Patents by Inventor Heike Scholtz

Heike Scholtz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for excursion monitoring in optical lithography processes in micro device fabrication
    Patent number: 8660681
    Abstract: A process monitoring system may detect out-of-control situations on the basis of a single criterion for a plurality of different lithography processes. To this end, each data set related to a specific type of lithography process may be processed so as to determine relative data, which may be centered around the same mean value for each of the different process types for a standard control situation.
    Type: Grant
    Filed: January 14, 2011
    Date of Patent: February 25, 2014
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Andre Poock, Daniel Zschaebitz, Heike Scholtz
  • Method and System for Excursion Monitoring in Optical Lithography Processes in Micro Device Fabrication
    Publication number: 20120004758
    Abstract: A process monitoring system may detect out-of-control situations on the basis of a single criterion for a plurality of different lithography processes. To this end, each data set related to a specific type of lithography process may be processed so as to determine relative data, which may be centered around the same mean value for each of the different process types for a standard control situation.
    Type: Application
    Filed: January 14, 2011
    Publication date: January 5, 2012
    Applicant: GLOBALFOUNDRIES INC.
    Inventors: Andre Poock, Daniel Zschaebitz, Heike Scholtz