Patents by Inventor Hematha K. Wickramasinghe

Hematha K. Wickramasinghe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pneumatic method and apparatus for nano imprint lithography having a conforming mask
    Patent number: 8721952
    Abstract: A method (and apparatus) for nano lithography, includes applying a pneumatic pressure to at least one of a surface of a semi-rigid mask or template and a portion of a surface of a resist-coated workpiece, and, by the applying of the pneumatic pressure, transferring a pattern from the mask to the workpiece.
    Type: Grant
    Filed: November 16, 2004
    Date of Patent: May 13, 2014
    Assignee: International Business Machines Corporation
    Inventors: Matthew E. Colburn, Yves C. Martin, Theodore G. van Kessel, Hematha K. Wickramasinghe
  • PNEUMATIC METHOD AND APPARATUS FOR NANO IMPRINT LITHOGRAPHY HAVING A CONFORMING MASK
    Publication number: 20120321740
    Abstract: An apparatus for nano lithography includes a mask having a pattern formed thereon and a pneumatic pressure driving source for applying a pneumatic pressure to at least one of a surface of the mask and a surface of a workpiece, thereby to uniformly transfer the pattern from the mask to the workpiece.
    Type: Application
    Filed: August 30, 2012
    Publication date: December 20, 2012
    Applicant: International Business Machines Corporation
    Inventors: Matthew E. Colburn, Yves C. Martin, Theodore G. van Kessel, Hematha K. Wickramasinghe
  • Method and apparatus for direct referencing of top surface of workpiece during imprint lithography
    Patent number: 7883832
    Abstract: An apparatus (and method) for referencing a surface of a workpiece during imprint lithography, includes an air bearing for mechanically referencing a surface of the workpiece, and a lithographic template coupled to the air bearing.
    Type: Grant
    Filed: January 4, 2005
    Date of Patent: February 8, 2011
    Assignee: International Business Machines Corporation
    Inventors: Matthew E. Colburn, Yves C. Martin, Theodore G. van Kessel, Hematha K. Wickramasinghe
  • Cut-and-paste imprint lithographic mold and method therefor
    Patent number: 7776709
    Abstract: A method (and apparatus) of replicating a pattern on a structure, includes using imprint lithography to replicate a pattern formed on a first structure onto a portion of a second structure.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: August 17, 2010
    Assignee: International Business Machines Corporation
    Inventors: Matthew E. Colburn, Yves C. Martin, Theodore G. van Kessel, Hematha K. Wickramasinghe
  • IMPRINT REFERENCE TEMPLATE FOR MULTILAYER OR MULTIPATTERN REGISTRATION AND METHOD THEREFOR
    Publication number: 20080180646
    Abstract: A method (and resultant structure) of forming a plurality of masks, includes creating a reference template, using imprint lithography to print at least one reference template alignment mark on all of a plurality of mask blanks for a given chip set, and printing sub-patterns on each of the plurality of mask blanks, and aligning the sub-patterns to the at least one reference template alignment mark.
    Type: Application
    Filed: April 3, 2008
    Publication date: July 31, 2008
    Applicant: International Business Machines Corporation
    Inventors: Matthew E. Colburn, Yves C. Martin, Charles T. Rettner, Theodore G. van Kessel, Hematha K. Wickramasinghe
  • CUT-AND-PASTE IMPRINT LITHOGRAPHIC MOLD AND METHOD THEREFOR
    Publication number: 20080116602
    Abstract: A method (and apparatus) of replicating a pattern on a structure, includes using imprint lithography to replicate a pattern formed on a first structure onto a portion of a second structure.
    Type: Application
    Filed: October 26, 2007
    Publication date: May 22, 2008
    Applicant: International Business Machines Corporation
    Inventors: Matthew E. Colburn, Yves C. Martin, Theodore G. van Kessel, Hematha K. Wickramasinghe
  • Cut-and-paste imprint lithographic mold and method therefor
    Patent number: 7344955
    Abstract: A method (and apparatus) of replicating a pattern on a structure, includes using imprint lithography to replicate a pattern formed on a first structure onto a portion of a second structure.
    Type: Grant
    Filed: November 19, 2004
    Date of Patent: March 18, 2008
    Assignee: International Business Machines Corporation
    Inventors: Matthew E. Colburn, Yves C. Martin, Theodore G. van Kessel, Hematha K. Wickramasinghe
  • Method and apparatus for optical film measurements in a controlled environment
    Patent number: 7130038
    Abstract: An optical probe (and method) for measuring a surface in an environment containing a first substance, includes a light source for transmitting a light onto an area of the surface to obtain a measurement, a source of the first substance including one of a fluid and a gas for displacing a second substance from an area of the surface receiving the light, and a measuring device for receiving the light being reflected from the surface and for determining a measurement of the surface based upon the reflected light.
    Type: Grant
    Filed: September 1, 2005
    Date of Patent: October 31, 2006
    Assignee: International Business Machines Corporation
    Inventors: Richard J. Lebel, Fredrik Maurer, Paul H. Smith, Jr., Theodore G. Van Kessel, Hematha K. Wickramasinghe
  • Cut-and-paste imprint lithographic mold and method therefor
    Publication number: 20060110890
    Abstract: A method (and apparatus) of replicating a pattern on a structure, includes using imprint lithography to replicate a pattern formed on a first structure onto a portion of a second structure.
    Type: Application
    Filed: November 19, 2004
    Publication date: May 25, 2006
    Applicant: International Business Machines Corporation
    Inventors: Matthew Colburn, Yves Martin, Theodore van Kessel, Hematha K. Wickramasinghe
  • Method and apparatus for optical film measurements in a controlled environment
    Patent number: 6967715
    Abstract: An optical probe (and method) for measuring a surface in an environment containing a first substance, includes a light source for transmitting a light onto an area of the surface to obtain a measurement, a source of the first substance including one of a fluid and a gas for displacing a second substance from an area of the surface receiving the light, and a measuring device for receiving the light being reflected from the surface and for determining a measurement of the surface based upon the reflected light.
    Type: Grant
    Filed: December 6, 2002
    Date of Patent: November 22, 2005
    Assignee: International Business Machines Corporation
    Inventors: Richard J. Lebel, Fredrik Maurer, Paul H. Smith, Jr., Theodore G. Van Kessel, Hematha K. Wickramasinghe
  • Method and apparatus for optical film measurements in a controlled environment
    Publication number: 20040109174
    Abstract: An optical probe (and method) for measuring a surface in an environment containing a first substance, includes a light source for transmitting a light onto an area of the surface to obtain a measurement, a source of the first substance including one of a fluid and a gas for displacing a second substance from an area of the surface receiving the light, and a measuring device for receiving the light being reflected from the surface and for determining a measurement of the surface based upon the reflected light.
    Type: Application
    Filed: December 6, 2002
    Publication date: June 10, 2004
    Applicant: International Business Machines Corporation
    Inventors: Richard J. Lebel, Fredrik Maurer, Paul H. Smith, Theodore G. Van Kessel, Hematha K. Wickramasinghe