: 20240154299Abstract: An antenna structure includes an antenna unit including a signal pad and a ground pad spaced apart from the signal pad, and a circuit board electrically connected to the antenna unit. The circuit board includes a connection pad connected to the signal pad and a bonding pad connected to the ground pad. The bonding pad has an area smaller than an area of the ground pad. The antenna structure is connected to an external circuit through the circuit board to provide a multi-band radiation.Type: ApplicationFiled: October 23, 2023Publication date: May 9, 2024Inventors: HO DONG YOON, HEE JUN PARK, YOUNG SU LEE
-
Publication number: 20240121809Abstract: A method of a first terminal may include: identifying first RB set(s) to be used for SL communication among consecutive RB sets through an LBT procedure; identifying a first subchannel group included in the first RB set(s) and a second subchannel group including a first PRB in the first RB set(s), the first PRB being not included in the first subchannel group; configuring the first PRB within the second subchannel group as an SL communication resource; and transmitting, to a second terminal, control information indicating that the first PRB is configured as the SL communication resource.Type: ApplicationFiled: September 27, 2023Publication date: April 11, 2024Inventors: Jun Hyeong KIM, Go San NOH, Il Gyu KIM, Man Ho PARK, Nak Woon SUNG, Jae Su SONG, Nam Suk LEE, Hee Sang CHUNG, Min Suk CHOI
-
Publication number: 20240026485Abstract: Provided are a high-strength steel sheet having excellent bendability and formability, and a method for manufacturing same. The steel sheet includes: 0.05 to 0.12% of carbon (C), 2.0 to 3.0% of manganese (Mn), 0.5% or less (excluding 0%) of silicon (Si), 1.0% or less (excluding 0%) of chromium (Cr), 0.1% or less (excluding 0%) of niobium (Nb), 0.1% or less (excluding 0%) of titanium (Ti), 0.0025% or less (excluding 0%) of boron (B), 0.02 to 0.05% of aluminum (sol.Al), 0.05% or less (excluding 0%) of phosphorus (P), 0.01% or less (excluding 0%) of sulfur (S), 0.01% or less (excluding 0%) of nitrogen (N), with a balance of Fe and inevitable impurities, and 35 to 50% of ferrite and 35 to 45% of bainite, and a balance of martensite, the ferrite comprising, by area fraction: 8 to 15% of non-recrystallized ferrite and 27 to 35% of recrystallized ferrite, as a microstructure.Type: ApplicationFiled: November 22, 2021Publication date: January 25, 2024Inventors: Kyoung-Rae CHO, Hee-Su PARK, Hyun-Gyu HWANG, Sung-Kyu KIM, Chang-Hyo SEO
-
Patent number: 10948342Abstract: The present invention relates to a Bell state measurement apparatus capable of increasing a probability in which a determination that a Bell state measurement fails by using an optical fiber.Type: GrantFiled: May 22, 2019Date of Patent: March 16, 2021Assignee: Korea Research Institute of Standards and ScienceInventors: Sang Min Lee, Hee Su Park
-
Publication number: 20190360861Abstract: The present invention relates to a Bell state measurement apparatus capable of increasing a probability in which a determination that a Bell state measurement fails by using an optical fiber.Type: ApplicationFiled: May 22, 2019Publication date: November 28, 2019Inventors: Sang Min Lee, Hee Su Park
-
Patent number: 10027426Abstract: According to one embodiment of the present invention, there is provided a photon generating apparatus including: a light source configured to emit light; an optical medium configured to generate a pair of photons from the light; a detector configured to detect one photon from the pair of photons and output a detection time of the photon; a buffer including an optical line and an optical switch disposed on an optical path of the photon, which is one photon except for the photon detected by the detector, of the pair of photons; and a processor configured to output a driving signal which controls the optical switch so that a delay occurs at the optical path using the detection time of the photon detected by the detector.Type: GrantFiled: September 21, 2017Date of Patent: July 17, 2018Assignee: Korea Research Institute of Standards and ScienceInventors: Hee Su Park, Eun Joo Lee, Hee Jung Lee, Sang Min Lee
-
Publication number: 20180145768Abstract: According to one embodiment of the present invention, there is provided a photon generating apparatus including: a light source configured to emit light; an optical medium configured to generate a pair of photons from the light; a detector configured to detect one photon from the pair of photons and output a detection time of the photon; a buffer including an optical line and an optical switch disposed on an optical path of the photon, which is one photon except for the photon detected by the detector, of the pair of photons; and a processor configured to output a driving signal which controls the optical switch so that a delay occurs at the optical path using the detection time of the photon detected by the detector.Type: ApplicationFiled: September 21, 2017Publication date: May 24, 2018Inventors: Hee Su PARK, Eun Joo Lee, Hee Jung Lee, Sang Min Lee
-
Patent number: 8279400Abstract: Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first light source inducing energy level transition between the first ground state and the first excited state of the photographic medium; a second light source inducing energy level transition between the second ground state and the first excited state of the photographic medium; and a third light source inducing energy level transition between the second ground state and the second excited state of the photographic medium. Accordingly, the resolution of lithography can be improved simply by using a photographic medium having a simple structure and conventional laser beams and increasing the number of exposure steps.Type: GrantFiled: March 12, 2009Date of Patent: October 2, 2012Assignee: Korea Research Institute of Standards and ScienceInventors: Hee Su Park, Sun Kyung Lee, Jae Yong Lee, Sang-Kyung Choi, Dong-Hoon Lee
-
Publication number: 20100123889Abstract: Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first light source inducing energy level transition between the first ground state and the first excited state of the photographic medium; a second light source inducing energy level transition between the second ground state and the first excited state of the photographic medium; and a third light source inducing energy level transition between the second ground state and the second excited state of the photographic medium. Accordingly, the resolution of lithography can be improved simply by using a photographic medium having a simple structure and conventional laser beams and increasing the number of exposure steps.Type: ApplicationFiled: March 12, 2009Publication date: May 20, 2010Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCEInventors: Hee Su PARK, Sun Kyung LEE, Jae Yong LEE, Sang-Kyung CHOI, Dong-Hoon LEE
-
Patent number: 6640024Abstract: An add-drop wavelength filter is described which separates specific wavelength components from optical signals propagating through an optical waveguide or adds specific wavelength components thereto. In general, add-drop wavelength filters serve to separate or add specific channels in channels comprising several different wavelengths in a wavelength division optical communication system, and require good wavelength selectivity, stability and etc. Up to now, several types of add-drop wavelength filters are proposed, however disadvantageously they were not stable or were difficult to fabricate. The add-drop wavelength filter of the present invention comprising a mode discrimination coupler, Bragg gratings in which mode conversion occurs and etc., utilizes mode conversion in a dual mode waveguide and has low loss and stability.Type: GrantFiled: November 9, 2000Date of Patent: October 28, 2003Assignee: Korea Advanced Institue of Science & TechnologyInventors: Byoung Yoon Kim, Hee Su Park, Seok Hyun Yun
-
Patent number: 6343165Abstract: An optical add/drop multiplexer includes a mode converter. A first mode coupler is coupled to an input of the mode converter. A second mode coupler is coupled to an output of the mode converter. The mode converter includes an optical fiber with multiple cladding modes and a single core mode guided along a core. An acoustic wave propagation member is coupled to the optical fiber. The acoustic wave propagation member propagates an acoustic wave from its proximal to its distal end. At least one acoustic wave generator is coupled to the proximal end of the acoustic wave propagation member.Type: GrantFiled: May 23, 2000Date of Patent: January 29, 2002Assignee: Novera Optics, Inc.Inventors: Byoung Yoon Kim, Seok Hyun Yun, Hee Su Park, Wayne V. Sorin
-
Patent number: 5534728Abstract: A semiconductor device includes a metal wiring layer having a plurality of parallel, actual metal lines, with an endmost one of the actual metal lines being disposed adjacent a wiring-free region. The actual metal lines are electrically connected to an active circuit portion of the semiconductor device. At least one dummy metal line is interposed between the endmost one of the actual metal lines and the wiring-free region, with the at least one dummy metal line being disconnected from the active circuit portion. The dummy metal line(s) serve to prevent corrosion of the actual metal lines when the metal wiring layer is patterned by an etching process.Type: GrantFiled: September 21, 1992Date of Patent: July 9, 1996Assignee: Samsung Electronics Co., Ltd.Inventors: Tae-ryong Kim, Hee-su Park, Dai-sick Moon