Patents by Inventor Hematha Wickramasinghe

Hematha Wickramasinghe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Imprint reference template for multilayer or multipattern registration and method therefor
    Publication number: 20060157898
    Abstract: A method (and resultant structure) of forming a plurality of masks, includes creating a reference template, using imprint lithography to print at least one reference template alignment mark on all of a plurality of mask blanks for a given chip set, and printing sub-patterns on each of the plurality of mask blanks, and aligning the sub-patterns to the at least one reference template alignment mark.
    Type: Application
    Filed: January 18, 2005
    Publication date: July 20, 2006
    Applicant: International Business Machines Corporation
    Inventors: Matthew Colburn, Yves Martin, Charles Rettner, Theodore van Kessel, Hematha Wickramasinghe
  • Phase contrast alignment method and apparatus for nano imprint lithography
    Publication number: 20060147820
    Abstract: An apparatus (and method) for forming a pattern on a workpiece, includes an optical phase contrast image sensor, and an imprint lithography system coupled to the optical phase contrast image sensor for laterally aligning an imprint template feature relative to the workpiece.
    Type: Application
    Filed: January 4, 2005
    Publication date: July 6, 2006
    Applicant: International Business Machines Corporation
    Inventors: Matthew Colburn, Yves Martin, Theodore van Kessel, Hematha Wickramasinghe
  • Method and apparatus for direct referencing of top surface of workpiece during imprint lithography
    Publication number: 20060145400
    Abstract: An apparatus (and method) for referencing a surface of a workpiece during imprint lithography, includes an air bearing for mechanically referencing a surface of the workpiece, and a lithographic template coupled to the air bearing.
    Type: Application
    Filed: January 4, 2005
    Publication date: July 6, 2006
    Applicant: International Business Machines Corporation
    Inventors: Matthew Colburn, Yves Martin, Theodore van Kessel, Hematha Wickramasinghe
  • Pneumatic method and apparatus for nano imprint lithography
    Publication number: 20060105571
    Abstract: A method (and apparatus) for nano lithography, includes applying a pneumatic pressure to at least one of a surface of a semi-rigid mask or template and a portion of a surface of a resist-coated workpiece, and, by the applying of the pneumatic pressure, transferring a pattern from the mask to the workpiece.
    Type: Application
    Filed: November 16, 2004
    Publication date: May 18, 2006
    Applicant: International Business Machines Corporation
    Inventors: Matthew Colburn, Yves Martin, Theodore van Kessel, Hematha Wickramasinghe
  • Method and apparatus for optical film measurements in a controlled environment
    Publication number: 20050286056
    Abstract: An optical probe (and method) for measuring a surface in an environment containing a first substance, includes a light source for transmitting a light onto an area of the surface to obtain a measurement, a source of the first substance including one of a fluid and a gas for displacing a second substance from an area of the surface receiving the light, and a measuring device for receiving the light being reflected from the surface and for determining a measurement of the surface based upon the reflected light.
    Type: Application
    Filed: September 1, 2005
    Publication date: December 29, 2005
    Applicant: International Business Machines Corporation
    Inventors: Richard Lebel, Fredrik Maurer, Paul Smith, Theodore Van Kessel, Hematha Wickramasinghe