Patents by Inventor Heeyoung Oh

Heeyoung Oh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive resin composition and touch panel or display device including bezel pattern prepared by using same
    Patent number: 9470975
    Abstract: The present specification relates to a photoresist resin composition, a touch panel including a bezel pattern manufactured by using the photoresist resin composition, and a display device including the bezel pattern manufactured by using the photoresist resin composition.
    Type: Grant
    Filed: April 17, 2013
    Date of Patent: October 18, 2016
    Assignee: LG CHEM, LTD.
    Inventors: Dongchang Choi, Kwang Han Park, Kyung Soo Choi, Geun Young Cha, Sang Chul Lee, Heeyoung Oh
  • Photosensitive resin composition, pattern formed using same and display panel comprising same
    Patent number: 9341946
    Abstract: The present specification provides a photosensitive resin composition comprising an alkali-soluble binder, a crosslinkable compound, a photopolymerization initiator, a solvent, a coloring agent and an epoxy adhesion promoter. The photosensitive resin composition has excellent insulating properties and light-shielding properties and shows excellent chemical resistance in an etching process and a stripping process. Thus, the photosensitive resin composition can be formed into a thin bezel layer having a gradual taper, and thus can provide an integrated touch sensor that makes it possible to prevent short circuits from occurring in metal wiring and minimize any decrease in resistance resulting from high-temperature processing.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: May 17, 2016
    Assignee: LG CHEM, LTD.
    Inventors: Kwang Han Park, Sunghyun Kim, Dongchang Choi, Kyung Soo Choi, Sang Chul Lee, Heeyoung Oh
  • PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMED USING SAME AND DISPLAY PANEL COMPRISING SAME
    Publication number: 20150125789
    Abstract: The present specification provides a photosensitive resin composition comprising an alkali-soluble binder, a crosslinkable compound, a photopolymerization initiator, a solvent, a coloring agent and an epoxy adhesion promoter. The photosensitive resin composition has excellent insulating properties and light-shielding properties and shows excellent chemical resistance in an etching process and a stripping process. Thus, the photosensitive resin composition can be formed into a thin bezel layer having a gradual taper, and thus can provide an integrated touch sensor that makes it possible to prevent short circuits from occurring in metal wiring and minimize any decrease in resistance resulting from high-temperature processing.
    Type: Application
    Filed: May 24, 2013
    Publication date: May 7, 2015
    Applicant: LG CHEM, LTD.
    Inventors: Kwang Han Park, Sunghyun Kim, Dongchang Choi, Kyung Soo Choi, Sang Chul Lee, Heeyoung Oh
  • PHOTOSENSITIVE RESIN COMPOSITION AND TOUCH PANEL OR DISPLAY DEVICE INCLUDING BEZEL PATTERN PREPARED BY USING SAME
    Publication number: 20150111009
    Abstract: The present specification relates to a photoresist resin composition, a touch panel including a bezel pattern manufactured by using the photoresist resin composition, and a display device including the bezel pattern manufactured by using the photoresist resin composition.
    Type: Application
    Filed: April 17, 2013
    Publication date: April 23, 2015
    Applicant: LG CHEM, LTD.
    Inventors: Dongchang Choi, Kwang Han Park, Kyung Soo Choi, Geun Young Cha, Sang Chul Lee, Heeyoung Oh
  • Monomer substituted photoacid generator of fluoroalkylsulfon and a polymer thereof
    Patent number: 7534844
    Abstract: The present invention relates to a novel compound with a fluoroalkylsulfonium photoacid generating group and novel copolymers having superior solubility in organic solvents, which is prepared from radical polymerization of the novel compound with methacrylate monomers.
    Type: Grant
    Filed: February 16, 2006
    Date of Patent: May 19, 2009
    Assignee: IUCF-HYU (Industry-University Cooperation Foundation Hanyang University
    Inventors: Haiwon Lee, Heeyoung Oh, Hyunjin Yoon, Yongil Kim
  • Novel Monomer Substituted Photoacid Generator Of Fluoroalkylsulfon And A Polymer Thereof
    Publication number: 20070203312
    Abstract: The present invention relates to a novel compound with a fluoroalkylsulfonium photoacid generating group and novel copolymers having superior solubility in organic solvents, which is prepared from radical polymerization of the novel compound with methacrylate monomers.
    Type: Application
    Filed: February 16, 2006
    Publication date: August 30, 2007
    Applicant: IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
    Inventors: Haiwon Lee, Heeyoung Oh, Hyunjin Yoon, Yongil Kim