Patents by Inventor Henry Byorum

Henry Byorum has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
    Patent number: 5814195
    Abstract: A sputtering system using an AC power supply in the range of 10 kHz to 100 kHz uses two rotatable cylindrical magnetrons. The rotatable cylindrical magnetrons, when used for depositing a dielectric layer onto a substrate, clean off dielectric material that is deposited onto the target. This prevents a dielectric layer on the target from acting like a capacitor and may help avoid arcing. Additionally, an impedance-limiting capacitor can be placed in series in the electrical path between the targets through the transformer so as to reduce arcing. This impedance-limiting capacitor has a value much larger than the capacitors used to couple the power supply to a target in radio frequency sputtering systems.
    Type: Grant
    Filed: October 25, 1996
    Date of Patent: September 29, 1998
    Assignee: The Boc Group, Inc.
    Inventors: John Lehan, Henry Byorum, Russell J. Hill, J. Kirkwood Rough