Patents by Inventor Hengzhong K. Zhuang

Hengzhong K. Zhuang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7150901
    Abstract: An inkjet recording element comprising a porous ink-receiving layer having interconnecting voids is disclosed in which an upper surface of the ink-receiving layer has been subjected to plasma treatment, and wherein the upper surface of the ink-receiving layer, prior to the plasma treatment, has a measured carbon elemental content of at least 40 percent. The invention can provide increased dot spread.
    Type: Grant
    Filed: December 5, 2003
    Date of Patent: December 19, 2006
    Assignee: Eastman Kodak Company
    Inventors: Bruce C. Campbell, Lisa B. Todd, James A. Reczek, Mary Catherine S. Oldfield, Hengzhong K. Zhuang
  • Patent number: 6399159
    Abstract: A method and apparatus are taught for treating polyolefin containing or polyolefin-coated webs or laminates for obtaining the proper surface characteristics to promote adhesion of photosensitive coating materials and/or layers typically coated thereon. The web is passed through a high-voltage sheath region or dark space of the plasma generated by a powered electrode residing in a discharge zone. The frequency of the driving voltage must be above a lower bound dictated by the properties of the paper support and the plasma, and it must be below an upper bound beyond which the sheath voltages drop significantly and it is observed that the benefits of this approach diminish. The dark space is generated by a treatment electrode in a treatment zone. There is a counter electrode having a surface area in said treatment zone which is at least as great as the surface area of the treatment electrode.
    Type: Grant
    Filed: May 19, 2000
    Date of Patent: June 4, 2002
    Assignee: Eastman Kodak Company
    Inventors: Jeremy M. Grace, Louis J. Gerenser, Kurt D. Sieber, Michael J. Heinsler, Hengzhong K. Zhuang, Dennis R. Freeman, Mark M. Romach