Patents by Inventor Helmut Hugel

Helmut Hugel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10899624
    Abstract: A process for the preparation of reduced graphene comprising the steps of: providing an expandable graphite intercalated with oxygen containing groups; heating the expandable graphite under conditions sufficient to cause expansion of the expandable graphite and formation of an expanded graphite comprising oxygen containing groups; and contacting the expanded graphite with carbon monoxide to reduce at least a portion of the oxygen containing groups and form a reduced expanded graphite comprising an array of reduced graphene. The process of the invention enables large volumes of high quality graphene to be produced.
    Type: Grant
    Filed: May 1, 2015
    Date of Patent: January 26, 2021
    Assignee: RMIT UNIVERSITY
    Inventors: Michael Czajka, Robert Shanks, Helmut Hugel
  • Publication number: 20170050854
    Abstract: A process for the preparation of reduced graphene comprising the steps of: providing an expandable graphite intercalated with oxygen containing groups; heating the expandable graphite under conditions sufficient to cause expansion of the expandable graphite and formation of an expanded graphite comprising oxygen containing groups; and contacting the expanded graphite with carbon monoxide to reduce at least a portion of the oxygen containing groups and form a reduced expanded graphite comprising an array of reduced graphene. The process of the invention enables large volumes of high quality graphene to be produced.
    Type: Application
    Filed: May 1, 2015
    Publication date: February 23, 2017
    Applicant: RMIT UNIVERSITY
    Inventors: Michael CZAJKA, Robert SHANKS, Helmut HUGEL
  • Patent number: 6447125
    Abstract: The invention relates to a device for influencing a laser beam by means of an adaptive mirror (12) in the beam path, having a piezoelectric adjusting member (17) arranged on the back of the mirror (12), it being the case that, in order to achieve low-aberration deformation of the mirror (12) for the purpose of influencing the divergence of the beam, there is provided between the adjusting member (17) and the back (24) of the mirror (12) a pressure-transmitting device (19) which acts on a large area of the deformable surface of the mirror (12).
    Type: Grant
    Filed: June 16, 1998
    Date of Patent: September 10, 2002
    Assignee: Trumpf GmbH & Co.
    Inventors: Martin Huonker, Adolf Giesen, Martin Bea, Helmut Hügel
  • Patent number: 4414488
    Abstract: Disclosure is directed to an apparatus for producing a microwave discharge n a supersonic gas flow such that the available microwave energy is deposited in the gas as completely and uniformly as possible through a substantial cross-section of the flow channel. The flow channel is provided within a waveguide and microwave energy is caused to be propagated through the waveguide substantially in the direction of the gas flow. A supersonic nozzle is provided in the channel dividing the channel into an upstream plenum and a downstream low pressure region, and the electric discharge occurs in the low pressure region just beyond the nozzle throat.
    Type: Grant
    Filed: June 26, 1980
    Date of Patent: November 8, 1983
    Assignee: Deutsche Forschungs- und Versuchsanstalt fur Luft-und Raumfahrt e.V.
    Inventors: Peter Hoffmann, Helmut Hugel, Wolfgang Schall, Schock, Wolfram