Patents by Inventor Hellmut Ahhe

Hellmut Ahhe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive o-quinone diazide photoresist containing base copolymer utilizing monomer having anhydride function and further monomer that increases etch resistance
    Patent number: 5360693
    Abstract: An aqueous-alkaline developable photoresist suitable for a lithography in deep ultraviolet light and having a structural resolution in the sub-.mu.m range. The photoresist contains a developable base polymer that comprises anhydride functions that act as solubility-mediating groups and also contains a photo-active component. In addition to being constructed of monomers carrying anhydride groups, the base polymer can be constructed of further monomers that produce designationally defined properties in the photoresist, for example, exhibit resistance to plasma etching processes. The photoresist of the present invention is therefore very versatile.
    Type: Grant
    Filed: May 10, 1993
    Date of Patent: November 1, 1994
    Assignee: Siemens Aktiengesellschaft
    Inventors: Michael Sebald, Recai Sezi, Rainer Leuschner, Seigfried Birkle, Hellmut Ahhe