Patents by Inventor Henricus Jacobus Maria Verhoeven

Henricus Jacobus Maria Verhoeven has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the same
    Patent number: 7468795
    Abstract: A method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus is disclosed. First a set of grid models is provided. Subsequently, alignment data are obtained by performing an alignment measurement on a plurality of alignment marks on a number of substrates. For each grid model it is checked whether the alignment data is suitable to solve the grid model. If so, the grid model is added to a subset of grid models. The grid model with lowest residuals is selected. In addition to alignment data, metrology data may be obtained by performing an overlay measurement on a plurality of overlay marks on the number of substrates. For each grid model of the subset simulated metrology data may then be determined that is used to determine overlay performance indicators. The grid model is then selected using the overlay performance indicators.
    Type: Grant
    Filed: July 12, 2006
    Date of Patent: December 23, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Hubertus Johannes Gertrudus Simons, Henricus Johannes Lambertus Megens, Everhardus Cornelis Mos, Leonardus Henricus Marie Verstappen, Roy Werkman, Henricus Jacobus Maria Verhoeven