Patents by Inventor Heinrich Mohn

Heinrich Mohn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4530818
    Abstract: An epitaxy bell of transparent fused silica is provided with a flanged, thick-walled tubular piece of transparent fused silica on the side on which a process gas is exhausted. The wall thickness of the constricted portion of the bell is increased toward the transparent fused silica tubular piece.
    Type: Grant
    Filed: February 4, 1982
    Date of Patent: July 23, 1985
    Assignee: Heraeus Quarzschmelze GmbH
    Inventors: Alfons Gutermann, Heinz Herzog, Heinrich Mohn, Karl A. Schulke
  • Patent number: 4340627
    Abstract: A method is described for the production of porous bodies from vitreous silica without the use of tools. Vitreous silica wool and/or threads are wound in layers on a form. After the coil has attained a certain minimum thickness, the threads of each succeeding layer are permanently bonded by heating the threads of the preceding layer at the points where the threads cross. The form is removed, and then the threads on the inside of the body are bonded together.The bodies are used for the production of high-purity blocks of silicon for solar cells.
    Type: Grant
    Filed: August 28, 1980
    Date of Patent: July 20, 1982
    Assignee: Heraeus Quarzschmelze GmbH
    Inventors: Heinz Herzog, Heinrich Mohn, Karl-Albert Schulke, Holger Grzybowski
  • Patent number: 4102666
    Abstract: Quartz glass element, such as a diffusion tube useful in the production of semiconductor elements, capable of forming an outer layer of uniformly fine crystalline silica such as cristobalite or tridymite when heated to a temperature at which such crystalline silica forms containing crystallization promoting nuclei having a rate of diffusion in quartz glass less than that of sodium at elevated temperatures. Such nuclei are preferably present in the outer half of the element wall. When the quartz glass element is exposed to elevated temperatures, the nuclei promotes the formation of the outer layer of uniformly fine crystalline silica which imparts thermal dimensional stability for extended periods of use at elevated temperatures.
    Type: Grant
    Filed: September 25, 1975
    Date of Patent: July 25, 1978
    Assignee: Heraeus-Schott Quarzschmelze GmbH
    Inventors: Peter Baumler, Gerhard Hofer, Tassilo Korner, Heinrich Mohn, Karl Seiler, Fritz Simmat, Karlheinz Rau
  • Patent number: 4019645
    Abstract: A crucible of pure transparent silica glass or pure translucent or opaque silica glass for the production of monocrystals used in making semiconductor elements which includes a hollow cylindrical part and a welded-on head. The head end of the hollow cylindrical part is formed from a tube with a head margin portion constricted towards the tube axis which is formed by shaping one end of the tube. A plate is welded into the aperture formed by the constricted head margin portion and has an area equal to at least one-tenth and at most four-fifths of the total head area made up by the head margin portion and the head.
    Type: Grant
    Filed: December 3, 1973
    Date of Patent: April 26, 1977
    Assignee: Heraeus-Schott Quarzschmelze GmbH
    Inventors: Karl Seiler, Martin Selke, Oswald Siegling, Heinz Herzog, Horst Albrecht, Heinrich Mohn