Abstract: A process for preparing a sputtering target uses plasma spray technology to prepare a target, having a high density and a high purity comparable to that of an initial powder material. A powder to that is to be sprayed to a particle size range used for plasma spray is processed. a surface of a substrate is subjected to a surface treatment. A plasma sprayer sprays the powder onto the surface of the substrate that underwent surface treatment. The substrate that was sprayed is cleaned. The process can meet the requirements for preparation of large size targets needed to deposit both the electrolyte and the electrode films in the thin-film ion batteries.

Abstract: A radio frequency (RF) coaxial resonator feeding a saltshaker-like gas distributing electrode assembly forms a capacitively coupled plasma source. This apparatus can generate plasma of high density over a wide pressure range and large process window. The system may be used as a remote radical-rich plasma source for materials surface processing.

Abstract: The invention is a method and apparatus that provides for the control of optical signals in a polarization-independent manner using birefringence. The invention includes an optical coupler connected to a birefringence element by an optical path loop. The optical coupler and optical path loop could be a Sagnac interferometer. The birefringence element affects the phase velocity of optical signals based on a control signal, and it can introduce a relative phase shift between optical signals propagating around the loop. The optical signals can be routed based on this phase shift.