Patents by Inventor Heiko Muller
Heiko Muller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20070132723Abstract: A laboratory apparatus having at least one control device (4) comprising an electric printed-circuit board (15) of the control device (4) that is disposed on an instrument body (2) of the laboratory apparatus (1) and has at least one electric control element (16, 18), at least one operator interface (6) of the control device (4) including at least one operator control (11, 33); a retaining device (29, 30) for detachably holding the operator interface (6) on the instrument body (2) with the operator control (11, 33) oriented to the control element (16, 18), and a mechanical and/or magnetic connection for detachably joining the control element (16, 18) mechanically and/or magnetically to the operator control (11, 33).Type: ApplicationFiled: November 16, 2006Publication date: June 14, 2007Applicant: Eppendorf AGInventors: Werner Lurz, Wolfram Meyer, Roland Kleindienst, Heiko Muller
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Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system
Patent number: 7135677Abstract: An electron microscopy system comprises an objective lens (19) which images a field displaceable in x-direction on a fixed beam axis (17). The objective lens has an astigmatic effect which is compensated for by a beam shaper (63) on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.Type: GrantFiled: August 12, 2003Date of Patent: November 14, 2006Assignee: Carl Zeiss NTS GmbHInventors: Oliver Kienzle, Rainer Knippelmeyer, Stephan Uhlemann, Max Haider, Heiko Müller -
Patent number: 6995378Abstract: Disclosed is a lens array having a laterally movable axis for corpuscular rays, particularly for transmission from areas of an object surface onto the focal plane by means of electrons. The inventive array consists of a combined lens comprising a cylinder lens and a quadrupole lens provided with slit diaphragms which can be impinged upon by electric and/or magnetic fields. The optical axis of the quadrupole lens is oriented parallel to the axis of the cylinder lens and defines the optical axis of the projection, the position of which can be altered in relation to the axis of the cylinder lens. The quadrupole lens is in focus in the sector in which the cylinder lens is not in focus and is out of focus in the section in which the cylinder lens is in focus. The inventive combined lens can be operated as an immersion lens for projecting secondary electrons. The immersion field consists of at least two adjacent axially aligned fields.Type: GrantFiled: November 26, 2002Date of Patent: February 7, 2006Assignee: CEOS Corrected Electron Optical Systems GmbHInventors: Stephan Uhlemann, Maximilan Haider, Heiko Müller
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Patent number: 6949751Abstract: A slit lens arrangement for particle beams, and particularly for the projection of a mask onto a workpiece, includes a combined lens, having a cylinder lens and a quadrupole lens, the optical axes of which run parallel to each other, so that the optical axis of the quadrupole lens may be displaced in a parallel manner and which may have a gap-like opening between the pole shoes or in the electrodes with the same spatial relationship to each other. Both lenses are thus so arranged relative to each other, that the focussing of the quadrupole lens occurs in that plane in which the cylinder lens is not focussed, and the defocusing of the quadrupole lens occurs in that plane in which the cylinder lens focuses. Two combined lenses are provided with functionally identical elements arranged such that the optical axes of both lenses lie coaxial to each other, defining the mid-axis of the total system and in which the beam path is telescopic throughout the entire slit lens arrangement.Type: GrantFiled: July 24, 2002Date of Patent: September 27, 2005Inventor: Heiko Müller
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Patent number: 6946657Abstract: A particle-optical apparatus is disclosed which combines the functions of an energy selector 27 and a beam splitter 21. The particle-optical apparatus is used in an electron microscopy system and serves to separate and superimpose, respectively, beam paths of a primary electron beam 11 and a secondary electron beam 13.Type: GrantFiled: August 1, 2003Date of Patent: September 20, 2005Assignee: Carl Zeiss NTS GmbHInventors: Oliver Kienzle, Rainer Knippelmeyer, Heiko Müller
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Patent number: 6903337Abstract: An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the field, the field being displaceable in the plane of the object, a first deflector for providing a variable deflection field for guiding charged particles emerging from locations of a selectable region of the object through a fixed, predetermined beam cross-section, and a position-sensitive detector disposed in the beam path such that the charged particles, after having passed through the first deflector, impinge on the position-sensitive detector, wherein particles emerging from different locations of the region are imaged on different locations of the position-sensitive detector which are allocated to the locations of emergence.Type: GrantFiled: July 1, 2002Date of Patent: June 7, 2005Assignee: Carl Zeiss SMT AGInventors: Oliver Kienzle, Dirk Stenkamp, Michael Steigerwald, Rainer Knippelmeyer, Max Haider, Heiko Müller, Stephan Uhlemann
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Patent number: 6888145Abstract: An optical particle corrector with a straight optical axis for eliminating color and aperture aberrations in optical particle lenses includes multipole elements in the form of electric and/or magnetic quadrupole and octupole elements. There are at least twelve quadrupole elements and ten octupole elements, in which three quadrupole elements and two octupole elements are assembled into a group. These groups are arranged successively along the straight optical axis, in which a first symmetrical plane is defined between the first and second groups, a second symmetrical plane is defined between the second and third groups and a third symmetrical plane is defined between the third and fourth groups. The multipole elements from one group to another correspond to each other in pairs, in which the multipole elements of the corresponding following group are positioned in reverse order along the straight optical axis in comparison with the corresponding multipole elements of the preceding group.Type: GrantFiled: December 3, 2002Date of Patent: May 3, 2005Assignee: CEOS Corrected Electron Optical Systems GmbHInventors: Heiko Müller, Harald Rose
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Patent number: 6866621Abstract: A laboratory with a rotor driven by a centrifuge electric motor and a cooling unit driven by an electrical cooling motor, wherein the centrifuge motor is formed as a frequency-controlled induction motor fed from a frequency converter controlled by a control unit and having a centrifuge inverted rectifier that feeds the centrifuge motor and is connected to a d.c. source fed from a mains power rectifier, characterized in that the cooling motor is formed as a frequency-controlled induction motor, and that the frequency converter has a further cooling inverted rectifier connected to the d.c. source parallel to the centrifuge inverted rectifier for feeding the cooling motor.Type: GrantFiled: June 26, 2000Date of Patent: March 15, 2005Assignee: Eppendorf AGInventors: Heiko Müller, Horst Kache
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Publication number: 20050035299Abstract: Disclosed is a lens array having a laterally movable axis for corpuscular rays, particularly for transmission from areas of an object surface onto the focal plane by means of electrons. The inventive array consists of a combined lens comprising a cylinder lens and a quadrupole lens provided with slit diaphragms which can be impinged upon by electric and/or magnetic fields. The optical axis of the quadrupole lens is oriented parallel to the axis of the cylinder lens and defines the optical axis of the projection, the position of which can be altered in relation to the axis of the cylinder lens. The quadrupole lens is in focus in the sector in which the cylinder lens is not in focus and is out of focus in the section in which the cylinder lens is in focus. The inventive combined lens can be operated as an immersion lens for projecting secondary electrons. The immersion field consists of at least two adjacent axially aligned fields.Type: ApplicationFiled: November 26, 2002Publication date: February 17, 2005Inventors: Stephan Uhlemann, Maximilan Haider, Heiko Muller
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Publication number: 20040210480Abstract: In a method for marketing and selling mobile recording media, mobile recording media are offered that are designed by a provider without direct influence of a user such that on a surface of the recording media at least partially at least two coats of color applications are applied that supplement one another to a decorative coating in the form of a graphic illustration. The graphic illustration does not represent primarily a product identification, a trademark identification, a manufacturer identification, or line markings for improving written labeling. The graphic illustration is different on individual ones of the recording media or on sets of the recording media.Type: ApplicationFiled: August 28, 2003Publication date: October 21, 2004Inventor: Heiko Muller
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Publication number: 20040155200Abstract: An optical particle corrector with a straight optical axis for eliminating color and aperture aberrations in optical particle lenses includes multipole elements in the form of electric and/or magnetic quadrupole and octupole elements. There are at least twelve quadrupole elements and ten octupole elements, in which three quadrupole elements and two octupole elements are assembled into a group. These groups are arranged successively along the straight optical axis, in which a first symmetrical plane is defined between the first and second groups, a second symmetrical plane is defined between the second and third groups and a third symmetrical plane is defined between the third and fourth groups. The multipole elements from one group to another correspond to each other in pairs, in which the multipole elements of the corresponding following group are positioned in reverse order along the straight optical axis in comparison with the corresponding multipole elements of the preceding group.Type: ApplicationFiled: November 21, 2003Publication date: August 12, 2004Inventors: Heiko Muller, Harald Rose
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Publication number: 20040149925Abstract: A slit lens arrangement for particle beams, in particular for the projection of a mask onto a workpiece, is disclosed, comprising a combined lens, made up of a cylinder lens and a quadrupole lens, the optical axes of which run parallel to each other, whereby the optical axis of the quadrupole lens may be displaced in a parallel manner and which have a gap-like opening between the pole shoes or in the electrodes with the same spatial relationship to each other. Both lenses are thus so arranged relative to each other, that the focussing of the quadrupole lens occurs in that plane in which the cylinder lens is not focussed, and the defocusing of the quadrupole lens occurs in that plane in which the cylinder lens focuses. According to the invention, two combined lenses are provided with functionally identical elements arranged such that the optical axes of the both lenses lie coaxial to each other, define the mid-axis of the total system and whereby the beam path is telescopic throughout the total system.Type: ApplicationFiled: November 20, 2003Publication date: August 5, 2004Inventor: Heiko Muller
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Publication number: 20040108457Abstract: A particle-optical apparatus is disclosed which combines the functions of an energy selector 27 and a beam splitter 21. The particle-optical apparatus is used in an electron microscopy system and serves to separate and superimpose, respectively, beam paths of a primary electron beam 11 and a secondary electron beam 13.Type: ApplicationFiled: August 1, 2003Publication date: June 10, 2004Applicant: LEO Elektronenmikroskopie GmbHInventors: Oliver Kienzle, Rainer Knippelmeyer, Heiko Muller
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Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system
Publication number: 20040084621Abstract: An electron microscopy system comprises an objective lens (19) which images a field displaceable in x-direction on a fixed beam axis (17). The objective lens has an astigmatic effect which is compensated for by a beam shaper (63) on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.Type: ApplicationFiled: August 12, 2003Publication date: May 6, 2004Applicant: LEO Elektronenmikroskopie GmbHInventors: Oliver Kienzle, Rainer Knippelmeyer, Stephan Uhlemann, Max Haider, Heiko Muller