Abstract: A polarization system having a first substrate with a first layer system, and at least one second substrate with a second layer system disposed downstream in a beam path from the first substrate formed by a beam source. The first and second layer systems have a first stack on the substrate and a second stack on the first stack; wherein the first stack comprises an alternating sequence of high and low refractive index oxidic layers; the second stack having an alternating sequence of high and low refractive index fluoridic layers. The first layer system splits an unpolarized beam and the second layer system splits the beam again such that the proportion of a polarized beam downstream of the second layer system is greater than that downstream of the first layer system.

Abstract: The invention relates to a polarization system (1) comprising the following features:—a first substrate (3) composed of a first substrate material with a first layer system (3a) applied thereto, and, disposed downstream in a beam path (2) formed by a beam source, at least one second substrate (4) composed of a second substrate material with a second layer system (4a) applied thereto;—wherein the first and second layer systems comprise a first stack (3b, 4b) applied on the substrate and a second stack (3c, 4c) applied on the first stack;—wherein the first stack comprises an alternating sequence of high and low refractive index oxidic layers;—wherein the second stack comprises an alternating sequence of high and low refractive index fluoridic layers;—wherein the first layer system (3a) splits an unpolarized beam (2a), which forms the beam path (2) and impinges on the layer system (3a) at an angle ? that is greater than the Brewster angle for the substrate material used, into a first component (2d), which is for