Patents by Inventor Hendrik Steigerwald

Hendrik Steigerwald has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for repairing defects of a photolithographic mask for the EUV range
    Patent number: 11774848
    Abstract: The invention relates to a method and an apparatus for repairing at least one defect of a photolithographic mask for the extreme ultraviolet (EUV) wavelength range, wherein the method includes the steps of: (a) determining the at least one defect; and (b) ascertaining a repair shape for the at least one defect; (c) wherein the repair shape is diffraction-based in order to take account of a phase disturbance by the at least one defect.
    Type: Grant
    Filed: June 28, 2021
    Date of Patent: October 3, 2023
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hendrik Steigerwald, Renzo Capelli
  • METHOD AND APPARATUS FOR REPAIRING DEFECTS OF A PHOTOLITHOGRAPHIC MASK FOR THE EUV RANGE
    Publication number: 20210325775
    Abstract: The invention relates to a method and an apparatus for repairing at least one defect of a photolithographic mask for the extreme ultraviolet (EUV) wavelength range, wherein the method includes the steps of: (a) determining the at least one defect; and (b) ascertaining a repair shape for the at least one defect; (c) wherein the repair shape is diffraction-based in order to take account of a phase disturbance by the at least one defect.
    Type: Application
    Filed: June 28, 2021
    Publication date: October 21, 2021
    Inventors: Hendrik Steigerwald, Renzo Capelli
  • Method and apparatus for repairing defects of a photolithographic mask for the EUV range
    Patent number: 11079673
    Abstract: The invention relates to a method and an apparatus for repairing at least one defect of a photolithographic mask for the extreme ultraviolet (EUV) wavelength range, wherein the method includes the steps of: (a) determining the at least one defect; and (b) ascertaining a repair shape for the at least one defect; (c) wherein the repair shape is diffraction-based in order to take account of a phase disturbance by the at least one defect.
    Type: Grant
    Filed: March 30, 2018
    Date of Patent: August 3, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hendrik Steigerwald, Renzo Capelli
  • METHOD AND APPARATUS FOR REPAIRING DEFECTS OF A PHOTOLITHOGRAPHIC MASK FOR THE EUV RANGE
    Publication number: 20180284600
    Abstract: The invention relates to a method and an apparatus for repairing at least one defect of a photolithographic mask for the extreme ultraviolet (EUV) wavelength range, wherein the method includes the steps of: (a) determining the at least one defect; and (b) ascertaining a repair shape for the at least one defect; (c) wherein the repair shape is diffraction-based in order to take account of a phase disturbance by the at least one defect.
    Type: Application
    Filed: March 30, 2018
    Publication date: October 4, 2018
    Inventors: Hendrik Steigerwald, Renzo Capelli