Abstract: A micromechanical sensor for measuring at least a first pressure of a first medium, as well as a method for manufacturing such a micromechanical sensor. The micromechanical sensor has at least one substrate having at least two sensor elements, which are preferably made of a semiconductive material. The substrate has at least a first sensor element for measuring an absolute-pressure variable of the first medium and a second sensor element for measuring a relative-pressure variable of the first medium.

Abstract: A micromechanical sensor for measuring at least a first pressure of a first medium, as well as a method for manufacturing such a micromechanical sensor. The micromechanical sensor has at least one substrate having at least two sensor elements, which are preferably made of a semiconductive material. The substrate has at least a first sensor element for measuring an absolute-pressure variable of the first medium and a second sensor element for measuring a relative-pressure variable of the first medium.

Abstract: A device for supplying power to a tire-pressure sensor, containing a generator that is corotational with the tire and in which an electric voltage is generated by electromagnetic induction.

Abstract: A pressure sensor for contactless pressure measurement, in particular of gas pressures, having a pressure switch which is switched on or off as a function of the prevailing pressure. An in particular robust and long-lasting pressure sensor may be implemented when an LC circuit connected to the pressure switch is provided which is opened or closed as a function of the prevailing pressure.

Abstract: A micromechanical apparatus, a pressure sensor, and a method, a closed cavity being provided beneath a membrane, the membrane having a greater thickness in a first membrane region than in a second membrane region.

Abstract: A method for manufacturing a semiconductor device includes the steps of providing a substrate, depositing a monocrystalline sacrificial layer onto the substrate, depositing a monocrystalline function layer onto the sacrificial layer, and removing at least part of the sacrificial layer after the function layer depositing step.

Abstract: A method for manufacturing a semiconductor device includes the steps of providing a substrate, depositing a monocrystalline sacrificial layer onto the substrate, depositing a monocrystalline function layer onto the sacrificial layer, and removing at least part of the sacrificial layer after the function layer depositing step.

Abstract: An apparatus, a tire, a transmitting and/or receiving device and a system for the wireless transmission of data between the apparatus and the transmitting and/or receiving device are provided, an antenna being frictionally connected to a rotating part, the antenna being provided in a manner that it projects from the part.

Abstract: A micromechanical component, particularly a pressure sensor, includes a substrate, made of semiconductor material; a functional layer provided epitactically on substrate; a hollow space being provided between substrate and functional layer defining a diaphragm region of functional layer; and below diaphragm region, on substrate, one or more spacers being provided, for preventing adhesion of diaphragm region to substrate during deformation. Also described is an appropriate manufacturing method.

Abstract: A micromechanical component, particularly a pressure sensor, includes a substrate, made of semiconductor material; a functional layer provided epitactically on substrate; a hollow space being provided between substrate and functional layer defining a diaphragm region of functional layer; and below diaphragm region, on substrate, one or more spacers being provided, for preventing adhesion of diaphragm region to substrate during deformation. Also described is an appropriate manufacturing method.

Abstract: A micromechanical component, in particular an acceleration sensor, includes a substrate, at least one spring element and at least one seismic mass. The spring element is joined at a first end to the substrate and at a second end to the mass, and the rigidity of the spring element is set such that a movement of the mass relative to the substrate can be caused by an acceleration parallel to a surface of the substrate. For the spring element, provision is made for a spring limit stop which limits a deformation of the spring element in response to an acceleration parallel to the surface of the substrate.

Abstract: A method for fabricating a micromechanical component, in particular a surface-micromechanical acceleration sensor, involves preparing a substrate and providing an insulation layer on the substrate, in which a patterned circuit trace layer is buried. A conductive layer, including a first region and a second region, is provided on the insulation layer, and a movable element is configured in the first region by forming a first plurality of trenches and by using an etching agent to remove at least one portion of the insulation layer from underneath the conductive layer. A contact element is formed and electrically connected to the circuit trace layer in the second region by configuring a second plurality of trenches, and the resultant movable element is encapsulated in the first region. The second plurality of trenches for forming the contact element in the second region is first formed after the encapsulation of the movable element formed in the first region.

Abstract: A method for producing acceleration sensors is proposed, in which a silicon layer that is deposited in an epitaxial application system is used. Above sacrificial layers (2) applied to the substrate (1), the material grows in the form of a polysilicon layer (6), which has a certain surface roughness. By application of a photoresist and by a wet etching process, this surface roughness is eliminated. Alternatively, chemical-mechanical smoothing is contemplated.