Abstract: Techniques that can facilitate high-transparency semiconductor-metal interfaces are provided. In one example, a method can comprise forming a silicon on insulator (SOI) over a wafer. The method can further comprise depositing a metal on the SOI. The method can further comprise forming a structure by dry-etching the metal and dry-etching the SOI. The method can further comprise forming a template over the structure. The method can further comprise etching a portion of the SOI for removal under the metal. The method can further comprise growing a semiconductor where the portion of SOI was removed.

Abstract: One aspect relates to a light guide comprising a jacket and one or more cores, wherein the jacket surrounds the cores. Each core has a refractive index profile perpendicular to the maximum extension of the core, wherein at least one refractive index nK of each refractive index profile is greater than the refractive index nM1 of the jacket. The jacket is made of silicon dioxide and has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm, and an aluminium content of less than 200 ppb. One aspect also relates to a silicon dioxide granulate I, characterized by a chlorine content of less than 200 ppm and an aluminium content of less than 200 ppb, in each case based on the total weight of the silicon dioxide granulate I.

Abstract: One aspect relates to a light guide comprising a jacket and one or more cores, wherein the jacket surrounds the cores. Each core has a refractive index profile perpendicular to the maximum extension of the core, wherein at least one refractive index nK of each refractive index profile is greater than the refractive index nM1 of the jacket. The jacket is made of silicon dioxide and has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm, and an aluminium content of less than 200 ppb. One aspect also relates to a silicon dioxide granulate I, characterized by a chlorine content of less than 200 ppm and an aluminium content of less than 200 ppb, in each case based on the total weight of the silicon dioxide granulate I.

Abstract: One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate composed of a pyrogenic silicon dioxide powder, making a glass melt out of the silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt. The quartz glass body has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm and an aluminium content of less than 200 ppb. One aspect also relates to a quartz glass body which is obtainable by this process. Furthermore, one aspect relates to a formed body and a structure, each of which is obtainable by further processing of the quartz glass body.

Abstract: A method for producing titanium-doped synthetic quartz glass includes: (A) providing a liquid SiO2 feedstock material that comprises more than 60% by weight of the polyalkylsiloxane D4; (B) evaporating the liquid SiO2 feedstock material to produce a gaseous SiO2 feedstock vapor; (C) evaporating a liquid TiO2 feedstock material to produce a gaseous TiO2 feedstock vapor; (D) converting the SiO2 feedstock vapor and the TiO2 feedstock vapor into SiO2 particles and TiO2 particles, respectively; (E) depositing the SiO2 particles and the TiO2 particles on a deposition surface while forming a titanium-doped SiO2 soot body; (F) vitrifying the titanium-doped SiO2 soot body while forming the synthetic quartz glass, whereby the TiO2 concentration of the synthetic quartz glass is between 5% by weight and 11% by weight.

Abstract: A method for producing titanium-doped synthetic quartz glass includes: (A) providing a liquid SiO2 feedstock material that comprises more than 60% by weight of the polyalkylsiloxane D4; (B) evaporating the liquid SiO2 feedstock material to produce a gaseous SiO2 feedstock vapor; (C) evaporating a liquid TiO2 feedstock material to produce a gaseous TiO2 feedstock vapor; (D) converting the SiO2 feedstock vapor and the TiO2 feedstock vapor into SiO2 particles and TiO2 particles, respectively; (E) depositing the SiO2 particles and the TiO2 particles on a deposition surface while forming a titanium-doped SiO2 soot body; (F) vitrifying the titanium-doped SiO2 soot body while forming the synthetic quartz glass, whereby the TiO2 concentration of the synthetic quartz glass is between 5% by weight and 11% by weight.

Abstract: A method for producing synthetic quartz glass comprises providing a liquid SiO2 feedstock material containing mainly octamethylcyclotetrasiloxane D4, vaporizing the SiO2 feedstock material into a feedstock vapor, converting the feedstock vapor into SiO2 particles, depositing the SiO2 particles on a deposition surface while forming a porous SiO2 soot body. and vitrifying the SiO2 soot body while forming the synthetic quartz glass. To produce large—volume cylindrical soot bodies with outer diameters of more than 300 mm of improved material homogeneity. the liquid feedstock material contains additional components comprising hexarnethylcyciotrisilxane D3 and its linear homolog with a weight fraction mD3, dodecamethylcyclohexasiloxane D6 and its linear homolog with a weight fraction mD6, and tetradecamethylcycloheptasiloxane D7 and/or hexadecamethylcyclooctasiloxane D8 and its linear homologs with a weight fraction mD7+. The weight ratio mD3/mD6 is in a range between 0.

Abstract: A known method for producing synthetic quartz glass comprises the method steps of: forming a stream of a SiO2 feedstock material which contains octamethylcyclotetrasiloxane (D4) as the main component which has a reference molecular mass assigned to it, feeding the stream to a reaction zone in which the feedstock material is converted under formation of amorphous SiO2 particles by pyrolysis or hydrolysis into SiO2, depositing the amorphous SiO2 particles on a deposition surface while forming a porous SiO2 soot body, and vitrifying the SiO2 soot body while forming the synthetic quartz glass.

Abstract: The present invention relates to a method for producing synthetic quartz glass, comprising the steps of: providing a liquid SiO2 feedstock material (105), which comprises more than 70% by wt. of the octamethylcyclotetrasiloxane D4, vaporizing the SiO2 feedstock material (105) into a gaseous SiO2 feedstock vapor (107), converting the SiO2 feedstock vapor (107) into SiO2 particles, depositing the SiO2 particles on a deposition surface (160) while forming a SiO2 soot body (200), vitrifying the SiO2 soot body (200) while forming the synthetic quartz glass. According to the invention it is provided that vaporizing the heated SiO2 feedstock material (105) comprises an injection phase in an expansion chamber (125) in which the heated SiO2 feedstock material (105) is atomized into droplets, the droplets having a mean diameter of less than 5 pm, preferably less than 2 ?m.

Abstract: A method for producing synthetic quartz glass comprises providing a liquid SiO2 feedstock material containing mainly octamethylcyclotetrasiloxane D4, vaporizing the SiO2 feedstock material into a feedstock vapor, converting the feedstock vapor into SiO2 particles, depositing the SiO2 particles on a deposition surface while forming a porous SiO2 soot body, and vitrifying the SiO2 soot body while forming the synthetic quartz glass. To produce large-volume cylindrical soot bodies with outer diameters of more than 300 mm of improved material homogeneity, the liquid feedstock material contains additional components comprising hexamethylcyclotrisiloxane D3 and its linear homolog with a weight fraction mD3, dodecamethylcyclohexasiloxane D6 and its linear homolog with a weight fraction mD6, and tetradecamethylcycloheptasiloxane D7 and/or hexadecamethylcyclooctasiloxane D8 and its linear homologs with a weight fraction mD7+. The weight ratio mD3/mD6 is in a range between 0.

Abstract: The present invention relates to a method for producing synthetic quartz glass, comprising the steps of: (A) providing a liquid SiO2 feedstock material (105), which comprises more than 70% by wt. of the polyalkylsiloxane D4, (B) vaporizing the SiO2 feedstock material (105) into a gaseous SiO2 feedstock vapor (107), (C) converting the SiO2 feedstock vapor (107) into SiO2 particles, (D) depositing the SiO2 particles on a deposition surface (160) while forming a SiO2 soot body (200), (E) vitrifying the SiO2 soot body (200) while forming the synthetic quartz glass, According to the invention it is provided that vaporizing the heated SiO2 feedstock material (105) comprises an injection phase in an expansion chamber (125) in which the SiO2 feedstock material (105) is atomized into fine droplets, the droplets having a mean diameter of less than 5 ?m, preferably less than 2 ?m.

Abstract: A known method for producing synthetic quartz glass comprises the method steps: providing a liquid SiO2 feedstock material, which contains octamethylcyclotetrasiloxane D4 as the main component, vaporizing the SiO2 feedstock material into a feedstock material vapor, converting the feedstock material vapor into SiO2 particles, depositing the SiO2 particles on a deposition surface while forming a porous SiO2 soot body, and vitrifying the SiO2 soot body while forming the synthetic quartz glass.

Abstract: A method for producing synthetic quartz glass comprises providing a liquid SiO2 feedstock material containing octamethylcyclotetrasiloxane D4, vaporizing the SiO2 feedstock material into vapor, converting the vapor into SiO2 particles, depositing the particles to form a porous SiO2 soot body, and vitrifying the soot body, forming the synthetic quartz glass. To produce cylindrical soot bodies with outer diameters above 300 mm and improved material homogeneity, the liquid feedstock material contains additional components comprising hexamethylcyclotrisiloxane D3 and the linear homolog thereof with a weight fraction mD3, decamethylcyclohexasiloxane D6 and the linear homolog thereof with a weight fraction mD6, and tetradecamethylcycloheptasiloxane D7 and/or hexadecamethylcyclooctasiloxane D8 and the linear homologs thereof with a weight fraction mD7+, wherein the weight ratio mD3/mD6 is between 0.5 and 500 and the weight fraction mD7+ is at least 20 wt. ppm.

Abstract: A known method for producing synthetic quartz glass comprises the method steps of: forming a stream of a SiO2 feedstock material which contains octamethylcyclotetrasiloxane (D4) as the main component which has a reference molecular mass assigned to it, feeding the stream to a reaction zone in which the feedstock material is converted under formation of amorphous SiO2 particles by pyrolysis or hydrolysis into SiO2, depositing the amorphous SiO2 particles on a deposition surface while forming a porous SiO2 soot body, and vitrifying the SiO2 soot body while forming the synthetic quartz glass.

Abstract: In a known method for the production of a blank mold for optical fibers, a fluorine-doped SiO2 enveloping glass is produced on a core glass cylinder that rotates about its longitudinal axis, wherein a silicon-containing starting substance is fed to a plasma burner, said substance is then oxidized in a plasma flame assigned to the plasma burner to obtain SiO2 particles, the SiO2 particles are deposited by layers on the enveloping surface of the cylinder of the core glass cylinder in the presence of fluorine and sintered into the enveloping glass. The invention aims at providing an economical method, which builds upon the above-mentioned method, in order to produce a blank mold from which optical multi-mode fibers (52) can be obtained.

Abstract: In a known method for the production of a blank mold for optical fibers, a fluorine-doped SiO2 enveloping glass is produced on a core glass cylinder that rotates about its longitudinal axis, wherein a silicon-containing starting substance is fed to a plasma burner, said substance is then oxidized in a plasma flame assigned to the plasma burner to obtain SiO2 particles, the SiO2 particles are deposited by layers on the enveloping surface of the cylinder of the core glass cylinder in the presence of fluorine and sintered into the enveloping glass. The invention aims at providing an economical method, which builds upon the above-mentioned method, in order to produce a blank mold from which optical multi-mode fibers (52) can be obtained.

Abstract: The aim of the invention is to improve a known quartz glass cylinder for the production of an optical component, comprising an inner drilling, which is mechanically machined to size and provided with an etched structure by means of an etching treatment, subsequent to the mechanical machining, such that in the application thereof for production of pre-forms and optical fibers, few bubbles arise along the boundary surface between core and sleeve. Said aim is achieved, whereby the etched structure comprises striations with a maximum depth of 2.0 mm and a maximum width of 100 ?m.

Abstract: An acidified edible oil in water emulsion with a pH from 3.5 to 6, comprising protein and from 1 to 40 wt % of a fat wherein the fat comprises 20 to 100 wt % of a vegetable fat composition on total fat, and wherein the composition comprises from 4 to 15 volume % of a gas, wherein the average diameter of the gas bubbles is in the range of from 50 to 500 ?m.

Abstract: Jacket tubes of synthetically produced quartz glass as a semi-finished product for producing an outer cladding glass layer of an optical fiber are generally known. The invention relates to an improvement of a jacket tube in terms of inexpensive producibility and of suitability as a semi-finished product for optical fibers having a low optical attenuation. According to the invention this object is achieved by a jacket tube in which the quartz glass has a content of metastable OH groups of less than 0.05 wt ppm and a content of anneal-stable OH groups of less than 0.05 wt ppm.

Abstract: In a known method for the production of a blank mold for optical fibers, a fluorine-doped SiO2 enveloping glass is produced on a core glass cylinder that rotates about its longitudinal axis, wherein a silicon-containing starting substance is fed to a plasma burner, said substance is then oxidized in a plasma flame assigned to the plasma burner to obtain SiO2 particles, the SiO2 particles are deposited by layers on the enveloping surface of the cylinder of the core glass cylinder in the presence of fluorine and sintered into the enveloping glass. The invention aims at providing an economical method, which builds upon the above-mentioned method, in order to produce a blank mold from which optical multi-mode fibers (52) can be obtained.