Patents by Inventor Hendrikus Pascal Gerardus Johannes Van Agtmaal

Hendrikus Pascal Gerardus Johannes Van Agtmaal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and lorentz actuator
    Patent number: 9293951
    Abstract: A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a first main magnet system and a first outer subsidiary magnet system, and the second magnet assembly including a second main magnet system and a second outer subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction perpendicular to the first direction. The actuator includes a coil attached to the second part. The distance between the first outer subsidiary magnet system and the second outer subsidiary magnet system in the second direction is substantially zero.
    Type: Grant
    Filed: January 9, 2013
    Date of Patent: March 22, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Fidelus Adrianus Boon, Hendrikus Pascal Gerardus Johannes Van Agtmaal, Abdelhamid Kechroud, Sven Antoin Johan Hol, Peter Michel Silvester Maria Heijmans
  • LITHOGRAPHIC APPARATUS AND LORENTZ ACTUATOR
    Publication number: 20130175884
    Abstract: A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a first main magnet system and a first outer subsidiary magnet system, and the second magnet assembly including a second main magnet system and a second outer subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction perpendicular to the first direction. The actuator includes a coil attached to the second part. The distance between the first outer subsidiary magnet system and the second outer subsidiary magnet system in the second direction is substantially zero.
    Type: Application
    Filed: January 9, 2013
    Publication date: July 11, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Fidelus Adrianus Boon, Hendrikus Pascal Gerardus Johannes Van Agtmaal, Abdelhamid Kechroud, Sven Antoin Johan Hol, Peter Michel Silvester Maria Heijmans
  • Lithographic apparatus and lorentz actuator
    Patent number: 8373848
    Abstract: A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a first main magnet system and a first subsidiary magnet system, and the second magnet assembly including a second main magnet system and a second subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction perpendicular to the first direction. The actuator includes a coil attached to the second part. The distance between at least a part of the first subsidiary magnet system and at least a part of the second subsidiary magnet system is smaller than the minimum distance between the first main magnet system and the second main magnet system.
    Type: Grant
    Filed: October 6, 2009
    Date of Patent: February 12, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Fidelus Adrianus Boon, Hendrikus Pascal Gerardus Johannes Van Agtmaal
  • LITHOGRAPHIC APPARATUS AND LORENTZ ACTUATOR
    Publication number: 20100085552
    Abstract: A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a first main magnet system and a first subsidiary magnet system, and the second magnet assembly including a second main magnet system and a second subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction perpendicular to the first direction. The actuator includes a coil attached to the second part. The distance between at least a part of the first subsidiary magnet system and at least a part of the second subsidiary magnet system is smaller than the minimum distance between the first main magnet system and the second main magnet system.
    Type: Application
    Filed: October 6, 2009
    Publication date: April 8, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Fidelus Adrianus BOON, Hendrikus Pascal Gerardus Johannes Van Agtmaal