Patents by Inventor Hendrikus Johannes Marinus Van Abeelen
Hendrikus Johannes Marinus Van Abeelen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230280663Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: ApplicationFiled: May 12, 2023Publication date: September 7, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Patent number: 11650511Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: GrantFiled: August 14, 2020Date of Patent: May 16, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Publication number: 20200371447Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: ApplicationFiled: August 14, 2020Publication date: November 26, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
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Patent number: 10747126Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: GrantFiled: June 11, 2019Date of Patent: August 18, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Publication number: 20190294056Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: ApplicationFiled: June 11, 2019Publication date: September 26, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
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Patent number: 10324382Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: GrantFiled: April 20, 2018Date of Patent: June 18, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Publication number: 20180239265Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: ApplicationFiled: April 20, 2018Publication date: August 23, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
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Patent number: 9971252Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: GrantFiled: August 21, 2017Date of Patent: May 15, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Publication number: 20170351187Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: ApplicationFiled: August 21, 2017Publication date: December 7, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
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Patent number: 9835957Abstract: A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.Type: GrantFiled: September 2, 2014Date of Patent: December 5, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Martijn Houben, Alwin De Kock, Hendrikus Johannes Marinus Van Abeelen, Marco Adrianus Peter Van Den Heuvel
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Patent number: 9740110Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: GrantFiled: February 16, 2017Date of Patent: August 22, 2017Assignee: ASML Netherlands B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Publication number: 20170176872Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: ApplicationFiled: February 16, 2017Publication date: June 22, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
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Patent number: 9575419Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: GrantFiled: February 27, 2015Date of Patent: February 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Publication number: 20160187791Abstract: A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.Type: ApplicationFiled: September 2, 2014Publication date: June 30, 2016Applicant: ASML Netherlands B.V.Inventors: Martijn HOUBEN, Alwin DE KOCK, Hendrikus Johannes Marinus VAN ABEELEN, Marco Adrianus Peter VAN DEN HEUVEL
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Publication number: 20150277243Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: ApplicationFiled: February 27, 2015Publication date: October 1, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
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Patent number: 8970822Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: GrantFiled: August 15, 2012Date of Patent: March 3, 2015Assignee: ASML Netherlands B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Patent number: 8564763Abstract: A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.Type: GrantFiled: May 6, 2009Date of Patent: October 22, 2013Assignee: ASML Netherlands B.V.Inventors: Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Frits Van der Meulen, Joost Jeroen Ottens, Anko Jozef Cornelus Sijben, Wouterus Johannes Petrus Maria Maas, Hendrikus Johannes Marinus Van Abeelen, Henricus Petrus Versteijnen, Paula Steffens
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Publication number: 20130094005Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: ApplicationFiled: August 15, 2012Publication date: April 18, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Patent number: 8416395Abstract: A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.Type: GrantFiled: May 6, 2009Date of Patent: April 9, 2013Assignee: ASML Netherlands B.V.Inventors: Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Frits Van der Meulen, Joost Jeroen Ottens, Anko Jozef Cornelus Sijben, Wouterus Johannes Petrus Maria Maas, Hendrikus Johannes Marinus Van Abeelen, Henricus Petrus Versteijnen, Paula Steffens
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Patent number: 8269949Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.Type: GrantFiled: September 21, 2009Date of Patent: September 18, 2012Assignee: ASML Netherlands B.V.Inventors: Marcus Martinus Petrus Adrianus Vermeulen, Andre Bernardus Jeunink, Erik Roelof Loopstra, Joost Jeroen Ottens, Rene Theodorus Petrus Compen, Peter Smits, Martijn Houben, Hendrikus Johannes Marinus Van Abeelen, Antonius Arnoldus Meulendijks, Rene Wilhelmus Antonius Hubertus Leenaars