Abstract: Apparatus and methods for in situ and ex situ measurements of spatial profiles of the modulus of the complex amplitude and intensity of flare generated by an optical system. The in situ and ex situ measurements comprise interferometric and non-interferometric measurements that use an array of diffraction sites simultaneously located in an object plane of the optical system to increase signals related to measured properties of flare in a conjugate image plane. The diffraction sites generate diffracted beams with randomized relative phases. In general, the interferometric profile measurements employ phase-shifting point-diffraction interferometry to generate a topographical interference signal and the non-interferometric measurements are based on flare related signals other than topographic interference signals.

Abstract: The invention features a method including: (i) providing an interference signal S(t) from two beams directed along different paths, wherein the signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive index along the different paths, {tilde over (L)}(t) is a total physical path difference between the different paths, and t is time; (ii) providing one or more coefficients representative of one or more errors that cause the signal S(t) to deviate from an ideal expression of the form A1 cos(?Rt+?(t)+?1), where A1 and ?1 are constants, ?R is an angular frequency difference between the two beams before being directed along the different paths, and ?(t)=nk{tilde over (L)}(t), with k=2?/? and ? equal to a wavelength for the beams; (iii) calculating a linear combination of values of the signal S(t); and (iv) reducing the effect of the deviation of S(t) from the ideal expression on an estimate of {tilde over (L)}(t) using an e

Abstract: A wavefront interferometry system including: a wavefront interferometer that during operation combines a reference beam from a reference object and a measurement beam from a measurement object to generate a combined beam; and a processor system programmed to processes the combined beam to concurrently generate therefrom a control signal and information about the difference in wavefront profiles of the reference and measurement objects, wherein the control signal controls a system parameter so as to maintain an optical path length difference between a spot on the reference object and a corresponding spot on the measurement object at a constant value mod 2?.

Abstract: In general, in one aspect, the invention features a system that includes a moveable stage, an interferometer configured to provide information about a first degree of freedom of the stage, an encoder configured to provide information about a second degree of freedom of the stage, and an electronic processor configured to monitor the position of the stage based on the information about the first and second degrees of freedom.

Abstract: The disclosure features multiple degree-of-freedom interferometers (e.g., non-dispersive interferometers) for monitoring linear and angular (e.g., pitch and/or yaw) displacements of a measurement object with compensation for variations in the optical properties of a gas in the interferometer measurement (and/or reference) beam paths. The disclosure also features interferometry systems that feature an array of interferometers (e.g., including one or more multiple degree-of-freedom interferometer), each configured to provide different information about variations in the optical properties of the gas in the system. Multiple degree-of-freedom interferometers are also referred to as multi-axis interferometers.

Abstract: The present disclosure relates to an apparatus and/or method of identifying a user comprising illuminating a user with electromagnetic energy to induce luminescence and producing an output data signal. A reference data signal corresponding to the luminescence of a selected user may be identified and compared to the output data signal. In such a manner, an identification may be made as to whether a selected user is present.

Abstract: An optical component has a coating including one or more layers at each reflecting surface. The coating causes the optical component to have polarization eigenstates that are substantially linear and to have the properties of a half-wave plate. The coated optical component can be used in interferometry and microlithography system.

Abstract: In general, in a first aspect, the invention features a lithography system that includes a stage for supporting a wafer, an illumination system including a radiation source and a lens assembly, wherein the illumination system is configured to direct radiation through a mask to produce spatially patterned radiation, and the lens assembly is configured to image the spatially patterned radiation onto the wafer, a first interferometry system configured to monitor a location of the stage within the lithography system as the stage moves relative to the illumination system, a second interferometry system configured to identify an alignment feature on a surface associated with the stage, and an electronic controller coupled to the interferometry systems, wherein the electronic controller is configured to determine information about a location of the stage when the alignment feature is identified.

Abstract: An inhaler for producing an inhalable aerosol of a powdered medicament includes an aerosolizing device in the form of a vortex chamber 1. The vortex chamber 1 has a tangential inlet port 3 and an axial port 2. The ratio of the diameter of the vortex chamber 1 to the diameter of the exit port 2 is between 4 and 12. The length of the exit port 2 is less than its diameter. The cross-section of the inlet port 3 is rectangular and is defined at the bottom and at the radially outermost edge by the walls of the vortex chamber 1. The cross-sectional area of the inlet conduit 7, which supplies the medicament in a gas flow to the inlet port 3, decreases in the direction towards the vortex chamber 1. The inlet conduit 7 may be curved. The inhaler is capable of repeatably producing an aerosol of a medicament with a high proportion of particles in the range 1 to 3 microns, while using a 20 relatively small amount of energy.

Abstract: In general, in one aspect, the invention features an apparatus including a multi-axis interferometer configured to produce at least three output beams each including interferometric information about a distance between the interferometer and a measurement object along a corresponding measurement axis, wherein at least three of the measurement axes are in a common plane, wherein the output beams each include a component that makes a pass to the measurement object along a common beam path.

Abstract: In general, in one aspect, the invention features methods that include interferometrically monitoring a distance between an interferometry assembly and a measurement object along each of three different measurement axes while moving the measurement object relative to the interferometry assembly. The methods also include monitoring an orientation angle of the measurement object with respect to a rotation axis non-parallel to the three different measurement axes while the measurement object is moving, determining values of a parameter for different positions of the measurement object from the monitored distances, wherein for a given position the parameter is based on the distances of the measurement object along each of the three different measurement axes at the given position, and deriving information about a surface figure profile of the measurement object from a frequency transform of at least the parameter values.

Abstract: In general, in a first aspect, the invention features a method that includes using an interferometry assembly to provide three different output beams, each output beam including an interferometric phase related to an optical path difference between a corresponding first beam and a corresponding second beam, each first beam contacting a measurement object at least once, monitoring the interferometric phases for each of the three different output beams, and deriving information about variations in the optical properties of a gas in the first beam paths from the three monitored phases.

Abstract: Techniques for compensating for geometric effects of beam misalignment in plane mirror interferometers are disclosed.

Abstract: A test object including: an arrangement of optical elements defining a first partially reflecting surface and a second partially reflecting surface, at least one of the first and second partially reflecting surfaces being curved, wherein the first partially reflecting surface is arranged to receive a substantially collimated input beam and produce therefrom a first transmitted beam that passes on to the second partially reflecting surface, wherein the second partially reflecting surface is arranged to receive the first transmitted beam from the first partially reflecting surface and produce a collimated second transmitted beam and a first reflected beam therefrom, wherein the first partially reflecting surface is arranged to receive the first reflected beam and produce a second reflected beam therefrom, and wherein the first and second reflecting surfaces are configured to cause the second reflecting beam to converge onto a spot on a back surface to produce a diverging beam traveling in the same direction as

Abstract: In general, in a first aspect, the invention features methods that include deriving a first beam and a second beam from an input beam and directing the first and second beams along different paths, where the path of the first beam contacts a measurement object, producing an output beam comprising a phase related to an optical path difference between the different beam paths, determining a position of the measurement object with respect to at least one degree of freedom based on information derived from the output beam, monitoring variations in a direction of the input beam, and using the monitored variations in the direction of the input beam to reduce errors in the determined position associated with deviations of the path of the input beam from a nominal input beam path.

Abstract: In general, in one aspect, the invention features a method for determining the location of an alignment mark on a stage including measuring a location, x1, of a stage along a first measurement axis using an interferometer, measuring a location, x2, of the stage along a second measurement axis substantially parallel to the first measurement axis, and determining a location of the alignment mark along a third axis substantially parallel to the first measurement axis based on x1, x2, and a correction term, ?3, calculated from predetermined information including information characterizing imperfections in the interferometer.

Abstract: We disclose acousto-optic modulators that include: (a) an optical element configured to receive an input optical beam that propagates along a first direction; and (b) a transducer extending along the first direction and positioned on one or more surfaces of the optical element, the transducer having a transducer material positioned between two electrodes configured to apply a potential difference across the transducer to cause the transducer to generate an acoustic waveform propagating in a second direction in the optical element, and the input optical beam undergoing diffraction in a region of the optical element that includes the acoustic waveform.

Abstract: In general, in one aspect, the invention features a method that includes monitoring a position of a stage along a first measurement axis and a second measurement axis of a multi-axis interferometry system and determining a position of the stage with respect to another degree of freedom based on the monitored positions along the first and second axes and predetermined information about how the measurement axes deviate from being parallel to one another.

Abstract: In one aspect, the invention features a method, including using an interferometer in an interferometry system to produce an output beam comprising a phase related to an optical path difference between a path of a first beam and a path of a second beam, wherein the first beam contacts a measurement object at a first location and the first or second beam contacts the measurement object at a second location, and wherein the first and second locations are different, providing precalibrated information that accounts for contributions to the optical path difference caused by a deviation of the path of the first or second beam from a nominal beam path due to an imperfection of the measurement object at the first location and due to an imperfection of the measurement object at the second location, and determining a position of the measurement object with respect to at least one degree of freedom based on information derived from the output beam and the precalibrated information.

Abstract: In general, in one aspect, the invention features an apparatus including a multi-axis interferometer configured to produce at least three output beams each including interferometric information about a distance between the interferometer and a measurement object along a corresponding measurement axis, wherein at least three of the measurement axes are in a common plane, wherein the output beams each include a component that makes a pass to the measurement object along a common beam path.