Patents by Inventor Heinrich Von Bunau
Heinrich Von Bunau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11177412Abstract: A sputter deposition method includes sputtering a first target material onto a web substrate moving through a first process module while heating the substrate, providing the substrate from the first process module to a connection unit containing a roller assembly including a plurality of cylindrical rollers, bending the substrate at an angle of 10° to 40° around the roller assembly in the connection unit, providing the substrate from the connection unit to a second process module, and sputtering a second target material onto the substrate moving through the second process module while heating the substrate.Type: GrantFiled: April 22, 2019Date of Patent: November 16, 2021Assignee: BEIJING APOLLO DING RONG SOLAR TECHNOLOGY CO., LTD.Inventors: Thomas Heckel, Heinrich von Bunau
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Publication number: 20200335654Abstract: A sputter deposition method includes sputtering a first target material onto a web substrate moving through a first process module while heating the substrate, providing the substrate from the first process module to a connection unit containing a roller assembly including a plurality of cylindrical rollers, bending the substrate at an angle of 10° to 40° around the roller assembly in the connection unit, providing the substrate from the connection unit to a second process module, and sputtering a second target material onto the substrate moving through the second process module while heating the substrate.Type: ApplicationFiled: April 22, 2019Publication date: October 22, 2020Inventors: Thomas HECKEL, Heinrich von BUNAU
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Patent number: 10262843Abstract: A sputtering target assembly, including a cylindrical backing tube, a magnet assembly disposed within the backing tube, and a conduit disposed within the backing tube and adapted for transporting coolant. The conduit includes at least one first opening positioned for providing the coolant in a substantially circumferential direction from the conduit toward an inner surface of the backing tube into a gap volume between a front side of the magnet assembly and the inner surface of the backing tube.Type: GrantFiled: November 23, 2016Date of Patent: April 16, 2019Assignee: BEIJING APOLLO DING RONG SOLAR TECHNOLOGY CO., LTD.Inventors: Robert Martinson, Paul Shufflebotham, Kevin Lynch, Heinrich von Bunau, Deborah Sloan, Daniel R. Juliano
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Publication number: 20180219509Abstract: Disclosed are apparatuses and methods for an apparatus that has a flexible mounting substrate, one or more flexible photovoltaic modules attached to the flexible mounting substrate, one or more inverters attached to the flexible mounting substrate and electrically connected to the one or more flexible photovoltaic modules, a flexible electrical conduit electrically connected to the one or more inverters and to the one or more flexible photovoltaic modules, a plurality of mounting features, and a plurality of flexible connectors that extend between the flexible mounting substrate and one corresponding mounting feature, that is configured to be positioned above a structure and secured to the structure without penetrating roofing of the structure.Type: ApplicationFiled: February 1, 2017Publication date: August 2, 2018Inventors: Robert Martinson, Cormac Wicklow, Jason Cheng, Arthur Cheung, Heinrich von Bunau, Darin S. Birtwhistle, Hyung Paek, Robert McClymond
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Publication number: 20180194028Abstract: Disclosed are apparatuses and methods for cutting thin film solar cells. The apparatus may include circular knife cutter rollers, each having a knife edge and coupled with a cutter arbor, support rollers, each coupled to a support arbor and having first and second outer surfaces and a circumferential gap between the first and second outer surfaces partially defined by a first side, a second side facing and offset from the first side, a first rounded edge where the first side intersects with the first outer surface, and a second sharp edge where the second side intersects with the second outer surface. The cutter arbor and support arbor are offset, and the knife cutter rollers and support rollers are axially spaced, such that one knife edge is positioned in the gap of each support roller and the web may be fed between the cutter arbor and the support arbor.Type: ApplicationFiled: January 6, 2017Publication date: July 12, 2018Inventors: Stephen Motta, Andrew Nordhoff, Kedar Y. Hardikar, Heinrich von Bunau, Robert Martinson
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TEMPERATURE-CONTROLLED CHALCOGEN VAPOR DISTRIBUTION APPARATUS AND METHOD FOR UNIFORM CIGS DEPOSITION
Publication number: 20180037981Abstract: A deposition system and method for depositing a uniform film of a chalcogen-containing compound semiconductor are provided. The deposition system includes a vacuum enclosure connected to a vacuum pump, a sputtering system comprising at least one sputtering target located in the vacuum enclosure, a chalcogen-containing gas source, and a gas distribution manifold having a supply side and a distribution side. The distribution side has a plurality of opening regions having independent temperature control and the supply side is connected to the chalcogen-containing gas source. A method of reactive sputter depositing a chalcogen-containing compound semiconductor material includes sputtering at least one metal component of the chalcogen-containing compound semiconductor material onto the substrate, and providing a higher chalcogen flux to ends of the substrate than to a middle of the substrate to form the chalcogen-containing compound semiconductor material.Type: ApplicationFiled: August 3, 2016Publication date: February 8, 2018Inventors: Robert D. Tas, Heinrich Von Bunau, Robert Martinson -
Publication number: 20170140906Abstract: A sputtering target assembly, including a cylindrical backing tube, a magnet assembly disposed within the backing tube, and a conduit disposed within the backing tube and adapted for transporting coolant. The conduit includes at least one first opening positioned for providing the coolant in a substantially circumferential direction from the conduit toward an inner surface of the backing tube into a gap volume between a front side of the magnet assembly and the inner surface of the backing tube.Type: ApplicationFiled: November 23, 2016Publication date: May 18, 2017Inventors: Robert Martinson, Paul Shufflebotham, Kevin Lynch, Heinrich von Bunau, Deborah Sloan, Daniel R. Juliano
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Patent number: 9512516Abstract: A sputtering target assembly, including a cylindrical backing tube, a magnet assembly disposed within the backing tube, and a conduit disposed within the backing tube and adapted for transporting coolant. The conduit includes at least one first opening positioned for providing the coolant in a substantially circumferential direction from the conduit toward an inner surface of the backing tube into a gap volume between a front side of the magnet assembly and the inner surface of the backing tube.Type: GrantFiled: September 23, 2010Date of Patent: December 6, 2016Assignee: BEIJING APOLLO DING RONG SOLAR TECHNOLOGY CO., LTD.Inventors: Robert Martinson, Paul Shufflebotham, Kevin Lynch, Heinrich von Bunau, Deborah Sloan, Daniel R. Juliano
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Publication number: 20160190383Abstract: A deposition apparatus includes an input spool located in non-vacuum input module, at least one vacuum process module, an accumulator, and an air to vacuum sealing mechanism. The accumulator and the sealing mechanism are configured to continuously provide a web substrate from the input spool at atmosphere into the at least one process module at vacuum without stopping the web substrate.Type: ApplicationFiled: March 3, 2016Publication date: June 30, 2016Inventors: Paul Shufflebotham, Robert Martinson, Heinrich von Bunau, Kevin Lynch, Mathew Sheffield
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Patent number: 9303316Abstract: A deposition apparatus includes an input spool located in non-vacuum input module, at least one vacuum process module, an accumulator, and an air to vacuum sealing mechanism. The accumulator and the sealing mechanism are configured to continuously provide a web substrate from the input spool at atmosphere into the at least one process module at vacuum without stopping the web substrate.Type: GrantFiled: January 13, 2011Date of Patent: April 5, 2016Assignee: APOLLO PRECISION KUNMING YUANHONG LIMITEDInventors: Paul Shufflebotham, Robert Martinson, Heinrich von Bunau, Kevin Lynch, Mathew Sheffield
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Patent number: 9255323Abstract: A sputtering target has a cylindrical backing tube having two edges and a sidewall comprising a middle portion located between two end portions. The sputtering material is on the backing tube. The sputtering material does not cover at least one end portion of the backing tube. The sputtering target also has a feature which prevents or reduces at least one of chalcogen buildup and arcing at the at least one end portion of the backing tube not covered by the sputtering material.Type: GrantFiled: June 18, 2012Date of Patent: February 9, 2016Assignee: APOLLO PRECISION FUJIAN LIMITEDInventors: Robert Martinson, Heinrich Von Bunau, Mark Campello, Ron Rulkens, Tom Heckel, Johannes Vlcek
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Publication number: 20130337602Abstract: A sputtering target has a cylindrical backing tube having two edges and a sidewall comprising a middle portion located between two end portions. The sputtering material is on the backing tube. The sputtering material does not cover at least one end portion of the backing tube. The sputtering target also has a feature which prevents or reduces at least one of chalcogen buildup and arcing at the at least one end portion of the backing tube not covered by the sputtering material.Type: ApplicationFiled: June 18, 2012Publication date: December 19, 2013Applicant: MiaSoleInventors: Robert Martinson, Heinrich Von Bunau, Mark Campello, Ron Rulkens, Tom Heckel, Johannes Vlcek
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Patent number: 8099192Abstract: A method is provided for teaching a transfer robot used in conjunction with a workpiece processing system including a pedestal assembly, a light sensor having an optical input fixedly coupled to the pedestal assembly, a transfer robot having an end effector, and a processing chamber containing the pedestal assembly and light sensor. The method includes the steps of producing light within the processing chamber, moving the end effector over the optical input such that amount of light reaching the light sensor varies in relation to the position of the end effector, and recording the signal gain as the end effector is moved over the optical input. The method also includes the step of establishing from the recorded signal gain a desired position of the end effector relative to the pedestal assembly.Type: GrantFiled: November 6, 2007Date of Patent: January 17, 2012Assignee: Novellus Systems, Inc.Inventors: Damon Genetti, Heinrich Von Bunau, Tarek Radwan, Karen Townsend
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Publication number: 20090118862Abstract: A method is provided for teaching a transfer robot used in conjunction with a workpiece processing system including a pedestal assembly, a light sensor having an optical input fixedly coupled to the pedestal assembly, a transfer robot having an end effector, and a processing chamber containing the pedestal assembly and light sensor. The method includes the steps of producing light within the processing chamber, moving the end effector over the optical input such that amount of light reaching the light sensor varies in relation to the position of the end effector, and recording the signal gain as the end effector is moved over the optical input. The method also includes the step of establishing from the recorded signal gain a desired position of the end effector relative to the pedestal assembly.Type: ApplicationFiled: November 6, 2007Publication date: May 7, 2009Applicant: NOVELLUS SYSTEMS, INC.Inventors: Damon GENETTI, Heinrich VON BUNAU, Tarek RADWAN, Karen TOWNSEND
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Patent number: 6086246Abstract: A plasma resistant lightpipe is used in a pyrometric temperature measurement system to measure the temperature of a substrate in a reaction chamber. The plasma resistant lightpipe includes two lightpipe elements. The first lightpipe element, which may be a sapphire rod or aluminum nitride rod, is positioned within a backside gas delivery path to the chamber. The first lightpipe element is resistant to etching caused by reactive plasmas or gases used within the chamber, such as fluorine. The second lightpipe, which is a quartz rod, is positioned beneath the first lightpipe element such that the two lightpipe elements are optically coupled. The first lightpipe element may be directly mounted in the base plate or electrostatic chuck of the pedestal assembly or directly mounted in a plug, which is then positioned within the base plate or electrostatic chuck.Type: GrantFiled: May 26, 1998Date of Patent: July 11, 2000Assignee: Novellus Systems, Inc.Inventors: Paul Kevin Shufflebotham, Heinrich Von Bunau