Patents by Inventor Hendrikus Marie Van Greevenbroek

Hendrikus Marie Van Greevenbroek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050254024
    Abstract: A lithographic apparatus includes an instrument for determining the radiation intensity distribution at a pupil plane of the projection system while a patterning device is imparting the projection beam with a pattern, a calculation apparatus for calculating the effect on the imaging by the projection system of heating resulting from the projection beam in the projection system having the determined intensity distribution and a controller for adjusting the lithographic apparatus to compensate for the calculated effect of heating.
    Type: Application
    Filed: May 11, 2004
    Publication date: November 17, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hendrikus Marie Van Greevenbroek, Hendrikus Ludovicus Van Dijck, Christian Wagner, Laurentius Jorritsma