Patents by Inventor Hee Won Hwang

Hee Won Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12009243
    Abstract: An overlay measurement device includes a transmission and receipt part and a processor connecting to the transmission and receipt part electrically. The processor obtains data transmitted from a user terminal through the transmission and receipt part, analyzes a recipe included in the data, and performs optimization of measurement options of a wafer, based on the recipe, after the recipe is analyzed.
    Type: Grant
    Filed: July 28, 2023
    Date of Patent: June 11, 2024
    Assignee: AUROS TECHNOLOGY, INC.
    Inventors: Sol-Lee Hwang, Hee-Chul Lim, Dong-Won Jung, Min-Ho Lee, Hyun-Kyoo Shon
  • Publication number: 20240186169
    Abstract: An overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer, includes: a light source; an aperture that changes a beam from the light source to be suitable for photographing the first overlay mark or the second overlay mark; a detector for obtaining an image of the first overlay mark or an image of the second overlay mark; a transmission and receipt part; and a processor connecting to the transmission and receipt part electrically.
    Type: Application
    Filed: February 6, 2024
    Publication date: June 6, 2024
    Applicant: AUROS TECHNOLOGY, INC.
    Inventors: Sol-Lee HWANG, Hee-Chul LIM, Dong-Won JUNG, Min-Ho LEE, Hyun-Kyoo SHON
  • Publication number: 20240178038
    Abstract: An overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer, includes: a light source; an objective lens that concentrates a beam from the light source on a measurement position of the wafer, and gathers the beam being reflected in the measurement positon; a lens focus actuator that adjusts a distance between the objective lens and the wafer such that a focus surface is placed at the first overlay mark or the second overlay mark; an auto focus module that adjusts a focus by adjusting the lens focus actuator; a detector for obtaining an image of the first overlay mark or an image of the second overlay mark; a transmission and receipt part; and a processor connecting to the transmission and receipt part electrically.
    Type: Application
    Filed: February 6, 2024
    Publication date: May 30, 2024
    Applicant: AUROS TECHNOLOGY, INC.
    Inventors: Sol-Lee HWANG, Hee-Chul Lim, Dong-Won Jung, Min-Ho Lee, Hyun-Kyoo Shon
  • Publication number: 20240176251
    Abstract: A non-transitory computer-readable storage medium that records a data structure for storing data controlling an operation of an overlay measurement device that measures an error between a first overlay mark and a second overlay mark formed on different layers of a wafer. The data include: information of a recipe that is input to allow the overlay measurement device to measure characteristics of a wafer through a manager program installed in a user terminal, and unique information of the overlay measurement device. The overlay measurement device includes: a light source, an aperture that changes a beam from the light source to be suitable for photographing the first overlay mark or the second overlay mark, a detector that acquires an image of the first overlay mark and an image of the second overlay mark, a transceiver, and a processor electrically connected to the transceiver.
    Type: Application
    Filed: February 6, 2024
    Publication date: May 30, 2024
    Applicant: AUROS TECHNOLOGY, INC.
    Inventors: Sol-Lee HWANG, Dong-won JUNG, Hee-Chul LIM, Hyun-Kyoo SHON, Min-Ho LEE
  • Publication number: 20240176253
    Abstract: A non-transitory computer-readable storage medium that records a data computer-readable storage medium that records a data structure for storing data controlling an operation of an overlay measurement device that measures an error between a first overlay mark and a second overlay mark formed on different layers of a wafer. The data include information of a recipe that is input to allow the overlay measurement device to measure characteristics of a wafer through a manager program installed in a user terminal, and unique information of the overlay measurement device.
    Type: Application
    Filed: February 6, 2024
    Publication date: May 30, 2024
    Applicant: AUROS TECHNOLOGY, INC.
    Inventors: Sol-Lee HWANG, Dong-Won JUNG, Hee-Chul LIM, Hyun-Kyoo SHON, Min-Ho LEE
  • Publication number: 20240176252
    Abstract: A non-transitory computer-readable storage medium that records a data structure for storing data controlling an operation of an overlay measurement device that measures an error between a first overlay mark and a second overlay mark formed on different layers of a wafer. The data include information of a recipe that is input to allow the overlay measurement device to measure characteristics of a wafer through a manager program installed in a user terminal, and unique information of the overlay measurement device.
    Type: Application
    Filed: February 6, 2024
    Publication date: May 30, 2024
    Applicant: AUROS TECHNOLOGY, INC.
    Inventors: Sol-Lee HWANG, Dong-won JUNG, Hee-Chul LIM, Hyun-Kyoo SHON, Min-Ho LEE
  • Publication number: 20240178037
    Abstract: An overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer, includes: a light source; an aperture that changes a beam from the light source to be suitable for photographing the first overlay mark or the second overlay mark; a detector for obtaining an image of the first overlay mark or an image of the second overlay mark; a transmission and receipt part; and a processor connecting to the transmission and receipt part electrically.
    Type: Application
    Filed: February 6, 2024
    Publication date: May 30, 2024
    Applicant: Auros Technology, Inc.
    Inventors: Sol-Lee Hwang, Hee-Chul Lim, Dong-Won Jung, Min-Ho Lee, Hyun-Kyoo Shon
  • Publication number: 20240128112
    Abstract: An overlay measurement device includes a transmission and receipt part and a processor connecting to the transmission and receipt part electrically. The processor obtains data transmitted from a user terminal through the transmission and receipt part, analyzes a recipe included in the data, and performs optimization of measurement options of a wafer, based on the recipe, after the recipe is analyzed.
    Type: Application
    Filed: July 28, 2023
    Publication date: April 18, 2024
    Applicant: AUROS TECHNOLOGY, INC.
    Inventors: Sol-Lee HWANG, Hee-Chul LIM, Dong-Won JUNG, Min-Ho LEE, Hyun-Kyoo SHON
  • Patent number: 11960214
    Abstract: There are provided a computer-readable storage medium and an overlay measurement device therefor that records a data structure for storing data controlling an operation of an overlay measurement device. In a computer-readable storage medium that records a data structure for storing data controlling an operation of an overlay measurement device in one embodiment, the data includes information of a recipe that is input to allow the overlay measurement device to measure characteristics of a wafer through a manager program installed in a user terminal, and unique information of the overlay measurement device.
    Type: Grant
    Filed: May 3, 2023
    Date of Patent: April 16, 2024
    Assignee: AUROS TECHNOLOGY, INC.
    Inventors: Sol-Lee Hwang, Dong-Won Jung, Hee-Chul Lim, Hyun-Kyoo Shon, Min-Ho Lee
  • Publication number: 20240088347
    Abstract: A prelithiated negative electrode, and a secondary battery including a prelithiated electrode, including a negative electrode current collector; and a negative electrode active material layer present on at least one surface of the negative electrode current collector. The negative electrode active material layer includes high-capacity artificial graphite having no carbon coating. The negative electrode active material layer is prelithiated, and the content of lithium intercalated to the prelithiated negative electrode active material layer is 3% to 5% based on the lithium content intercalated when the negative electrode is charged to 100%.
    Type: Application
    Filed: November 11, 2020
    Publication date: March 14, 2024
    Applicant: LG ENERGY SOLUTION, LTD.
    Inventors: Hee-Won CHOI, Ye-Ri KIM, Chan-Ki PARK, Mi-Ru JO, Oh-Byong CHAE, Seung-Hae HWANG
  • Patent number: 8093376
    Abstract: The present invention relates to a process of preparing hydroxyalkyl cellulose derivatives having improved enzymatic resistance. In particular, the present invention relates to a process of preparing hydroxyalkyl cellulose derivatives by reacting cellulose and ethylene oxide in the presence of alkali metal hydroxide, wherein the reaction between cellulose and ethylene oxide is performed in the presence of isopropyl alcohol azeotropic solvent in a horizontally agitated reactor, wherein the ethylene oxide is supplied via two steps, thus resulting in a two-step reaction, and the amount of alkali metal hydroxide remaining after the first reaction is controlled, thereby enabling to provide hydroxyalkyl cellulose derivatives having improved enzymatic resistance and turbidity and to remarkably decrease the solvent usage to have economical and environmental advantages.
    Type: Grant
    Filed: December 17, 2004
    Date of Patent: January 10, 2012
    Assignee: Samsung Fine Chemicals Co., Ltd.
    Inventors: Seok Soo Kim, Jung Ho So, Il Yong Lee, Hee Won Hwang
  • Publication number: 20090299051
    Abstract: The present invention relates to a process of preparing hydroxyalkyl cellulose derivatives having improved enzymatic resistance. In particular, the present invention relates to a process of preparing hydroxyalkyl cellulose derivatives by reacting cellulose and ethylene oxide in the presence of alkali metal hydroxide, wherein the reaction between cellulose and ethylene oxide is performed in the presence of isopropyl alcohol azeotropic solvent in a horizontally agitated reactor, wherein the ethylene oxide is supplied via two steps, thus resulting in a two-step reaction, and the amount of alkali metal hydroxide remaining after the first reaction is controlled, thereby enabling to provide hydroxyalkyl cellulose derivatives having improved enzymatic resistance and turbidity and to remarkably decrease the solvent usage to have economical and environmental advantages.
    Type: Application
    Filed: December 17, 2004
    Publication date: December 3, 2009
    Applicant: SANSUNG FINE CHEMICALS CO., LTD.
    Inventors: Seok Soo Kim, Jung Ho So, Il Yong Lee, Hee Won Hwang
  • Publication number: 20080242852
    Abstract: The present invention relates to a method for preparing hydroxyalkylalkylcellulose with high yield, more particularly to a method for preparing hydroxyalkylalkylcellulose with high yield, with at least 60% of alkoxy and hydroxyalkoxy substituted, by treating finely ground pulp with an alkali metal hydroxide at room temperature, reacting it with an alkylene oxide and an alkyl halide, and then adding an alkali metal hydroxide and an alkyl halide thereto. The method of the present invention is highly economical and also environment-friendly because waste of the reactants can be greatly reduced.
    Type: Application
    Filed: December 30, 2005
    Publication date: October 2, 2008
    Inventors: Seok Soo Kim, Ung-Jin Kim, Il Yong Lee, Hee Won Hwang, Yong Sung Jang