Patents by Inventor Henri Gerard

Henri Gerard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8420226
    Abstract: A structural member comprising at least two aluminum alloy parts displaying different property balances, said at least two parts being welded and wherein one of said parts either is (i) selected from an aluminum alloy different from the other of said at least two parts and/or (ii) is selected from an initial temper different from the other of said at least two parts, and wherein at least one of said at least two parts has been pre-aged prior to being welded, and, wherein said structural member has undergone a post-welding thermal treatment conferring a final temper to each of said at least two parts. The parts are advantageously welded by friction stir welding. Another subject of the invention is a method for manufacturing a structural member.
    Type: Grant
    Filed: September 14, 2005
    Date of Patent: April 16, 2013
    Assignee: Constellium France
    Inventors: Jean-Christophe Ehrstrom, Henri Gérard
  • Patent number: 8091828
    Abstract: In a method for manufacturing a structural element intended for aeronautical construction, at least a first and second metal block are made available, the limit of elasticity under compression of the first metal block being greater than that of the second metal block. The first metal block is machined in such a manner as to obtain a first machined monolithic part which has a first web portion and at least one stringer element whose height is such that a stringer portion extends beyond the first web portion. There is prepared, by shaping the second metal block, at least one second part having at least a second web portion capable of co-operating with the first web portion to form the web. The first monolithic part and the second part are assembled by placing the first and second web portions end-to-end over their entire common length.
    Type: Grant
    Filed: December 15, 2006
    Date of Patent: January 10, 2012
    Assignee: Airbus Operations Limited
    Inventors: Sjoerd Van Der Veen, Jean-Christophe Ehrstrom, Henri Gerard, Francois Lemaitre
  • Publication number: 20080265094
    Abstract: In a method for manufacturing a structural element intended for aeronautical construction, at least a first and second metal block are made available, the limit of elasticity under compression of the first metal block being greater than that of the second metal block. The first metal block is machined in such a manner as to obtain a first machined monolithic part which has a first web portion and at least one stringer element whose height is such that a stringer portion extends beyond the first web portion. There is prepared, by shaping the second metal block, at least one second part having at least a second web portion capable of co-operating with the first web portion to form the web. The first monolithic part and the second part are assembled by placing the first and second web portions end-to-end over their entire common length.
    Type: Application
    Filed: December 15, 2006
    Publication date: October 30, 2008
    Applicant: AIRBUS UK LIMITED
    Inventors: Sjoerd Van Der Veen, Jean-Christophe Ehrstrom, Henri Gerard, Francois Lemaitre
  • Patent number: 7202934
    Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: April 10, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Hubertus Josephina Moors, Erik Leonardus Ham, Gert-Jan Heerens, Paulus Martinus Maria Liebregts, Erik Roelof Loopstra, Henri Gerard Cato Werij
  • Publication number: 20060131682
    Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.
    Type: Application
    Filed: December 20, 2004
    Publication date: June 22, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Hubertus Moors, Erik Ham, Gert-Jan Heerens, Paulus Martinus Liebregts, Erik Loopstra, Henri Gerard Werij
  • Publication number: 20060054666
    Abstract: A structural member comprising at least two aluminum alloy parts displaying different property balances, said at least two parts being welded and wherein one of said parts either is (i) selected from an aluminum alloy different from the other of said at least two parts and/or (ii) is selected from an initial temper different from the other of said at least two parts, and wherein at least one of said at least two parts has been pre-aged prior to being welded, and, wherein said structural member has undergone a post-welding thermal treatment conferring a final temper to each of said at least two parts. The parts are advantageously welded by friction stir welding. Another subject of the invention is a method for manufacturing a structural member.
    Type: Application
    Filed: September 14, 2005
    Publication date: March 16, 2006
    Applicant: PECHINEY RHENALU
    Inventors: Jean-Christophe Ehrstrom, Henri Gerard
  • Patent number: 6781673
    Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.
    Type: Grant
    Filed: August 23, 2001
    Date of Patent: August 24, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit-Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders
  • Patent number: 6459472
    Abstract: A lithographic device has a radiation system for supplying a projection beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate. The projection system is separated from the table by an intervening space which can be at least partially evacuated and which is delimited at the location of the projection system by a mirror from which the employed radiation is directed toward the substrate table. The intervening space contains a hollow tube located between the solid surface and the substrate table and situated around the path of radiation, the form and size of the tube being such that radiation focused by the de Jager et al. projection system onto the substrate table does not intercept a wall of the hollow tube.
    Type: Grant
    Filed: April 30, 1999
    Date of Patent: October 1, 2002
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Willem Herman De Jager, Henri Gerard Cato Werij, Peter Van Zuylen
  • Publication number: 20020109828
    Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.
    Type: Application
    Filed: August 23, 2001
    Publication date: August 15, 2002
    Inventors: Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit-Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders
  • Publication number: 20020096647
    Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield means are fixed to the mask holder rather than the mask.
    Type: Application
    Filed: October 9, 2001
    Publication date: July 25, 2002
    Applicant: ASM LITHOGRAPHY B.V.
    Inventors: Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit-Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders
  • Patent number: 6280713
    Abstract: The invention relates to novel microgel-containing essentially organic solvent nail varnishes. The microgels are particularly acrylic microgels. The invention also relates to the use of these microgels for modifying the physical properties of an essentially organic solvent nail varnish composition, and/or the properties of the film obtained during the application of said composition.
    Type: Grant
    Filed: March 28, 1997
    Date of Patent: August 28, 2001
    Assignee: LVMH Recherche
    Inventors: Jean-François Tranchant, Henri-Gérard Riess, Alain Meybeck
  • Patent number: 5958385
    Abstract: The invention relates to a chain end functionalised polymer of formula: ##STR1## in which: the polymer chain (P) is a hydrophobic chain obtained by radical polymerisation of at least one monomer,R represents a hydrogen atom or a linear or branched hydrocarbon chain having 1 to 8 carbon atoms optionally substituted with at least one group selected from CO.sub.2, NH.sub.2, OH or a phenyl group, itself being optionally substituted,A and B, identical or different, each represent a single bond, a saturated or unsaturated linear or branched hydrocarbon chain having from 1 to 16 carbon atoms, it being possible for it to contain an amide bond or a peptide chain having 2 to 4 amino acids, particularly natural amino acids,the NH.sub.2 and/or COOH groups being free or salified.The invention also relates to the use of the above products as surfactants and more particularly as wetting agents, dispersing agents of solid particles and for preparing microdispersions of polymers, in particular microgels and microlatexes.
    Type: Grant
    Filed: March 28, 1997
    Date of Patent: September 28, 1999
    Assignee: LVMH Recherche
    Inventors: Carole Tondeur, Henri-Gerard Riess, Alain Meybeck, Jean-Francois Tranchant
  • Patent number: 5916985
    Abstract: The invention relates to a functionalised polymer of formula:(P)--S--X--F (1)in which:(P) is a hydrophobic polymer chain obtained by radical polymerisation of at least one monomer,S represents sulphur,X represents:a saturated or unsaturated linear or branched hydrocarbon chain having 1 to 6 carbon atoms and substituted with at least one COOH or NH.sub.2 group in the free or salified forma peptide chain constituted of 2 to 4 amino acids, particularly natural amino acids,F represents a COOH or NH.sub.2 group, in the free or salified form,with the exception of the .omega.-dicarboxylic macromonomers resulting from the radical polymerisation of a monomer in the presence of a chain transfer agent constituted of thiomalic acid.
    Type: Grant
    Filed: March 28, 1997
    Date of Patent: June 29, 1999
    Assignee: LVMH Recherche
    Inventors: Carole Tondeur, Catherine Garel, Henri-Gerard Riess, Alain Meybeck, Jean-Francois Tranchant
  • Patent number: 5711940
    Abstract: The invention relates to a process for the preparation of a stable microdispersion of particles comprised of acrylic polymers in an organic solvent used as reaction medium in the presence of a stabilizing agent comprised of a block copolymer, characterized in that said acrylic polymer is obtained by radical polymerization of at least one acrylic monomer in the presence of a block copolymer based on polymethyl methacrylate (PMMA) and polytert-butyl acrylate (PtBuA). It also relates to microdispersions which may be obtained by said process as well as to microgels produced from said microdispersions and compositions, particularly cosmetic compositions such as nail varnish.
    Type: Grant
    Filed: June 12, 1996
    Date of Patent: January 27, 1998
    Assignee: LVMH Recherche
    Inventors: Annie Kuentz, Henri-Gerard Riess, Alain Meybeck, Jean-Fran.cedilla.ois Tranchant
  • Patent number: 5681877
    Abstract: Block copolymers denoted by AB from acrylic or methacrylic acid, the corresponding blocks being denoted by A, and from alkyl acrylate or methacrylate with the alkyl chain being C.sub.1 -C.sub.10, the corresponding blocks being denoted by B. Said copolymer blocks are used as wetting and/or dispersing agents for solid particles in an essentially organic medium consisting of a solvent or a mixture of solvents solubilizing the block B.The invention also concerns solid particle dispersions using the above-defined block copolymers.It also concerns compositions, in particular cosmetic compositions, containing said dispersions.
    Type: Grant
    Filed: March 27, 1996
    Date of Patent: October 28, 1997
    Assignee: LVMH Recherche
    Inventors: Claude Hosotte-Filbert, Carole Tondeur, Henri-Gerard Riess, Alain Meybeck, Jean-Fran.cedilla.ois Tranchant