Patents by Inventor Henricus Jozef Castelijns

Henricus Jozef Castelijns has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10394141
    Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
  • Patent number: 9983489
    Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: May 29, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Christianus Wilhelmus Johannes Berendsen, Marcel Beckers, Henricus Jozef Castelijns, Hubertus Antonius Geraets, Adrianus Hendrik Koevoets, Leon Martin Levasier, Peter Schaap, Bob Streefkerk, Siegfried Alexander Tromp
  • Patent number: 9971255
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: May 15, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp
  • Publication number: 20170322499
    Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
    Type: Application
    Filed: July 27, 2017
    Publication date: November 9, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Michel RIEPEN, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
  • Patent number: 9753383
    Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: September 5, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
  • Publication number: 20170176875
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.
    Type: Application
    Filed: March 6, 2017
    Publication date: June 22, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rogier Hendrikus Magdalena CORTIE, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp
  • Patent number: 9588437
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.
    Type: Grant
    Filed: December 18, 2015
    Date of Patent: March 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp
  • Patent number: 9235138
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.
    Type: Grant
    Filed: July 5, 2012
    Date of Patent: January 12, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp
  • Patent number: 8891053
    Abstract: A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOn where A is an element from Group 2 of the Periodic Table; or TiO2 doped with a metal from Group 3, 5 or 7 of the Periodic Table, wherein the coating is less than or equal to 49 nm thick.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: November 18, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Nina Vladimirovna Dziomkina, Nicolaas Ten Kate, Sandra Van Der Graaf, Henricus Jozef Castelijns
  • Patent number: 8755026
    Abstract: An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: June 17, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Gerard Gosen, Albert Johannes Maria Jansen, Nicolaas Ten Kate, Marco Koert Stavenga, Koen Steffens, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns, Koen Cuypers
  • Publication number: 20140014138
    Abstract: A method and apparatus for cleaning an article in semiconductor manufacturing are provided. The method includes subjecting a first chamber containing the article to a vapor source while controlling a temperature of the article and a temperature of the vapor source such that vapor from the vapor source condenses on a surface of the article to form a liquid film. The method further includes evaporating the liquid film, whereby the evaporating liquid transports contaminants from the surface of the article. Evaporating includes exposing the first chamber to condensing surfaces having a temperature lower than a temperature of the article, whereby the evaporated liquid condenses on the condensing surfaces. The apparatus includes a first chamber for housing the article, a vapor source connected to the first chamber, a temperature controller, and a second chamber connected with the first chamber to collect the vapor evaporated from the article.
    Type: Application
    Filed: August 10, 2011
    Publication date: January 16, 2014
    Inventors: Jeffrey J. Spiegelman, Russell J. Holmes, Daniel Alvarez, Luigi Scaccabarozzi, Sjoerd Nicolaas Lambertus Donders, Henricus Jozef Castelijns
  • Patent number: 8553206
    Abstract: A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: October 8, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Nicolaas Ten Kate, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns
  • Patent number: 8405819
    Abstract: In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.
    Type: Grant
    Filed: May 6, 2010
    Date of Patent: March 26, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Laurentius Johannes Adrianus Van Bokhoven, Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre, Henricus Jozef Castelijns, Petrus Martinus Gerardus Johannes Arts
  • Publication number: 20130016332
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.
    Type: Application
    Filed: July 5, 2012
    Publication date: January 17, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp
  • Publication number: 20110149258
    Abstract: An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.
    Type: Application
    Filed: December 16, 2010
    Publication date: June 23, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Gerard Gosen, Albert Johannes Maria Jansen, Nicolaas Ten Kate, Marco Koert Stavenga, Koen Steffens, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns, Koen Cuypers
  • Publication number: 20110069289
    Abstract: An immersion lithographic apparatus, including: first and second objects which are spaced apart with a gap therebetween and on whose top surfaces immersion liquid is provided; and a gutter positioned under the gap and configured to collect any immersion liquid which passes through the gap, wherein an advancing contact angle of immersion liquid with surfaces of the first and second objects defining the gap is less than 30°.
    Type: Application
    Filed: September 20, 2010
    Publication date: March 24, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Nicolaas Ten Kate, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns
  • Publication number: 20110069297
    Abstract: A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.
    Type: Application
    Filed: September 14, 2010
    Publication date: March 24, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Nicolaas Ten Kate, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns
  • Publication number: 20100283981
    Abstract: In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.
    Type: Application
    Filed: May 6, 2010
    Publication date: November 11, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Laurentius Johannes Adrianus Van Bokhoven, Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre, Henricus Jozef Castelijns, Petrus Martinus Gerardus Johannes Arts