Patents by Inventor Hee-Wan Moon

Hee-Wan Moon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230166218
    Abstract: Disclosed are a slidable filtration apparatus capable of performing reciprocating motion in a filtration tank and a filtration system including the same. The filtration apparatus includes a frame and a membrane module installed in the frame, wherein the frame includes at least two horizontal linear motion members provided at an upper portion thereof.
    Type: Application
    Filed: November 28, 2022
    Publication date: June 1, 2023
    Applicant: HIFIL TECH INC.
    Inventors: Hee-Wan MOON, Yong-Cheol Shin, Ho-Chan Jung
  • Patent number: 8697328
    Abstract: Disclosed herein is a film-type photodegradable transfer material, comprising: a support film; a resin protection layer; a photodegradable photoresist layer; and a cover film, wherein the resin protection layer has an adhesion force of 0.05 kgf or less. When the film-type photodegradable transfer material is used to form a fine circuit pattern, such as a printed circuit board or the like, the resolution of the pattern can be increased by minimizing the distance between a mask and a photosensitive resin layer at the time of exposure, and work can be performed in the form of a sheet or a roll to roll process can be applied to the work even when the support film has been removed before an exposure process.
    Type: Grant
    Filed: May 20, 2009
    Date of Patent: April 15, 2014
    Assignee: Kolon Industries, Inc.
    Inventors: Hee Wan Moon, Byeong Il Lee
  • Publication number: 20110135891
    Abstract: Disclosed herein is a film-type photodegradable transfer material, comprising: a support film; a resin protection layer; a photodegradable photoresist layer; and a cover film, wherein the resin protection layer has an adhesion force of 0.05 kgf or less. When the film-type photodegradable transfer material is used to form a fine circuit pattern, such as a printed circuit board or the like, the resolution of the pattern can be increased by minimizing the distance between a mask and a photosensitive resin layer at the time of exposure, and work can be performed in the form of a sheet or a roll to roll process can be applied to the work even when the support film has been removed before an exposure process.
    Type: Application
    Filed: May 20, 2009
    Publication date: June 9, 2011
    Applicant: Kolon Industries, Inc.
    Inventors: Hee Wan Moon, Byeong Il Lee
  • Patent number: 6960663
    Abstract: The present invention relates to luminescence materials for an organic electroluminescent device (OELD), and particularly to phenyl pyridine-iridium metal complex compounds of formula (1), and preparation method thereof. In addition, the present invention relates to an organic electroluminescent device using the luminescence materials according to the present invention, which can greatly enhance the efficiency of luminescence and increase the operating life time of the device: wherein R1, R2 and R3 each are the same as defined in the specification.
    Type: Grant
    Filed: December 2, 2003
    Date of Patent: November 1, 2005
    Assignee: LG Electronics, Inc.
    Inventors: Ki-Dong Kim, Sang-Dae Kim, Yoon-Soo Han, Yoon-Heung Tak, Dong-Uk Kim, Tae-Jeong Kim, Ung-Chan Yoon, Sung-Hoon Kim, Hee-Wan Moon
  • Publication number: 20040249156
    Abstract: The present invention relates to luminescence materials for an organic electroluminescent device (OELD), and particularly to phenyl pyridine-iridium metal complex compounds of formula (1), and preparation method thereof.
    Type: Application
    Filed: December 2, 2003
    Publication date: December 9, 2004
    Applicant: LG Electronics Inc.
    Inventors: Ki-Dong Kim, Sang-Dae Kim, Yoon-Soo Han, Yoon-Heung Tak, Dong-Uk Kim, Tae-Jeong Kim, Ung-Chan Yoon, Sung-Hoon Kim, Hee-Wan Moon