Patents by Inventor Henri Bernardet
Henri Bernardet has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5215703Abstract: A neutron generator tube includes an ion source having at least one anode (6), at least one cathode (7) having at least one extraction port (12), and an accelerator electrode (2) arranged so as to project at least one ion beam from the ion source onto a target (4) to produce thereat a reaction resulting in emission of neutrons. The ion source is arranged on at least a portion of a first surface of revolution (8', 41, 51) and is constructed so as to produce emission of ions radially outwardly from such surface. The accelerator electrode (2) is arranged on at least a portion of a second surface of revolution which surrounds the aforesaid first surface, the target (4) being positioned on at least a portion of a third surface of revolution which surrounds the aforesaid second surface. Increased neutron flux is thereby achieved for a given size generator tube, and for a given neutron flux a significantly reduced ion bombardment density is produced at the target and so achieves extended target life.Type: GrantFiled: August 14, 1991Date of Patent: June 1, 1993Assignee: U.S. Philips CorporationInventor: Henri Bernardet
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Patent number: 5152956Abstract: A sealed neutron tube is set forth, containing a low-pressure gaseous deuterium-tritium mixture wherefrom an ion source (13) forms an ion beam which traverses an acceleration electrode (17) and is projected with high energy onto a target (16) in order to produce therein a fusion reaction which causes an emission of neutrons. In accordance with the invention, the ion source comprises a cold cathode with strictly electrostatic confinement of ionizing electrons; this is achieved by using an anode which is connected to a positive potential and which has a weakly collective surface facing the repulsive surface of the cathode cavity; the anode is arranged along the axis of the cavity in which it is arranged; said cavity constitutes the internal part of the cathode (15) in which the electrons (e.sub.2) which oscillate along very long paths in comparison with the dimensions of the cathode cavity ionize the gas and form an ionized gas wherefrom the ion beam (22) is extracted for standard ion optical device (17).Type: GrantFiled: October 4, 1989Date of Patent: October 6, 1992Assignee: U.S. Philips CorporationInventors: Henri Bernardet, Xavier L. M. Godechot, Claude A. Lejeune
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Patent number: 5130077Abstract: A device is set forth for the extraction and acceleration of ions in a sealed high-flux neutron tube in which an ion beam (3) is extracted from an ion source (1), after which it is accelerated by means of an acceleration electrode (2) so as to be projected onto a target electrode (4) and produce therein a fusion reaction which causes an emission of neutrons. In accordance with the invention, the device also comprises an extraction-pre-acceleration electrode (13) which is arranged between the ion source and the acceleration electrode and which carries a potential such that the beam extracted from the ion source is initially rendered parallel or slightly diverging in order to obtain a laminated ion beam throughout the zone between the ion source and the target electrode.Type: GrantFiled: October 4, 1989Date of Patent: July 14, 1992Assignee: U.S. Philips CorporationInventors: Henri Bernardet, Xavier L. M. Godechot, Claude A. Lejeune
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Patent number: 5112564Abstract: A device is set forth for the extraction and acceleration of ions in a high flux sealed neutron tube containing a low-pressure gaseous deuterium-tritium mixture, where an ion source (12) supplies several ion beams (3a, 3b, . . . 3e) which are projected onto a target electrode (4) by means of an extraction and acceleration system in order to produce therein a fusion reaction which causes an emission of neutrons.Type: GrantFiled: October 4, 1989Date of Patent: May 12, 1992Assignee: U.S. Philips CorporationInventors: Henri Bernardet, Xavier L. M. Godechot, Claude A. Lejeune
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Patent number: 5104610Abstract: The divergence of the magnetic field for confining the ionized gas (9) in a sealed high-flux neutron tube comprising a Penning-type ion source (1) is increased in the direction of the ion emission zone by influencing the magnet assembly (8) of the ion source. The ion beam extracted from the plasma is accelerated (2) and projected onto a target (4). The geometry and the position of the anode (13) inside the ion source are adapted to the topography of the lines of force in order to ensure minimum interception of the ionizing electrons moving in the structure, which adaptation is achieved notably by using a truncated anode whose generatrices take the shape of the lines of force.Type: GrantFiled: October 4, 1989Date of Patent: April 14, 1992Assignee: U.S. Philips CorporationInventors: Henri Bernardet, Xavier L. M. Godechot, Claude A. Lejeune
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Patent number: 5013969Abstract: A protective device for a neutron tube including an ion source having an anode (2) which is brought to a positive potential relative to a cathode (3) by means of a source supply. An ion beam accelerated by means of an acceleration electrode (5) strikes a target (6) disposed on an insulating support (9) and brought to a negative potential supplied by an HT supply. The protective device includes electric elements (11, 12) limiting the tube current and/or the target voltage, which are made unalterable by enclosing them inside the neutron tube, so that any attempt to modify the electrical parameters determining the normal operating conditions of the tube necessitates the opening of the tube.Type: GrantFiled: August 23, 1989Date of Patent: May 7, 1991Assignee: U.S. Philips CorporationInventors: Pierre Bach, Henri Bernardet
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Patent number: 5008585Abstract: A vacuum arc source of ions of metals utilizing the principle of forming anode spots, whose anode surface (8) is fed with liquid metal (7) originating from a reservoir (6) through a connection member (9). The connection member is preferably constituted by a material chosen so that it has with respect to the liquid metal a great difference in the temperatures required to obtain the same vapor tension. The mode of feeding through the connection member is in embodiments of the invention obtained by means of a porous material (13) or contiguous slots (14). The liquid metals can be liquid at the ambient temperature (gallium, caesium) or be liquified by heating (tin, indium).Type: GrantFiled: July 21, 1988Date of Patent: April 16, 1991Assignee: U.S. Philips CorporationInventors: Henri Bernardet, Jean-Claude Pauwels
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Patent number: 4994164Abstract: A metallurgic implantation apparatus of metal ions having a large emitting surface, a considerable flux and a controllable implantation depth comprises within an implantation chamber held in vacuo at least one vacuum arc ion source (1, 2, 3, 4) from which the ions (5) are extracted and projected onto a target plate (9) by means of an extraction and focusing electrode (6,7) and of an acceleration electrode (8) polarized at a very high and at a low voltage, respectively. The target plate (9) bombarded by the projection of ions emits a flux of secondary electrons, which are repelled by a suppression electrode (10) polarized negatively with respect to the target plate connected to ground.Type: GrantFiled: December 11, 1989Date of Patent: February 19, 1991Assignee: U.S. Philips CorporationInventors: Henri Bernardet, Chantal Thiebaut
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Patent number: 4939425Abstract: A vacuum arc ion source comprises an anode (2 or 3) and a cathode (1) which face each other and whose plasma (7) is emitted perpendicularly to the cathode surface. The projection of this plasma is obtained by means of two independent appropriately biased grids (4 and 5).Type: GrantFiled: June 10, 1988Date of Patent: July 3, 1990Assignee: U.S. Philips CorporationInventor: Henri Bernardet
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Patent number: 4924138Abstract: A vacuum arc ion device having a plasma-emissive cathode and an anode, each being energized with suitable potentials, and having the further structure for eliminating micro drops of molten material which micro drops are emitted for certain materials during plasma formation.Type: GrantFiled: April 11, 1988Date of Patent: May 8, 1990Assignee: U.S. Philips CorporationInventor: Henri Bernardet