Patents by Inventor Hendrik Jan DE JONG

Hendrik Jan DE JONG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10078274
    Abstract: The invention relates to a substrate handling and exposure arrangement comprising a plurality of lithography apparatus, a clamp preparation unit for clamping a wafer on a wafer support structure, a wafer track, wherein the clamp preparation unit is configured for accepting a wafer from the wafer track, and an additional wafer track for transferring the clamp towards the plurality of lithography apparatus.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: September 18, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Hendrik Jan De Jong, Marco Jan-Jaco Wieland
  • Patent number: 9922801
    Abstract: The invention relates to a drying apparatus for use in a lithography system for drying at least part of a surface on a first side of a planar target, such as a wafer. The apparatus has a drying device for eliminating liquid or droplets thereof from the first side of the planar target. The drying device has a first slit and a second slit arranged in close proximity of the target. A gap is present between the target and the drying device. Pressurized gas may be supplied via the first slit into the gap. The liquid may be discharged from the target by means of the pressurized gas through the second slit. The first and the second slit are configured to enable the pressurized gas to flow along the first side of the planar target substantially parallel to the planar target.
    Type: Grant
    Filed: August 20, 2014
    Date of Patent: March 20, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Hendrik Jan de Jong
  • Patent number: 9575418
    Abstract: An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.
    Type: Grant
    Filed: September 11, 2015
    Date of Patent: February 21, 2017
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Vincent Sylvester Kuiper, Erwin Slot, Marcel Nicolaas Jacobus Van Kervinck, Guido De Boer, Hendrik Jan De Jong
  • Publication number: 20160370704
    Abstract: The invention relates to a substrate handling and exposure arrangement comprising a plurality of lithography apparatus, a clamp preparation unit for clamping a wafer on a wafer support structure, a wafer track, wherein the clamp preparation unit is configured for accepting a wafer from the wafer track, and an additional wafer track for transferring the clamp towards the plurality of lithography apparatus.
    Type: Application
    Filed: August 30, 2016
    Publication date: December 22, 2016
    Inventors: Hendrik Jan DE JONG, Marco Jan-Jaco WIELAND
  • Patent number: 9460954
    Abstract: The invention relates to a method of clamping a substrate on a surface of a substrate support structure. First, a liquid is applied on a surface of the substrate support structure. The surface is provided with a plurality of contact elements. The liquid is applied such that the contact elements are fully covered by a liquid layer. Then the substrate is provided and placed onto the liquid layer. Finally, liquid underneath the substrate is removed such that the substrate rests on the plurality of contact elements and is clamped by means of a capillary clamping force exerted by a capillary layer of the liquid between the substrate and the surface of the substrate support structure.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: October 4, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Hendrik Jan De Jong, Marco Jan-Jaco Wieland
  • Publication number: 20160004173
    Abstract: An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.
    Type: Application
    Filed: September 11, 2015
    Publication date: January 7, 2016
    Inventors: Vincent Sylvester KUIPER, Erwin SLOT, Marcel Nicolaas Jacobus VAN KERVINCK, Guido DE BOER, Hendrik Jan DE JONG
  • Patent number: 9176397
    Abstract: An apparatus for transferring substrates within a lithography system, the lithography system comprising a substrate preparation unit for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system for receiving unclamped substrates. The apparatus comprises a body provided with a first set of fingers for carrying an unclamped substrate and a second set of fingers for carrying a substrate support structure, and the first set of fingers is located below the second set of fingers, and fingers of the first set of fingers have a different shape than the fingers of the second set of fingers.
    Type: Grant
    Filed: April 30, 2012
    Date of Patent: November 3, 2015
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Vincent Sylvester Kuiper, Erwin Slot, Marcel Nicolaas Jacobus Van Kervinck, Guido De Boer, Hendrik Jan De Jong
  • Patent number: 9117631
    Abstract: Method of handling a substrate support structure for clamping a substrate on a surface thereof in a lithography system. First, a substrate support structure adapted to absorb energy from a substrate clamped thereon and a substrate are provided. The substrate is clamped on a surface of the substrate support structure. The substrate support structure with the substrate clamped thereon is transferred to a lithography apparatus, in which a lithographic process is performed on the substrate clamped onto the substrate support structure. The substrate support structure with the substrate clamped thereon is then removed from the lithography system. The substrate is removed from the substrate support structure, and the substrate support structure is conditioned by removing energy stored in the substrate support structure before providing a new substrate onto the substrate support structure.
    Type: Grant
    Filed: April 11, 2013
    Date of Patent: August 25, 2015
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Hendrik Jan De Jong
  • Patent number: 8991330
    Abstract: A substrate support structure for clamping a substrate by means of a capillary force created by a liquid clamping layer having a lower pressure than its surroundings. The substrate support structure comprises a surface provided with a plurality of substrate supporting elements for holding the substrate, and the surface further comprises portions with different capillary potential for inducing, during clamping, a predetermined capillary flow within the liquid clamping layer.
    Type: Grant
    Filed: February 22, 2010
    Date of Patent: March 31, 2015
    Assignee: Mapper Lithography IP B.V.
    Inventor: Hendrik Jan De Jong
  • Publication number: 20150052776
    Abstract: The invention relates to a drying apparatus for use in a lithography system for drying at least part of a surface on a first side of a planar target, such as a wafer. The apparatus has a drying device for eliminating liquid or droplets thereof from the first side of the planar target. The drying device has a first slit and a second slit arranged in close proximity of the target. A gap is present between the target and the drying device. Pressurized gas may be supplied via the first slit into the gap. The liquid may be discharged from the target by means of the pressurized gas through the second slit. The first and the second slit are configured to enable the pressurized gas to flow along the first side of the planar target substantially parallel to the planar target.
    Type: Application
    Filed: August 20, 2014
    Publication date: February 26, 2015
    Inventor: Hendrik Jan de Jong
  • Patent number: 8936994
    Abstract: A method of processing substrates in a lithography system unit, the lithography system unit comprising at least two substrate preparation units, a load lock unit comprising at least first and second substrate positions, and a substrate handling robot for transferring substrates between the substrate preparation units and the load lock unit. The method comprises providing a sequence of substrates to be exposed to the robot, including an Nth substrate, an N?1th substrate, and an N+1th substrate; transferring the Nth substrate to a first one of the substrate preparation units; clamping the Nth substrate on a first substrate support structure in the first substrate preparation unit to form a clamped Nth substrate; transferring the clamped Nth substrate from the first substrate preparation unit to an unoccupied one of the first and second positions in the load lock unit; and exposing the clamped Nth substrate in the lithography system unit.
    Type: Grant
    Filed: April 30, 2012
    Date of Patent: January 20, 2015
    Assignee: Mapper Lithography IP B.V.
    Inventors: Vincent Sylvester Kuiper, Erwin Slot, Marcel Nicolaas Jacobus Van Kervinck, Guido De Boer, Hendrik Jan De Jong
  • Patent number: 8895943
    Abstract: The invention relates to a lithography system comprising a plurality of lithography system units. Each lithography system unit comprises a lithography apparatus arranged in a vacuum chamber for patterning a substrate; a load lock system for transferring substrates into and out of the vacuum chamber; and a door for enabling entry into the vacuum chamber for servicing purposes. The load lock system and the door of each lithography system unit are provided at the same side and face a free area at a side of the lithography system, in particular the service area.
    Type: Grant
    Filed: December 13, 2011
    Date of Patent: November 25, 2014
    Assignee: Mapper Lithography IP B.V.
    Inventors: Guido De Boer, Hendrik Jan De Jong, Vincent Sylvester Kuiper, Erwin Slot
  • Patent number: 8558196
    Abstract: A charged particle lithography system for pattern transfer onto a target surface, comprising a beam generator for generating a plurality of beamlets, and a plurality of aperture array elements comprising a first aperture array, a blanker array, a beam stop array, and a projection lens array. Each aperture array element comprises a plurality of apertures arranged in a plurality of groups, wherein the aperture groups of each aperture array element form beam areas distinct and separate from non-beam areas formed between the beam areas and containing no apertures for beamlet passage. The beam areas are aligned to form beam shafts, each comprising a plurality of beamlets, and the non-beam areas are aligned to form non-beam shafts not having beamlets present therein. The first aperture array element is provided with cooling channels in the non-beam areas for transmission of a cooling medium for cooling the array element.
    Type: Grant
    Filed: November 14, 2011
    Date of Patent: October 15, 2013
    Assignee: Mapper Lithography IP B.V.
    Inventors: Marco Jan-Jaco Wieland, Alexander Hendrik Vincent Van Veen, Hendrik Jan De Jong
  • Publication number: 20130234040
    Abstract: Method of handling a substrate support structure for clamping a substrate on a surface thereof in a lithography system. First, a substrate support structure adapted to absorb energy from a substrate clamped thereon and a substrate are provided. The substrate is clamped on a surface of the substrate support structure. The substrate support structure with the substrate clamped thereon is transferred to a lithography apparatus, in which a lithographic process is performed on the substrate clamped onto the substrate support structure. The substrate support structure with the substrate clamped thereon is then removed from the lithography system. The substrate is removed from the substrate support structure, and the substrate support structure is conditioned by removing energy stored in the substrate support structure before providing a new substrate onto the substrate support structure.
    Type: Application
    Filed: April 11, 2013
    Publication date: September 12, 2013
    Inventor: Hendrik Jan DE JONG
  • Patent number: 8514370
    Abstract: A substrate support structure for clamping a substrate on a surface by means of a capillary layer of a liquid. The surface has an outer edge and includes one or more substrate supporting elements for receiving the substrate to be clamped, wherein the one or more substrate supporting elements are arranged to provide support for the substrate at a plurality of support locations. The substrate support structure further includes a sealing structure circumscribing the surface and having a top surface or edge forming a sealing rim. A distance between the outer edge of the surface and an outermost of the support locations is greater than a distance between the outer edge and the sealing rim.
    Type: Grant
    Filed: February 18, 2011
    Date of Patent: August 20, 2013
    Assignee: Mapper Lithography IP B.V.
    Inventor: Hendrik Jan De Jong
  • Patent number: 8436324
    Abstract: A charged particle lithography system comprising a preparation unit. The preparation unit comprises a housing having a first load port for loading and/or unloading a substrate into or out of the housing, a substrate transfer unit for locating the substrate onto a substrate support structure within the housing, and a second load port for loading and/or unloading the substrate support structure supporting the substrate.
    Type: Grant
    Filed: February 22, 2010
    Date of Patent: May 7, 2013
    Assignee: Mapper Lithography IP B.V.
    Inventor: Hendrik Jan De Jong
  • Publication number: 20130044305
    Abstract: An apparatus for transferring substrates within a lithography system, the lithography system comprising a substrate preparation unit for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system for receiving unclamped substrates. The apparatus comprises a body provided with a first set of fingers for carrying an unclamped substrate and a second set of fingers for carrying a substrate support structure, and the first set of fingers is located below the second set of fingers, and fingers of the first set of fingers have a different shape than the fingers of the second set of fingers.
    Type: Application
    Filed: April 30, 2012
    Publication date: February 21, 2013
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Vincent Sylvester KUIPER, Erwin SLOT, Marcel Nicolaas Jacobus VAN KERVINCK, Guido DE BOER, Hendrik Jan DE JONG
  • Publication number: 20130034421
    Abstract: A method of processing substrates in a lithography system unit, the lithography system unit comprising at least two substrate preparation units, a load lock unit comprising at least first and second substrate positions, and a substrate handling robot for transferring substrates between the substrate preparation units and the load lock unit. The method comprises providing a sequence of substrates to be exposed to the robot, including an Nth substrate, an N?1th substrate, and an N+1th substrate; transferring the Nth substrate to a first one of the substrate preparation units; clamping the Nth substrate on a first substrate support structure in the first substrate preparation unit to form a clamped Nth substrate; transferring the clamped Nth substrate from the first substrate preparation unit to an unoccupied one of the first and second positions in the load lock unit; and exposing the clamped Nth substrate in the lithography system unit.
    Type: Application
    Filed: April 30, 2012
    Publication date: February 7, 2013
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Vincent Sylvester KUIPER, Erwin SLOT, Marcel Nicolaas Jacobus VAN KERVINCK, Guido DE BOER, Hendrik Jan DE JONG
  • Publication number: 20120292524
    Abstract: A charged particle lithography system for pattern transfer onto a target surface, comprising a beam generator for generating a plurality of beamlets, and a plurality of aperture array elements comprising a first aperture array, a blanker array, a beam stop array, and a projection lens array. Each aperture array element comprises a plurality of apertures arranged in a plurality of groups, wherein the aperture groups of each aperture array element form beam areas distinct and separate from non-beam areas formed between the beam areas and containing no apertures for beamlet passage. The beam areas are aligned to form beam shafts, each comprising a plurality of beamlets, and the non-beam areas are aligned to form non-beam shafts not having beamlets present therein. The first aperture array element is provided with cooling channels in the non-beam areas for transmission of a cooling medium for cooling the array element.
    Type: Application
    Filed: November 14, 2011
    Publication date: November 22, 2012
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Marco Jan-Jaco WIELAND, Alexander Hendrik Vincent VAN VEEN, Hendrik Jan DE JONG
  • Publication number: 20120175527
    Abstract: The invention relates to a lithography system comprising a plurality of lithography system units. Each lithography system unit comprises a lithography apparatus arranged in a vacuum chamber for patterning a substrate; a load lock system for transferring substrates into and out of the vacuum chamber; and a door for enabling entry into the vacuum chamber for servicing purposes. The load lock system and the door of each lithography system unit are provided at the same side and face a free area at a side of the lithography system, in particular the service area.
    Type: Application
    Filed: December 13, 2011
    Publication date: July 12, 2012
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Guido DE BOER, Hendrik Jan DE JONG, Vincent Sylvester KUIPER, Erwin SLOT