Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract: An optical element comprises a fluid chamber and a device for providing a magnetic field over at least a portion of the fluid chamber The fluid chamber has side portions and end portions, and contains a first fluid and a second fluid. The fluids are non-miscible and the second fluid is capable of being influenced by a magnetic field. The end portions of the fluid chamber are connected together only by the side portions.

Abstract: Lithographic Apparatus and Device Manufacturing Method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

Abstract: An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.

Abstract: An optical element comprises a fluid chamber, the fluid chamber having side and end walls, and contains a first fluid (20) and a second fluid (22). The fluids are non-miscible and the second fluid is capable of being influenced by a magnetic field. A device (19) for providing a magnetic field over at least a portion of the fluid chamber is provided, with the magnetic field being capable of moving the second fluid so that the positions of the first an second fluids in the fluid chamber are altered. The second fluid may be a ferrofluid.

Abstract: The invention relates to variable focus lenses based on magneto wetting and related devices, wherein two fluids, one of which is magnetically susceptible, are in contact over a meniscus. The shape of the meniscus is controlled by means of an applied magnetic field gradient. The contact angle between the chamber wall and the meniscus is a conserved. Implementation of special shaping to the internal or external walls of the chamber, while conserving the contact angle, results in better lens shape in the variable focus lens and lower levels of lens distortion.

Abstract: An objective system (1?) for an optical scanning device for ultraviolet and/or deep-ultraviolet wavelengths is provided. The objective system (1?) comprises at least one glass component (3?) with an aspherical surface. The at least one glass component (3?) is made of a glass material comprising a low softening temperature and a low absorption coefficient for ultraviolet and/or deep-ultraviolet wavelengths.

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract: A device for directing radiation to a layer (1) is described. The device includes a first optical element (L1) for focusing a first radiation beam (B1) originating from a first radiation source (S1) onto said layer, a second optical element (L2) for focusing a second radiation beam (B2) originating from a second radiation source (S2) onto said layer. The wavelengths of the radiation from said first and said second radiation source are different from each other. The first and second optical element are jointly movable with respect to said radiation sources, wherein the focal points of the two radiation beams at least substantially coincide with various movements of the first optical element and the second optical element with respect to the radiation sources. The second optical element (L2) has an aperture (A2) which allows optically undisturbed passage of the first radiation beam (B1). In this way a compact and light configuration of L1 and L2 is achieved as well as an improved radiation beam quality.

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract: For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the optical element is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the optical element nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit and flowing out of an outflow opening through a total projected cross-sectional passage area in a plane parallel to the layer. The outflow opening or a plurality of the outflow openings are positioned such that, seen in a direction perpendicular to the layer, the total cross-sectional area has a centre in the portion of the interspace through which the radiation irradiates the spot.

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract: A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table. The liquid confinement structure is positioned adjacent a final surface of the projection system and includes a first inlet configured to supply a liquid, through which a patterned beam is to be projected, to the space, and a second inlet configured to supply gas and formed in a face of the structure. The face is arranged to oppose a surface of the substrate and the second inlet is located radially outward, with respect to an optical axis of the projection system, of the space and has a porous member to evenly distribute gas flow over an area of the second inlet.

Abstract: A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

Abstract: For irradiating a layer (3) a radiation beam (7) is directed and focused to a spot (11) on the layer (3), relative movement of the layer (3) relative to the optical element (59) is caused so that, successively, different portions of the layer (3) are irradiated and an interspace (53) between a surface of the optical element (59) nearest to the layer (3) is maintained. Furthermore, at least a portion of the interspace (53) through which the radiation irradiates the spot (11) on the layer (3) is maintained filled with a liquid (91). By directing a gas flow (71-73) to a surface zone (74) of the layer (3), liquid (91) is reliably prevented from passing that surface zone (74), without causing damage to the layer (3). The liquid (91) is drawn away from the layer (3) in the vicinity of the surface zone (74).

Abstract: An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.