Abstract: Method for producing a coating comprising at least one PVD coating layer, wherein for the production of the at least one PVD coating layer materials from one or more targets are evaporated by using a PVD technique in a coating chamber comprising oxygen and nitrogen as reactive gases, wherein during deposition of the at least one PVD coating layer a multi-anion HEA-oxynitride structure is formed, which comprises a cation lattice formed of five or more elements and an anion lattice formed of two or more elements, wherein if only two elements are present in the anion lattice, they are oxygen and nitrogen.

Abstract: The invention relates to a HiPIMS method by means of which homogeneous layers can be deposited over the height of a coating chamber. Two partial cathodes are used for said purpose. According to the invention, the length of the individual power pulse intervals applied to the partial cathodes is chosen individually and thus a required coating thickness profile over the height of the coating chamber is achieved.

Abstract: Component surfaces are coated with thermally stable layers. In particular infrared mirror surfaces or surfaces of combustion chambers are coated with at least one layer consisting of thermally stable Al—Cr—O in such a manner that the absorption, reflection or transmission of infrared radiations (hereinafter also called thermal radiations) is influenced.

Abstract: The present disclosure relates to a coated substrate with a coating deposited on at least a part of the substrate surface, said coating comprising at least one metal boron carbide layer, characterized in that the metal boron carbide layer is a ternary compound exhibiting a polycrystalline structure formed of a single phase of hafnium, boron and carbon. Further a method for deposition of such a coating is provided.

Abstract: The present disclosure relates to a coated substrate with a coating deposited on at least a part of the substrate surface, said coating comprising at least one metal boron carbide layer, characterized in that the metal boron carbide layer is a ternary compound exhibiting a polycrystalline structure formed of a single phase of HfuBvCw, wherein u+v+w=100 and 35>v>0 at. % and 35>w>0 and u?60 at. %. Further a method for deposition of such a coating is provided. Said coating comprising at least one metal boron carbide layer, characterized in that the metal boron carbide layer is a ternary compound exhibiting a polycrystalline structure formed of a single phase of hafnium, boron and carbon.

Abstract: Component surfaces are coated with thermally stable layers. In particular infrared mirror surfaces or surfaces of combustion chambers are coated with at least one layer consisting of thermally stable Al—Cr—O in such a manner that the absorption, reflection or transmission of infrared radiations (hereinafter also called thermal radiations) is influenced.

Abstract: The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.

Abstract: The invention relates to a PVD process for coating a substrate with a layer containing at least one microcrystalline metallic borocarbide phase. During the PVD process, the source output is pulsed such that the at least one peak of which the half intensity width allows conclusions to be drawn about the presence of a microcrystalline phase of the metallic borocarbide layer can be identified in the x-ray spectrum of a layer produced in this way at a substrate temperature below 600° C.

Abstract: The invention pertains to a method for the production of coatings by physical vapor deposition (PVD), wherein a binary target or a target with more than two constituents is evaporated in a curvilinear cathodic arc discharge, causing the ions with different masses (elements) to be splitted and the ion splitting results in variations for the ratio of the different masses (elements) at different positions in the deposition chamber.

Abstract: The invention relates to a PVD process for coating a substrate with a layer containing at least one microcrystalline metallic borocarbide phase. During the PVD process, the source output is pulsed such that the at least one peak of which the half intensity width allows conclusions to be drawn about the presence of a microcrystalline phase of the metallic borocarbide layer can be identified in the x-ray spectrum of a layer produced in this way at a substrate temperature below 600° C.

Abstract: The invention relates to a HiPIMS method by means of which homogeneous layers can be deposited over the height of a coating chamber. Two partial cathodes are used for said purpose. According to the invention, the length of the individual power pulse intervals applied to the partial cathodes is chosen individually and thus a required coating thickness profile over the height of the coating chamber is achieved.

Abstract: The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.

Abstract: The invention pertains to a method for the production of coatings by physical vapor deposition (PVD), wherein a binary target or a target with more than two constituents is evaporated in a curvilinear cathodic arc discharge, causing the ions with different masses (elements) to be splitted and the ion splitting results in variations for the ratio of the different masses (elements) at different positions in the deposition chamber.

Abstract: The invention relates to a method for surface treatment of work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source; by means of the first electrode, an arc is operated with an arc current and vaporizes material from the target that is deposited at least partially and intermittently onto the work pieces and having a second electrode that is embodied as a work piece holder and, together with the work pieces, constitutes a bias electrode; by means of a voltage supply, a bias voltage is applied to the bias electrode, with the bias voltage applied so that it is matched to the arc current such that essentially, no net material buildup on the surface occurs.

Abstract: An optical waveguide has a substrate with a surface of organic material, an inorganic material waveguide layer along the surface of organic material with a waveguide layer surface pointing toward the surface of organic material and an organic/inorganic material interface between the surface of organic material and the waveguide layer surface. The organic/inorganic interface is remote from the waveguide layer surface and is formed by the surface of organic material and a surface of an intermediate spacer system of inorganic material. The spacer system substantially preventing the material interface from being subjected to light energy of light guided in the waveguide layer.

Abstract: A switch for the optical switching of a light path, particularly for switching the entering of light into a fiber-optical light guide is provided. The switch dial has at least one mirror surface for reflecting the light and, for establishing the mirror surface, a support is equipped with a reflective layer, which support is constructed as a glass body.

Abstract: A method of manufacturing an object in a vacuum treatment apparatus having a vacuum recipient for containing an atmosphere, includes the steps of supporting a substrate on a work piece carrier arrangement in the recipient and treating the substrate to manufacture the object in the vacuum recipient. The treating process includes generating electrical charge carriers in the atmosphere and in the recipient which are of the type that form electrically insulating material and providing at least two electroconductive surfaces in the recipient. Power, such as a DC signal, is supplied to at least one of the electroconductive surfaces so that at least one of the electroconductive surfaces receives the electrically insulating material for covering at least part of that electroconductive surface. This causes electrical isolation of that electroconductive surface which leads to arcing and damage to the object.

Abstract: An optical waveguide has a substrate with a surface of organic material, an inorganic material waveguide layer along the surface of organic material with a waveguide layer surface pointing toward the surface of organic material and an organic/inorganic material interface between the surface of organic material and the waveguide layer surface. The organic/inorganic interface is remote from the waveguide layer surface and is formed by the surface of organic material and a surface of an intermediate spacer system of inorganic material. The spacer system substantially preventing the material interface from being subjected to light energy of light guided in the waveguide layer.

Abstract: A method for manufacturing an optical waveguide includes shaping a substrate of organic material, applying at least one intermediate layer by a first vacuum coating process onto the substrate and applying a waveguide layer by means of a second vacuum coated process onto the intermediate layer. The at least one intermediate layer is applied so that only a negligible part of light energy reaches an interface surface between the intermediate layer and the substrate.

Abstract: Proposed is a waveguide which is formed on a substrate (2) of a polymer. For that purpose, provided between the substrate (2) and the waveguide layer (1) is an intermediate layer (8) of an inorganic material which prevents a substantial amount of energy from penetrating into the relatively highly absorbent polymer material. That minimises the waveguide losses.