Abstract: The present invention concerns a process for preparing products having layers/films of silicon derivates comprising the following steps: a) Preparing a mould made of elastomeric material and having a plurality of grooves with mutual spacing in the range from 1 ?m to 1 mm; b) incubating the mould of step a) in a solution of silicateins in a range of temperatures from 2 to 10° C. and in a range of time from a few minutes to 103 hours; c) providing a target substrate of silicon or oxides thereof; d) transferring the silicateins from the mould to the said target substrate through soft lithography technique for a time period from a few seconds to 103 hours and removing the elastomeric mould; e) incubating the substrate with patterned silicateins of step d) in a solution of one or more precursors belonging to the class of silane compounds for a time period in a range from a few seconds to 103 hours in a temperature range from 2° C. to 25° C.