Abstract: A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, a support surface having an edge, and a support structure for supporting an object to be moved across the beam of radiation. The support structure is moveably supported on the support surface. The apparatus also includes a rim that is associated with the support surface. The support structure and the rim are configured to allow the support structure to move in a first direction toward the rim and collide with the rim. A total force generated by the collision on the support structure is at least partially directed away from a second direction that is opposite to the first direction.

Abstract: A transporter is provided for moving a substrate and a patterning device relative to one another in a lithographic apparatus. The transporter includes a beam, a driver, and a slide. The slide is supported by the beam, and the driver is disposed to move the slide relative to the beam in a transport direction. The beam has a concave interior surface transverse to the transport direction, and the slide is supported against the concave interior surface in at least two directions transverse to the transport direction.