Patents by Inventor Henricus Gerardus Tegenbosch

Henricus Gerardus Tegenbosch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12007699
    Abstract: A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.
    Type: Grant
    Filed: November 13, 2020
    Date of Patent: June 11, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Kerssemakers, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Henricus Gerardus Tegenbosch
  • Publication number: 20240085796
    Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
    Type: Application
    Filed: October 16, 2023
    Publication date: March 14, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Dzmitry LABETSKI, Christianus Wilhelmus Johannes BERENDSEN, Rui Miguel DUARTE RODRIGUES NUNES, Alexander Igorevich ERSHOV, Kornelis Frits FEENSTRA, Igor Vladimirovich FOMENKOV, Klaus Martin HUMMLER, Arun JOHNKADAKSHAM, Matthias KRAUSHAAR, Andrew David LAFORGE, Marc Guy LANGLOIS, Maksim LOGINOV, Yue MA, Seyedmohammad MOJAB, Kerim NADIR, Alexander SHATALOV, John Tom STEWART, Henricus Gerardus TEGENBOSCH, Chunguang XIA
  • Patent number: 11822252
    Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
    Type: Grant
    Filed: January 22, 2021
    Date of Patent: November 21, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodreigues Nunes, Alexander Igorevich Ershov, Kornelis Frits Feenstra, Igor Vladimirovich Fomenkov, Klaus Martin Hummler, Arun Johnkadaksham, Matthias Kraushaar, Andrew David Laforge, Marc Guy Langlois, Maksim Loginov, Yue Ma, Seyedmohammad Mojab, Kerim Nadir, Alexander Shatalov, John Tom Stewart, Henricus Gerardus Tegenbosch, Chunguang Xia
  • Publication number: 20230023631
    Abstract: A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.
    Type: Application
    Filed: November 13, 2020
    Publication date: January 26, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Sander KERSSEMAKERS, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Henricus Gerardus TEGENBOSCH
  • Publication number: 20210141311
    Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
    Type: Application
    Filed: January 22, 2021
    Publication date: May 13, 2021
    Inventors: Dzmitry LABETSKI, Christianus Wilhelmus Johannes BERENDSEN, Rui Miguel DUARTE RODRIGUES NUNES, Alexander Igorevich ERSHOV, Kornelis Frits FEENSTRA, Igor Vladimirovich FOMENKOV, Klaus Martin HUMMLER, Arun JOHNKADAKSHAM, Matthias KRAUSHAAR, Andrew David LAFORGE, Marc Guy LANGLOIS, Maksim LOGINOV, Yue MA, Seyedmohammad MOJAB, Kerim NADIR, Alexander SHATALOV, John Tom STEWART, Henricus Gerardus TEGENBOSCH, Chunguang XIA
  • Patent number: 10955749
    Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
    Type: Grant
    Filed: January 5, 2018
    Date of Patent: March 23, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodriges Nunes, Alexander Igorevich Ershov, Kornelis Frits Feenstra, Igor Vladimirovich Fomenkov, Klaus Martin Hummler, Arun Johnkadaksham, Matthias Kraushaar, Andrew David Laforge, Marc Guy Langlois, Maksim Loginov, Yue Ma, Seyedmohammad Mojab, Kerim Nadir, Alexander Shatalov, John Tom Stewart, IV, Henricus Gerardus Tegenbosch, Chunguang Xia
  • Publication number: 20200089124
    Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
    Type: Application
    Filed: January 5, 2018
    Publication date: March 19, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Dzmitry LABETSKI, Christianus Wilhelmus Johanne BERENDSEN, Rui Miguel DUARTE RODRIGES NUNES, Alexander Igorevich ERSHOV, Kornelis Frits FEENSTRA, Igor Vladimirovich FOMENKOV, Klaus Martin HUMMLER, Arun JOHNKADAKSHAM, Matthias KRAUSHAAR, Andrew David LAFORGE, Marc Guy LANGLOIS, Maksim LOGINOV, Yue MA, Seyedmohammad MOJAB, Kerim NADIR, Alexander SHATALOV, John Tom STEWART (IV), Henricus Gerardus TEGENBOSCH, Chunguang XIA
  • Patent number: 9335641
    Abstract: A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support the optical element. Each resilient member includes a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof. Each resilient subsection is configured to flex independent of another resilient subsection.
    Type: Grant
    Filed: July 16, 2009
    Date of Patent: May 10, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Henricus Gerardus Tegenbosch, Alexander Matthijs Struycken, Jacob Kleijn, Ruud Antonius Catharina Maria Beerens, Ivo Vanderhallen
  • Patent number: 9119280
    Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location. The catch includes a container configured to contain a fluid; a driver configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.
    Type: Grant
    Filed: December 13, 2011
    Date of Patent: August 25, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Antonius Theodorus Wilhelmus Kempen, Erik Roelof Loopstra, Christian Wagner, Henricus Gerardus Tegenbosch, Gerardus Hubertus Petrus Maria Swinkels
  • Publication number: 20140160453
    Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location. The catch includes a container configured to contain a fluid; a driver configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.
    Type: Application
    Filed: December 13, 2011
    Publication date: June 12, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Antonius Theodorus Wilhelmus Kempen, Erik Roelof Loopstra, Christian Wagner, Henricus Gerardus Tegenbosch, Gerardus Hubertus Petrus Maria Swinkels
  • Publication number: 20110205517
    Abstract: A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support the optical element. Each resilient member includes a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof Each resilient subsection is configured to flex independent of another resilient subsection.
    Type: Application
    Filed: July 16, 2009
    Publication date: August 25, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Henricus Gerardus Tegenbosch, Alexander Matthijs Struycken, Jacob Klenijn, Ruud, Antonius Catharina, Maria Beerens, Ivo Vanderhallen
  • Patent number: 7486384
    Abstract: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: February 3, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Edwin Johan Buis, Sjoerd Nicolaas Lambertus Donders, Jan Van Elp, Jan Frederik Hoogkamp, Aschwin Lodewijk Hendricus Johannes Van Meer, Patrick Johannes Cornelus Hendrik Smulders, Franciscus Andreas Cornelis Johannes Spanjers, Johannes Petrus Martinus Bernardus Vermeulen, Raimond Visser, Henricus Gerardus Tegenbosch, Johannes Charles Adrianus Van Den Berg, Henricus Johannes Adrianus Van De Sande, Thijs Vervoort
  • Publication number: 20080297758
    Abstract: The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.
    Type: Application
    Filed: June 26, 2008
    Publication date: December 4, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Edwin Johan Buis, Sjoerd Nicolaas Lambertus Donders, Jan Van Elp, Jan Frederik Hoogkamp, Aschwin Lodewijk Hendricus Van Meer, Patrick Johannes Cornelus Smulders, Franciscus Andreas Cornelis Spanjers, Johannes Petrus Martinus Ber Vermeulen, Raimond Visser, Henricus Gerardus Tegenbosch, Johannes Charles Adrianus Van Den Berg, Henricus Johannes Adrianus Van De Sande, Thijs Vervoort
  • Patent number: 7382440
    Abstract: A transporter is provided for moving a substrate and a patterning device relative to one another in a lithographic apparatus. The transporter includes a beam, a driver, and a slide. The slide is supported by the beam, and the driver is disposed to move the slide relative to the beam in a transport direction. The beam has a concave interior surface transverse to the transport direction, and the slide is supported against the concave interior surface in at least two directions transverse to the transport direction.
    Type: Grant
    Filed: November 4, 2004
    Date of Patent: June 3, 2008
    Assignee: ASML Netherlands B.V.
    Inventor: Henricus Gerardus Tegenbosch
  • Patent number: 7362415
    Abstract: A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.
    Type: Grant
    Filed: December 7, 2004
    Date of Patent: April 22, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Dominicus Jacobus Petrus Adrianus Franken, Arno Jano Bleeker, Wilhelmus Josephus Box, Martinus Hendricus Hendricus Hoeks, Henricus Gerardus Tegenbosch, Kars Zeger Troost, Lambertus Gerardus Maria Kessels
  • Patent number: 7184128
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, a support surface having an edge, and a support structure for supporting an object to be moved across the beam of radiation. The support structure is moveably supported on the support surface. The apparatus also includes a rim that is associated with the support surface. The support structure and the rim are configured to allow the support structure to move in a first direction toward the rim and collide with the rim. A total force generated by the collision on the support structure is at least partially directed away from a second direction that is opposite to the first direction.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: February 27, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Henricus Gerardus Tegenbosch, Sebastiaan Maria Johannes Cornelissen
  • Publication number: 20040246459
    Abstract: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.
    Type: Application
    Filed: March 31, 2004
    Publication date: December 9, 2004
    Applicant: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Edwin Johan Buis, Sjoerd Nicolaas Lambertus Donders, Jan Van Elp, Jan Frederik Hoogkamp, Aschwin Lodewijk Hendricus Johannes Van Meer, Patrick Johannes Cornelus Hendrik Smulders, Franciscus Andreas Cornelis Johannes Spanjers, Johannes Petrus Martinus Bernardus Vermeulen, Raimond Visser, Henricus Gerardus Tegenbosch, Johannes Charles Adrianus Van Den Berg, Henricus Johannes Adrianus Van De Sande, Thijs Vervoort