Abstract: An interferometer system comprises a reference surface, a support for an object providing an object surface, a radiation source for emitting radiation of an adjustable frequency onto the reference surface and the object surface, a position-sensitive radiation detector, a controller for adjusting a plurality of different frequencies of the radiation emitted by the radiation source, and an integrator for averaging the interference patterns superposed on the radiation detector at different frequencies. Moreover, there is provided a method for recording an interferogram, a method for providing an object with a target surface as well as a method for manufacturing an object with a target surface.

Abstract: An interferometer system comprises a reference surface, a support for an object providing an object surface, a radiation source for emitting radiation of an adjustable frequency onto the reference surface and the object surface, a position-sensitive radiation detector, a controller for adjusting a plurality of different frequencies of the radiation emitted by the radiation source, and an integrator for averaging the interference patterns superposed on the radiation detector at different frequencies. Moreover, there is provided a method for recording an interferogram, a method for providing an object with a target surface as well as a method for manufacturing an object with a target surface.

Abstract: A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided which superposes the illuminating beam path (100) and the imaging beam path (200). In order to obtain an almost telecentric entry at the reticle, optical elements (71) are provided between beam splitter cube (3) and the reflective reticle (5). Advantageously, the reduction objective is a catadioptric objective having a beam splitter cube (3) whose fourth unused side can be used for coupling in light. The illuminating beam path (100) can also be coupled in with a non-parallel beam splitter plate. The illuminating beam path is refractively corrected in passthrough to compensate for aberrations via the special configuration of the rear side of the beam splitter plate.

Abstract: A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided which superposes the illuminating beam path (100) and the imaging beam path (200). In order to obtain an almost telecentric entry at the reticle, optical elements (71) are provided between beam splitter cube (3) and the reflective reticle (5). Advantageously, the reduction objective is a catadioptric objective having a beam splitter cube (3) whose fourth unused side can be used for coupling in light. The illuminating beam path (100) can also be coupled in with a non-parallel beam splitter plate. The illuminating beam path is refractively corrected in passthrough to compensate for aberrations via the special configuration of the rear side of the beam splitter plate.