Patents by Inventor Helen X. Xu

Helen X. Xu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180022642
    Abstract: A layered construct including: a substrate, a transparent electrically conductive layer positioned along an upper surface of the substrate, and an index-matching layer positioned adjacent the transparent electrically conductive layer that reduces the refractive index differential between the transparent electrically conductive layer and the substrate.
    Type: Application
    Filed: May 15, 2017
    Publication date: January 25, 2018
    Inventors: Ya Qun Liu, Hong Min Huang, Helen X. Xu
  • Publication number: 20170355826
    Abstract: A composition comprising a carbosilane polymer formed from at least one carbosilane monomer and at least one carbonyl contributing monomer. In some embodiments, the composition is suitable as gap filling and planarizing material, and may optionally include at least one chromophore for photolithography applications.
    Type: Application
    Filed: November 22, 2015
    Publication date: December 14, 2017
    Inventors: Yamini Pandey, Joseph T. Kennedy, Helen X. Xu
  • Publication number: 20160148814
    Abstract: Liquid titanium oxide compositions, methods for forming such compositions, and methods for etching material layers using such compositions are provided. In accordance with an exemplary embodiment, a liquid titanium oxide composition contains a solvent system, an organotitanate, and a high boiling point solvent having a boiling point in the range of about 140° C. to about 400° C.
    Type: Application
    Filed: June 2, 2014
    Publication date: May 26, 2016
    Inventors: Helen X. Xu, Richard Alan Spear, Roger Y. Leung, Lea Marie Metin, Songyuan Xie, Zeyu Benjamin Wu, Joseph Kennedy
  • Publication number: 20150126653
    Abstract: Dopant ink compositions for forming doped regions in semiconductor substrates and methods for fabricating dopant ink compositions are provided. In an exemplary embodiment, a dopant ink composition comprises a dopant compound including at least one alkyl group bonded to a Group 13 element. Further, the dopant ink composition includes a silicon-containing compound.
    Type: Application
    Filed: January 12, 2015
    Publication date: May 7, 2015
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventors: Ligui Zhou, Richard A. Spear, Roger Yu-Kwan Leung, Wenya Fan, Helen X. Xu, Lea M. Metin, Anil Shriram Bhanap
  • Patent number: 8975170
    Abstract: Dopant ink compositions for forming doped regions in semiconductor substrates and methods for fabricating dopant ink compositions are provided. In an exemplary embodiment, a dopant ink composition comprises a dopant compound including at least one alkyl group bonded to a Group 13 element or a Group 15 element. Further, the dopant ink composition includes a silicon-containing compound.
    Type: Grant
    Filed: October 24, 2011
    Date of Patent: March 10, 2015
    Assignee: Honeywell International Inc.
    Inventors: Ligui Zhou, Richard A. Spear, Roger Yu-Kwan Leung, Wenya Fan, Helen X. Xu, Lea M. Metin, Anil Shriram Bhanap
  • Patent number: 8629294
    Abstract: Borate esters, boron-comprising dopants, and methods of fabricating boron-comprising dopants are provided herein. In an embodiment, a borate ester comprises boron and silicon wherein the boron is linked to the silicon by alkyl groups that are bonded via ester bonds with both the boron and the silicon. A method of fabricating a boron-comprising dopant comprises providing a borate and transesterifying the borate using a polyol-substituted silicon monomer.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: January 14, 2014
    Assignee: Honeywell International Inc.
    Inventors: Richard A. Spear, Edward W. Rutter, Jr., Lea M. Metin, Helen X. Xu
  • Publication number: 20130098266
    Abstract: Dopant ink compositions for forming doped regions in semiconductor substrates and methods for fabricating dopant ink compositions are provided. In an exemplary embodiment, a dopant ink composition comprises a dopant compound including at least one alkyl group bonded to a Group 13 element or a Group 15 element. Further, the dopant ink composition includes a silicon-containing compound.
    Type: Application
    Filed: October 24, 2011
    Publication date: April 25, 2013
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventors: Ligui Zhou, Richard A. Spear, Roger Yu-Kwan Leung, Wenya Fan, Helen X. Xu, Lea M. Metin, Anil Shriram Bhanap
  • Publication number: 20130048918
    Abstract: Borate esters, boron-comprising dopants, and methods of fabricating boron-comprising dopants are provided herein. In an embodiment, a borate ester comprises boron and silicon wherein the boron is linked to the silicon by alkyl groups that are bonded via ester bonds with both the boron and the silicon. A method of fabricating a boron-comprising dopant comprises providing a borate and transesterifying the borate using a polyol-substituted silicon monomer.
    Type: Application
    Filed: August 25, 2011
    Publication date: February 28, 2013
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventors: Richard A. Spear, Edward W. Rutter, JR., Lea M. Metin, Helen X. Xu