Abstract: Biochemical substances, such as enzymes, are immobilized using an olefinic-unsaturated, epoxyfunctional polysiloxane. The polysiloxane is applied to a carrier material. The polysiloxane on the carrier is cross-linked by using high-energy radiation or a peroxide to form a polymer matrix. The polymer matrix is treated with an aqueous solution of a biochemical substance that reacts with epoxy groups and becomes immobilized. The polymer matrix is stabilized by the reaction of non-reacted epoxy groups with a compound containing an amino group, a carboxyl group or an amino group and a carboxyl group. The crosslinked polysiloxane can be hydrophilized after cross-linking and prior to immobilization of the biochemical substance by the reaction of a portion of the epoxy groups with a hydrophilic compound.

Abstract: A biosensor is prepared having a selective detection system containing a biochemical substance such as an enzyme immobilized on an olefinic-unsaturated, epoxyfunctional polysiloxane. Prior to immobilization of the biochemical substance, the polysiloxane is applied as a layer to a carrier and cross-linked by treatment with high-energy radiation. A biochemical substance is reacted with epoxy groups of the cross-linked polysiloxane. Any non-reacted epoxy groups are reacted with a compound containing an amino group, a carboxyl group or an amino group and a carboxyl group to stabilize. After cross-linking and before reacting of the biochemical substance, the cross-linked polysiloxane can be hydrophilized by reacting some of the epoxy groups with a hydrophilic compound containing a reactive group.

Abstract: A method for producing smooth uniform polymethylmethacrylate (PMMA) layers having a thickness of greater than 20 .mu.m. The PMMA layers are produced utilizing a solution of polymethylmethacrylate in an ester of lactic acid. The PMMA layers are particularly suited for micro-structuring techniques which utilize high-energy, ionizing radiation. The PMMA layers exhibit a good adhesion to metallic, semi-conducting and insulating substrates.

Abstract: An electron-beam-sensitive resist material is provided that includes film having high-polymers and includes dopings. The material is made into a solution that is added to the substrate so that the resist material can be produced on the semiconductive or piezoelectric substrates by drying. The doping additives of the resist material can include: halogens, halogen compounds, peroxides, kaotropic salts and xanthates. The resist material is used for the production of electron-beam-written microstructures with high structural resolution and, in comparison to the known methods, eliminates the error-affected developing process.

Abstract: A method for the orientation of a liquid crystalline substance with respect to a substrate to which the substance is to be applied, the method comprising treating the surface of the substrate prior to application of the substance with a solution of at least one steroid, or at least one porphyrin dyestuff or both.

Abstract: A method is disclosed of producing electron beam diffraction patterns, in which the object to be examined is one which is liable to be altered substantially by an electron beam when that beam is accelerated by a predetermined voltage to the energy density necessary for the production of an image. The object is irradiated by an electron beam and the electrons of the electron beam, diffracted by the object, are imaged using an integrating image apparatus or an integrating image material, for example a photographic layer. One or more regions of the object corresponding in size to the cross section of the electron beam are irradiated intermittently using an electron beam accelerated by the pre-determined voltage, the electron beam having an electron density which is lower than the electron density at which the object is substantially altered.