Abstract: In a known drawing method for producing a cylindrical component from quartz glass, a quartz glass strand (2) is continuously drawn off from a softened quartz glass composition (13) vertically downwards in the drawing direction (3), a piece (15) with a weight G is detached from the free end of the strand at a time t1 and the cylindrical component is produced from the piece (15). When the piece (15) is detached, there may be a sudden reduction in weight, which leads to fluctuations in the thawing-off control. To counteract this, it is proposed according to the invention that a weight compensating force which acts counter to the drawing direction (3), increases over time and completely or partially compensates for the weight G of the piece (15), is applied to the piece to be detached at a time t0 before t1.

Abstract: In a known drawing method for producing a cylindrical component from quartz glass, a quartz glass strand (2) is continuously drawn off from a softened quartz glass composition (13) vertically downwards in the drawing direction (3), a piece (15) with a weight G is detached from the free end of the strand at a time t1 and the cylindrical component is produced from the piece (15). When the piece (15) is detached, there may be a sudden reduction in weight, which leads to fluctuations in the thawing-off control. To counteract this, it is proposed according to the invention that a weight compensating force which acts counter to the drawing direction (3), increases over time and completely or partially compensates for the weight G of the piece (15), is applied to the piece to be detached at a time t0 before t1.

Abstract: The invention relates to a previously known method for producing synthetic silica glass, comprising the following steps: a gas stream containing a vaporizable initial substance, which can be converted into SiO2 by means of oxidation or flame hydrolysis, is formed; the gas stream is delivered to a reaction zone in which the initial substance is converted so as to form amorphous SiO2 particles; the amorphous SiO2 particles are deposited on a support so as to form an SiO2 layer; and the SiO2 is vitrified during or following deposition of the SiO2 particles in order to obtain the silica glass. The aim of the invention is to create an economical method for producing synthetic silica glass, which is characterized by a favorable damaging behavior towards short-wave UV radiation while being particularly suitable for producing an optical component used for transmitting high-energy ultraviolet radiation having a wavelength of 250 nm or less.

Abstract: An equalization chamber has a first plurality of gas inlet openings for a gas stream and a second plurality of gas outlet openings for partial gas streams, each outlet being connected by way of a gas line to a gas consumer, the maximum flow resistance for each partial gas stream being located in the area under the gas outlet openings, seen in the flow direction of the partial gas streams. To guarantee the highest possible degree of uniformity and reproducibility of the gas supply to the consumers, the maximum flow resistance for each partial gas stream is provided in the gas line between the gas outlet opening and the gas consumer.