Patents by Inventor Hendrikus Gijsbertus Schimmel
Hendrikus Gijsbertus Schimmel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140375974Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma-forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.Type: ApplicationFiled: January 10, 2013Publication date: December 25, 2014Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
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Patent number: 8901521Abstract: A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.Type: GrantFiled: August 25, 2008Date of Patent: December 2, 2014Assignee: ASML Netherlands B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Patent number: 8749756Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: GrantFiled: January 30, 2012Date of Patent: June 10, 2014Assignee: ASML Netherlands B.V.Inventors: Yuri Johannes Gabrial Van De Vijver, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski, Tjarko Adriaan Rudolf Van Empel
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Patent number: 8711325Abstract: The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.Type: GrantFiled: November 6, 2008Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Tjarko Adriaan Rudolf Van Empel, Hans Johannes Maria Freriks, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Marc Antonius Maria Haast, Wendelin Johanna Maria Versteeg, Peter Gerardus Jonkers, Dzmitry Labetski
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Publication number: 20130077070Abstract: A radiation source comprises a reservoir, a nozzle, a laser, and a positive lens. The reservoir is configured to retain a volume of fuel. The nozzle, in fluid connection with the reservoir, is configured to direct a stream of fuel along a trajectory towards a plasma formation location. The laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma. The positive lens arrangement configured to focus an at least potential spread of trajectories of the stream of fuel toward the plasma formation location, the lens comprising an electric field generating element and/or a magnetic field generating element.Type: ApplicationFiled: August 29, 2012Publication date: March 28, 2013Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus SCHIMMEL, Johan Frederik Dijksman, Dzmitry Labetski
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Patent number: 8319200Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a laser constructed and arranged to generate a beam of radiation directed to a plasma generation site where a plasma is generated when the beam of radiation interacts with a fuel, an optical component having a surface that is arranged and positioned to be hit by a droplet of fuel, and a temperature conditioner constructed and arranged to elevate the temperature of the surface.Type: GrantFiled: August 13, 2009Date of Patent: November 27, 2012Assignee: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Karel Joop Bosschaart
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Patent number: 8278636Abstract: A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.Type: GrantFiled: August 13, 2009Date of Patent: October 2, 2012Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Hendrikus Gijsbertus Schimmel
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Patent number: 8232537Abstract: A radiation source for generation of extreme ultraviolet radiation or use in high resolution lithography includes a plasma formation site where fuel is contacted by a radiation beam to form a plasma generating EUV radiation. A mirrored collector collects and reflects the EUV radiation generated at a first focus towards a second focus. A contamination barrier is positioned such the periphery of the contamination barrier does not occlude more than 50% of the solid angle subtended by the mirror at the second focus, such that EUV radiation reflected by the collector mirror is not excessively attenuated by passing through the contamination barrier. The contamination barrier serves to trap fuel material such as ions, atoms, molecules or nanodroplets from the plasma to prevent their deposition onto the collector mirror where they reduce the mirror's effective lifetime.Type: GrantFiled: August 13, 2009Date of Patent: July 31, 2012Assignee: ASML Netherlands, B.V.Inventors: Hendrikus Gijsbertus Schimmel, Vadim Yevgenyevich Banine, Erik Roelof Loopstra
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Publication number: 20120147348Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: ApplicationFiled: January 30, 2012Publication date: June 14, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Yuri Johannes Gabriel VAN DE VIJVER, Tjarko Adriaan Rudolf VAN EMPEL, Jan Bernard Plechelmus VAN SCHOOT, Gerardus Hubertus Petrus Maria SWINKELS, Hendrikus Gijsbertus SCHIMMEL, Dzmitry LABETSKI
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Patent number: 8115900Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: GrantFiled: September 17, 2007Date of Patent: February 14, 2012Assignee: ASML Netherlands B.V.Inventors: Yuri Johannes Gabriël Van De Vijver, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski, Tjarko Adriaan Rudolf Van Empel
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Publication number: 20110261329Abstract: The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.Type: ApplicationFiled: November 6, 2008Publication date: October 27, 2011Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Tjarko Adriaan Rudolf Van Empel, Hans Johannes Maria Freriks, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Marc Antonius Maria Haast, Wendelin Johanna Maria Versteeg, Peter Gerardus Jonkers, Dzmitry Labetski
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Publication number: 20110024651Abstract: A radiation system configured to generate a radiation beam, the radiation system including a chamber including: a radiation source configured to generate radiation; a radiation beam emission aperture; a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture; and a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture, wherein the spectral purity filter is configured to divide the chamber into a high pressure region and a low pressure region.Type: ApplicationFiled: November 7, 2008Publication date: February 3, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hendrikus Gijsbertus Schimmel, Tjarko Adriaan Rudolf Van Empel, Gerardus Hubertus Petrus Maria Swinkels, Maarten Marinus Johannes Wilhelmus Van Herpen, Dzmitry Labetski
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Publication number: 20100157267Abstract: A radiation source for generation of extreme ultraviolet radiation or use in high resolution lithography includes a plasma formation site where fuel is contacted by a radiation beam to form a plasma generating EUV radiation. A mirrored collector collects and reflects the EUV radiation generated at a first focus towards a second focus. A contamination barrier is positioned such the periphery of the contamination barrier does not occlude more than 50% of the solid angle subtended by the mirror at the second focus, such that EUV radiation reflected by the collector mirror is not excessively attenuated by passing through the contamination barrier. The contamination barrier serves to trap fuel material such as ions, atoms, molecules or nanodroplets from the plasma to prevent their deposition onto the collector mirror where they reduce the mirror's effective lifetime.Type: ApplicationFiled: August 13, 2009Publication date: June 24, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Hendrikus Gijsbertus SCHIMMEL, Vadim Yevgenyevich Banine, Erik Roelof Loopstra
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Publication number: 20100038562Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a laser constructed and arranged to generate a beam of radiation directed to a plasma generation site where a plasma is generated when the beam of radiation interacts with a fuel, an optical component having a surface that is arranged and positioned to be hit by a droplet of fuel, and a temperature conditioner constructed and arranged to elevate the temperature of the surface.Type: ApplicationFiled: August 13, 2009Publication date: February 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Hendrikus Gijsbertus SCHIMMEL, Vadim Yevgenyevich BANINE, Erik Roelof LOOPSTRA, Karel Joop BOSSCHAART
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Publication number: 20100039631Abstract: A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.Type: ApplicationFiled: August 13, 2009Publication date: February 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof LOOPSTRA, Hendrikus Gijsbertus Schimmel
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Publication number: 20090090877Abstract: A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.Type: ApplicationFiled: August 25, 2008Publication date: April 9, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriel Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Publication number: 20090073396Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: ApplicationFiled: September 17, 2007Publication date: March 19, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Yuri Johannes Gabriel Van De Vijver, Tjarko Adriaan Rudolf Van Empel, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Patent number: 7397538Abstract: The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet radiation, a contamination barrier constructed and arranged to trap contamination from the radiation source, and a temperature sensor constructed and arranged to sense a temperature of the contamination barrier.Type: GrantFiled: November 21, 2006Date of Patent: July 8, 2008Assignee: ASML Netherlands B.V.Inventors: Wilhelmus Josephus Box, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen, Niels Machiel Driessen, Hendrikus Gijsbertus Schimmel