Patents by Inventor Heiko Wagner

Heiko Wagner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12269881
    Abstract: The present invention concerns antigen binding proteins specifically binding melanoma associated antigen A (MAGE-A) protein-derived antigens. The invention in particular provides antigen binding proteins which specifically bind to the MAGE-A antigenic peptide comprising or consisting of SEQ ID NO: 1 in a complex with a major histocombatibility (MHC) protein. The antigen binding proteins of the invention contain, in particular, the complementary determining regions (CDRs) of novel engineered T cell receptors (TCRs) that specifically bind to said MAGE-A peptide/MHC complex. The antigen binding proteins of the invention are of use for the diagnosis, treatment and prevention of MAGE-A expressing cancerous diseases. Further provided are nucleic acids encoding the antigen binding proteins of the invention, vectors comprising these nucleic acids, recombinant cells expressing the antigen binding proteins and pharmaceutical compositions comprising the antigen binding proteins of the invention.
    Type: Grant
    Filed: December 13, 2023
    Date of Patent: April 8, 2025
    Assignee: Immatics Biotechnologies GmbH
    Inventors: Meike Hutt, Felix Unverdorben, Sebastian Bunk, Dominik Maurer, Martin Hofmann, Gabriele Pszolla, Sara Yousef, Claudia Wagner, Frank Schwoebel, Heiko Schuster
  • Publication number: 20250034227
    Abstract: The present invention relates to antigen binding proteins that specifically bind to a tumor expressed melanoma-associated antigen (MAGE) B2 antigenic peptide in a complex with MHC. The antigen binding proteins are provided for use in the treatment of MAGEB2-expressing cancers. Further provided are nucleic acids encoding the antigen binding proteins, vectors comprising the nucleic acids, recombinant cells expressing the antigen binding proteins and pharmaceutical compositions comprising the antigen binding proteins.
    Type: Application
    Filed: July 26, 2024
    Publication date: January 30, 2025
    Inventors: Felix UNVERDORBEN, Sebastian BUNK, Martin HOFMANN, Meike HUTT, Timo MANZ, Nadine ASCHMONEIT, Maike JAWORSKI, Lena SCHMOHL, Claudia WAGNER, Dominik MAURER, Heiko SCHUSTER, Nora TREIBER
  • Publication number: 20250019406
    Abstract: The present invention relates to a method for selecting a cell or a virus expressing on its surface an antigen-binding protein specifically binding to a protein antigen of interest (PAI) while counter selection using a similar protein antigen (SPA) is applied. Further, the invention provides a method for determining the sequence of a nucleic acid encoding an antigen-binding protein or an antigen-binding part thereof and a method for producing a cell expressing a nucleic acid encoding an antigen-binding protein or an antigen-binding part thereof. The invention also relates to a method for treating a subject with a selected cell population.
    Type: Application
    Filed: September 19, 2024
    Publication date: January 16, 2025
    Inventors: Sebastian BUNK, Dominik MAURER, Gisela SCHIMMACK, Heiko SCHUSTER, Claudia WAGNER, Sara YOUSEF, Amir ALPERT
  • Publication number: 20240219700
    Abstract: A controller for a microscope is provided. The microscope includes a sample stage and an imaging optic. The sample stage is configured to receive a sample holder. The controller is configured to: control the microscope in a first mode, wherein a lateral position for all of at least two different objective lenses during a lateral movement is restricted to a first lateral range in at least one lateral direction; and control the microscope in a second mode, wherein the position for all of the at least two different objective lenses during the lateral movement is allowed to be at least within a second lateral range, different from the first lateral range, in the at least one lateral direction. In the second mode, a vertical position for the at least two different objective lenses during a vertical movement is restricted to a pre-defined vertical range.
    Type: Application
    Filed: December 27, 2023
    Publication date: July 4, 2024
    Inventors: Volker SCHACHT, Patric PELZER, Heiko WAGNER
  • Patent number: 10146132
    Abstract: The present disclosure relates to techniques for supplying different chemical products to process tools of a manufacturing environment used for micro-processing substrates. To this end, the various types of chemical products may be supplied by providing mobile dispense devices having incorporated therein any required hardware components for dispensing a chemical product. Moreover, the mobile dispense devices are appropriately equipped so as to enable coupling to and removal from respective process tools, such as wafer tracks of modern lithography tools. Due to the mobile or modular nature of the respective chemical product lines, a significant reduction of cost of ownership, increased tool availability and reduced investment costs may be achieved compared to conventional regimes.
    Type: Grant
    Filed: January 13, 2017
    Date of Patent: December 4, 2018
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Sidheswara Mahapatra, Wolfram Grundke, Heiko Wagner
  • Publication number: 20180203359
    Abstract: The present disclosure relates to techniques for supplying different chemical products to process tools of a manufacturing environment used for micro-processing substrates. To this end, the various types of chemical products may be supplied by providing mobile dispense devices having incorporated therein any required hardware components for dispensing a chemical product. Moreover, the mobile dispense devices are appropriately equipped so as to enable coupling to and removal from respective process tools, such as wafer tracks of modern lithography tools. Due to the mobile or modular nature of the respective chemical product lines, a significant reduction of cost of ownership, increased tool availability and reduced investment costs may be achieved compared to conventional regimes.
    Type: Application
    Filed: January 13, 2017
    Publication date: July 19, 2018
    Inventors: Sidheswara Mahapatra, Wolfram Grundke, Heiko Wagner
  • Patent number: 10007198
    Abstract: A method includes providing a semiconductor processing system that includes a plurality of units. Each unit has a configuration that defines a predetermined orientation of a wafer that is provided in the unit and includes a plurality of wafer handling elements. An arrangement of the plurality of wafer handling elements of the unit relative to the predetermined orientation of the wafer is adjustable. For each of the plurality of units, the arrangement of the plurality of wafer handling elements of the unit is adjusted relative to the predetermined orientation of the wafer. For each of the plurality of units, an arrangement of the plurality of wafer handling elements relative to the predetermined orientation of the wafer is provided that is different from the arrangement of the plurality of wafer handling elements relative to the predetermined orientation of the wafer in one or more other units of the plurality of units.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: June 26, 2018
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Heiko Wagner, Sidheswara Mahapatra
  • Publication number: 20170084475
    Abstract: A method includes providing a semiconductor processing system that includes a plurality of units. Each unit has a configuration that defines a predetermined orientation of a wafer that is provided in the unit and includes a plurality of wafer handling elements. An arrangement of the plurality of wafer handling elements of the unit relative to the predetermined orientation of the wafer is adjustable. For each of the plurality of units, the arrangement of the plurality of wafer handling elements of the unit is adjusted relative to the predetermined orientation of the wafer. For each of the plurality of units, an arrangement of the plurality of wafer handling elements relative to the predetermined orientation of the wafer is provided that is different from the arrangement of the plurality of wafer handling elements relative to the predetermined orientation of the wafer in one or more other units of the plurality of units.
    Type: Application
    Filed: June 8, 2016
    Publication date: March 23, 2017
    Inventors: Heiko Wagner, Sidheswara Mahapatra
  • Patent number: 7962459
    Abstract: The RMS database for a semiconductor process line is established on the basis of product groups or categories, wherein all members of a category are linked by a common feature, such as a common basic design or a common basic technology. Common process recipes in a specified category may then be set up only once, thereby reducing the amount of effort for establishing the database. Moreover, new product types may be readily incorporated into the categories, thereby enabling the employment of the already-established category-specific context information.
    Type: Grant
    Filed: December 23, 2003
    Date of Patent: June 14, 2011
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Kay Hellig, Ronald Grünz, Heiko Wagner, Uwe Liebold
  • Patent number: 7346407
    Abstract: By providing a detailed hierarchical structure for an APC algorithm and by dynamically adapting a hierarchical level in this structure, an efficient utilization of controller data is ensured, while at the same time a large number of process conditions may be taken into consideration without requiring a re-design of the hierarchical structure.
    Type: Grant
    Filed: October 12, 2005
    Date of Patent: March 18, 2008
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Heiko Wagner, Jan Raebiger
  • Patent number: 7325224
    Abstract: The electrical performance of sub-devices is detected and the corresponding measurement data is used to control a lithography process so as to compensate for any type of process variations during a manufacturing sequence.
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: January 29, 2008
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Rolf Seltmann, Heiko Wagner, Rolf Stephan
  • Publication number: 20060195213
    Abstract: By providing a detailed hierarchical structure for an APC algorithm and by dynamically adapting a hierarchical level in this structure, an efficient utilization of controller data is ensured, while at the same time a large number of process conditions may be taken into consideration without requiring a re-design of the hierarchical structure.
    Type: Application
    Filed: October 12, 2005
    Publication date: August 31, 2006
    Inventors: Heiko Wagner, Jan Raebiger
  • Patent number: 7006195
    Abstract: An advanced control system for a photolithography tool that receives measurement data relating to inline parameters varying with position on a substrate surface. The position sensitive measurement data is used to establish a position dependent target offset for an exposure map, thereby effectively compensating for substrate non-uniformities. Since the inline measurement data is available significantly earlier in comparison to electrical measurement data of a completed circuit element, a more accurate exposure map may be obtained taking into account the process history of the substrates.
    Type: Grant
    Filed: July 23, 2003
    Date of Patent: February 28, 2006
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Jan Raebiger, Heiko Wagner, Uwe Schulze, Rolf Seltmann
  • Publication number: 20050120328
    Abstract: The electrical performance of sub-devices is detected and the corresponding measurement data is used to control a lithography process so as to compensate for any type of process variations during a manufacturing sequence.
    Type: Application
    Filed: November 12, 2004
    Publication date: June 2, 2005
    Inventors: Rolf Seltmann, Heiko Wagner, Rolf Stephan
  • Publication number: 20040220968
    Abstract: The RMS database for a semiconductor process line is established on the basis of product groups or categories, wherein all members of a category are linked by a common feature, such as a common basic design or a common basic technology. Common process recipes in a specified category may then be set up only once, thereby reducing the amount of effort for establishing the database. Moreover, new product types may be readily incorporated into the categories, thereby enabling the employment of the already-established category-specific context information.
    Type: Application
    Filed: December 23, 2003
    Publication date: November 4, 2004
    Inventors: Kay Hellig, Ronald Grunz, Heiko Wagner, Uwe Liebold
  • Publication number: 20040165164
    Abstract: An advanced control system for a photolithography tool that receives measurement data relating to inline parameters varying with position on a substrate surface. The position sensitive measurement data is used to establish a position dependent target offset for an exposure map, thereby effectively compensating for substrate non-uniformities. Since the inline measurement data is available significantly earlier in comparison to electrical measurement data of a completed circuit element, a more accurate exposure map may be obtained taking into account the process history of the substrates.
    Type: Application
    Filed: July 23, 2003
    Publication date: August 26, 2004
    Inventors: Jan Raebiger, Heiko Wagner, Uwe Schulze, Rolf Seltmann