Patents by Inventor Helmut Barzynski

Helmut Barzynski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5084592
    Abstract: Azulenesquaric acid dyes of the formula ##STR1## where R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 each have specified meanings are prepared from azulene derivatives of the formula ##STR2## where R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 each have specified meanings as intermediates, and used in an optical recording medium.
    Type: Grant
    Filed: September 30, 1988
    Date of Patent: January 28, 1992
    Assignee: BASF Aktiengesellschaft
    Inventors: Wolfgang Schrott, Peter Neumann, Sibylle Brosius, Helmut Barzynski, Klaus D. Schomann, Harald Kuppelmaier
  • Patent number: 4966798
    Abstract: An optical recording medium comprises a support material and a light-absorbing layer consisting essentially of a soluble mixture of a thermoplastic binder and at least one dye, wherein the thermoplastic binder is a phenol-aldehyde resin having an average molecular weight of greater than 300 which is soluble in an alcohol having a boiling point of less than 200.degree. C.
    Type: Grant
    Filed: June 9, 1989
    Date of Patent: October 30, 1990
    Assignee: BASF Aktiengesellschaft
    Inventors: Sibylle Brosius, Helmut Barzynski, Karl-Heinz Feuerherd, Wolfgang Schrott, Bernhard Albert, Michael Acker, Klaus D. Schomann, Harald Kuppelmaier, Michael Schmitt
  • Patent number: 4954422
    Abstract: A photosensitive recording material for recording information by means of a local change in the optical properties of a recording layer under the action of light having a high energy density, and a process for its preparation.
    Type: Grant
    Filed: January 13, 1989
    Date of Patent: September 4, 1990
    Assignee: BASF Aktiengesellschaft
    Inventors: Josef Lamprecht, Gregor Ley, Arend Werner, Helmut Barzynski
  • Patent number: 4939012
    Abstract: Naphtholactam dyes of the formula ##STR1## where R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, n, p, Z.sup.1, Z.sup.2 and the rings A, B, C and D each have the meanings stated in the description, and an optical recording medium which contains one or more naphtholactam dyes and may contain a base.
    Type: Grant
    Filed: August 21, 1989
    Date of Patent: July 3, 1990
    Assignee: BASF Aktiengesellschaft
    Inventors: Matthias Dust, Peter Neumann, Ernst Schefczik, Heidi Benthack-Thoms, Helmut Barzynski, Klaus-Dieter Schomann, Harald Kupplemaier, Eberhard Koester
  • Patent number: 4937171
    Abstract: A photosensitive recording material for recording information by means of a local change in the optical properties of a recording layer under the action of light having a high energy density, and a process for its preparation.
    Type: Grant
    Filed: February 24, 1989
    Date of Patent: June 26, 1990
    Assignee: BASF Aktiengesellschaft
    Inventors: Josef Lamprecht, Gregor Ley, Arend Werner, Helmut Barzynski
  • Patent number: 4889756
    Abstract: Laser-optical recording material comprises:(a) an optically transparent and isotropic, homogeneous substrate which is free of orientation birefringence and(b) one or more amorphous, thermally alterable recording layers,wherein the substrate (a)(a.sub.1) has one or two structured surfaces, the structures being in the micrometer and/or submicrometer range, and is formed form a blend of poly-(2,6-dimethylphenylene ether) (PPE) with one or more styrene polymers, the content of PPE in this blend being about 25-45% by weight, based on the blend, and(a.sub.2) that part of the blend which is not PPE contains, based on this part (a.sub.2),(a.sub.21) from 0.1 to 8% by weight of cyanoethylene groups and/or(a.sub.22) from 1 to 60% by weight of 1-methyl-1-phenylethylene groups and/or(a.sub.23) from 1 to 60% by weight of 4'-methylphenylethylene groups and/or(a.sub.24) from 0.01 to 10% by weight of groups of the general formula I ##STR1## where R.sup.1 is hydrogen or methyl and R.sup.2 is C.sub.1 -C.sub.10 -alkyl, C.sub.
    Type: Grant
    Filed: August 12, 1988
    Date of Patent: December 26, 1989
    Assignee: BASF Aktiengesellschaft
    Inventors: Helmut Barzynski, Heidi Benthack-Thomas, Karl-Ruediger Hellwig, Christof Taubitz
  • Patent number: 4876356
    Abstract: Naphtholactam dyes of the formula ##STR1## where R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, n, p, Z.sup.1, Z.sup.2 and the rings A, B, C and D each have the meanings stated in the description, and an optical recording medium which contains one or more naphtholactam dyes and may contain a base.
    Type: Grant
    Filed: March 12, 1987
    Date of Patent: October 24, 1989
    Assignee: BASF Aktiengesellschaft
    Inventors: Matthias Dust, Peter Neumann, Ernst Schefczik, Heidi Benthack-Thoms, Helmut Barzynski, Klaus-Dieter Schomann, Harald Kuppelmaier, Eberhard Koester
  • Patent number: 4830465
    Abstract: Irreversible optical recording media record information through local alteration of the optical properties of a recording layer on exposure to light.
    Type: Grant
    Filed: April 7, 1988
    Date of Patent: May 16, 1989
    Assignee: BASF Aktiengesellschaft
    Inventors: Arend Werner, Hartmut Hibst, Helmut Barzynski
  • Patent number: 4830951
    Abstract: Naphtholactamsquaric acid dyes of the formula ##STR1## where R.sup.1 and R.sup.2 independently of one another are each unsubstituted or substituted C.sub.3 -C.sub.22 -alkyl, in which the alkyl chain may be interrupted by oxygen atoms, or are each unsubstituted or substituted C.sub.1 -C.sub.4 -aralkyl, unsubstituted or substituted C.sub.5 -C.sub.7 -cycloalkyl or unsubsituted or substituted phenyl, and the rings A, B, C and D are unsubstituted or substituted and/or benzofused, and optical recording materials consisting of a base and a layer which is sensitive to laser light and is composed of a thermoplastic or crosslinked polymer and one or more dyes (I).Because of the high light absorption of (I), the recording materials are very sensitive to light from the GaAlAs semiconductor laser. An excellent signal-to-noise ratio is obtained on reading the recordings.
    Type: Grant
    Filed: September 4, 1987
    Date of Patent: May 16, 1989
    Assignee: BASF Aktiengesellschaft
    Inventors: Matthias Dust, Peter Neumann, Peter Hauser, Gerhard Wagenblast, Heidi Benthack-Thoms, Helmut Barzynski, Klaus D. Schomann, Harald Kuppelmaier
  • Patent number: 4806664
    Abstract: Tetraphenyldithiolene complexes of the formula ##STR1## and novel asymmetrically substituted benzoins of the formula ##STR2## where X.sup.1, X.sup.2 and X have the meanings stated in the description and Me is nickel, palladium or platinum. The complexes have very high absorption in the range from 800 to 950 nm and are readily soluble in the plastics used for the production of optical recording materials.The recording materials produced using these complexes have a very high signal/noise ratio.
    Type: Grant
    Filed: June 8, 1987
    Date of Patent: February 21, 1989
    Assignee: BASF Aktiengesellschaft
    Inventors: Wolfgang Schrott, Peter Neumann, Bernhard Albert, Michael Thomas, Helmut Barzynski, Klaus-Dieter Schomann, Harald Kuppelmaier
  • Patent number: 4788562
    Abstract: In an optical recording medium of the reflection type, the light-absorbing layer contains polypyrrole as the light-absorbing substance.
    Type: Grant
    Filed: January 15, 1987
    Date of Patent: November 29, 1988
    Assignee: BASF Aktiengesellschaft
    Inventors: Helmut Barzynski, Herbert Naarmann
  • Patent number: 4665129
    Abstract: Thermoplastic mixtures based on macromolecular compounds and pyrrole polymers contain finely divided pyrrole polymers which are embedded in a matrix of the macromolecular compound. Such mixtures are prepared by a process in which solutions of the macromolecular compounds and compounds from the class consisting of the pyrroles are polymerized with an oxygen-containing oxidizing agent, and the resulting mixture is separated off from the solvent. Moldings obtained from such mixtures are used as electrical conductors or as electrodes.
    Type: Grant
    Filed: March 13, 1985
    Date of Patent: May 12, 1987
    Assignee: BASF Aktiengesellschaft
    Inventors: Herbert Naarmann, Burghard Schmitt, Helmut Barzynski
  • Patent number: 4632897
    Abstract: Photopolymerizable recording materials which are suitable for the production of photoresist layers, and contain one or more thermoplastic vinyl polymers as the binder, one or more low molecular weight, ethylenically unsaturated, photopolymerizable compounds and one or more photoinitiators, with or without other, conventional additives and/or assistants, have excellent adhesion to metallic substrate surfaces if the binder employed is a vinyl polymer which possesses amino and/or imino groups.
    Type: Grant
    Filed: December 27, 1983
    Date of Patent: December 30, 1986
    Assignee: BASF Aktiengesellschaft
    Inventors: Helmut Barzynski, Albrecht Eckell, Albert Elzer, Uwe Klinsmann, Reinhold J. Leyrer, Axel Sanner
  • Patent number: 4576902
    Abstract: A positive working photosensitive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.
    Type: Grant
    Filed: December 4, 1984
    Date of Patent: March 18, 1986
    Inventors: Dietrich Saenger, Helmut Barzynski
  • Patent number: 4555471
    Abstract: A resist film comprises a dimensionally stable base (B), which is transparent to actinic light in the wavelength range from 300 to 420 nm, and a mask-forming layer (ML) which is sensitive to heat radiation and contains a thermochromic system which, when irradiated with an IR laser having a wavelength greater than 1.00 .mu.m, undergoes an irreversible change in its absorption spectrum in the wavelength range from 300 to 420 nm so that the optical density of the mask-forming layer (ML) in this wavelength range changes by not less than 1.3 units. The base of the resist film can also be applied onto the photosensitive relief-forming layer (RL) of a recording material to give a multilayer image-recording material. Imagewise irradiation with heat, for example using an IR laser, produces, in the mask-forming layer (ML) of the resist film, a UV photomask which is very useful for exposing photosensitive recording materials.
    Type: Grant
    Filed: December 4, 1984
    Date of Patent: November 26, 1985
    Assignee: BASF Aktiengesellschaft
    Inventors: Helmut Barzynski, Klaus Holoch
  • Patent number: 4523208
    Abstract: A heat-sensitive recording material comprises a heat-sensitive layer which is applied onto a base and contains a color-producing substance, which is usually colorless or only slightly colored, and an activator which, under the action of heat, causes the color-producing substance to produce a coloration. In accordance with the invention, the heat-sensitive layer contains a sulfonic acid ester, in particular of a secondary alcohol, as the activator.
    Type: Grant
    Filed: November 22, 1983
    Date of Patent: June 11, 1985
    Assignee: BASF Aktiengesellschaft
    Inventor: Helmut Barzynski
  • Patent number: 4515877
    Abstract: A resist film comprises a dimensionally stable base (B), which is transparent to actinic light in the wavelength range from 300 to 420 nm, and a mask-forming layer (ML) which is sensitive to heat radiation and contains a thermochromic system which, when irradiated with an IR laser having a wavelength greater than 1.00 .mu.m, undergoes an irreversible change in its absorption spectrum in the wavelength range from 300 to 420 nm so that the optical density of the mask-forming layer (ML) in this wavelength range changes by not less than 1.3 units. The base of the resist film can also be applied onto the photosensitive relief-forming layer (RL) of a recording material to give a multilayer image-recording material. Imagewise irradiation with heat, for example using an IR laser, produces, in the mask-forming layer (ML) of the resist film, a UV photomask which is very useful for exposing photosensitive recording materials.
    Type: Grant
    Filed: November 22, 1983
    Date of Patent: May 7, 1985
    Assignee: BASF Aktiengesellschaft
    Inventors: Helmut Barzynski, Klaus Holoch
  • Patent number: 4459348
    Abstract: A multi-layer element for the production of printing plates and relief plates which is based on an elastomeric polymer binder and is firmly anchored to a polyester base by means of an adhesive layer. The adhesive layer consists of a thermally hardened mixture which is insoluble in aromatic hydrocarbon solvents or aliphatic halohydrocarbon solvents and contains (c1) from 90 to 40% by weight, based on the sum of (c1) and (c2), of an hydroxyl-containing polyurethane, hydroxyl-containing epoxy, hydroxyl-containing phenoxy resin, polyester-ol or polyether-ol resin which has been hardened and crosslinked with isocyanate, and which has from about 4 to 20% by weight, based on the non-crosslinked and hardenable resin, of free OH groups before hardening and crosslinking with isocyanate, and (c2) from 10 to 60% by weight, based on the sum of (c1) and (c2), of an OH-free polycarbonate which is compatible with the resin (c1) before the latter is hardened and crosslinked.
    Type: Grant
    Filed: May 27, 1983
    Date of Patent: July 10, 1984
    Assignee: BASF Aktiengesellschaft
    Inventors: Mong-Jon Jun, Peter Richter, Helmut Barzynski
  • Patent number: 4424314
    Abstract: Curable coating compositions of olefinically unsaturated compounds A and an N-vinyl compound B. The N-vinyl compounds carry at least 2 N-vinyl groups and at least one carbonyl group bonded to the nitrogen of the N-vinyl group. The coating compositions can be used for the manufacture of paints, printing inks, printing plates and photoresist materials.
    Type: Grant
    Filed: September 24, 1979
    Date of Patent: January 3, 1984
    Assignee: BASF Aktiengesellschaft
    Inventors: Helmut Barzynski, Heinrich Hartmann, Dieter Lautenbach, Rolf Osterloh, Lutz Goethlich, Guenter Heil
  • Patent number: 4239609
    Abstract: Photopolymerizable coating and recording materials, such as photopolymer dry film resist materials and photoresist materials, comprising at least one photopolymerizable olefinic compound, which materials contain, as activated photoinitiator system, a carbonyl compound that, when exposed to actinic light, forms free radicals which initiate polymerization, such as benzophenone and benzophenone derivatives, as well as a benzene compound having at least two dichloromethyl groups bound to the benzene nucleus, such as bis(dichloromethyl)-benzene and 2,5-dichloro-1,4-bis(dichloromethyl)benzene, and preferably also a dye which changes color in the presence of acid. The coating and recording materials of the invention exhibit improved curing when exposed to ultraviolet light for the usual periods and can be readily washed out with solvents without any damage to the exposed areas.
    Type: Grant
    Filed: December 27, 1978
    Date of Patent: December 16, 1980
    Assignee: BASF Aktiengesellschaft
    Inventors: Helmut Barzynski, Dietrich Saenger